P-doped conjugated polymer electrolyte and an organic electronic device using the same
US-9214255-B2 · Dec 15, 2015 · US
US2016240781A1 · US · A1
| Field | Value |
|---|---|
| Publication number | US-2016240781-A1 |
| Application number | US-201615132413-A |
| Country | US |
| Kind code | A1 |
| Filing date | Apr 19, 2016 |
| Priority date | May 30, 2013 |
| Publication date | Aug 18, 2016 |
| Grant date | — |
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The present invention relates to the doping of organic semiconductors and processes for producing layers of p-doped organic semiconductors. Disclosed is a process for p-doping organic semiconductors comprising treating the organic semiconductor with an oxidised salt of the organic semiconductor. A process for producing a layer of a p-doped organic semiconductor comprising producing a p-doped organic semiconductor by treating the organic semiconductor with an oxidised salt of the organic semiconductor; disposing a composition comprising a solvent and the p-doped organic semiconductor on a substrate; and removing the solvent is also described. Also disclosed is a process for producing a layer of a p-doped organic semiconductor comprising: disposing a composition comprising a solvent, the organic semiconductor and a protic ionic liquid on a substrate; and removing the solvent. A process for producing a semiconductor device comprising a process for doping an organic semiconductor according to the invention is also described. Finally, a high purity p-dopant composition is described.
Opening claim text (preview).
1 . A process for producing a p-doped organic semiconductor comprising treating an organic semiconductor with a composition comprising an oxidised salt of the organic semiconductor, which oxidised salt of the organic semiconductor is a salt of formula [OS][A], wherein OS is a cation of an organic semiconductor and A is ClO 4 − , NO 3 − or an anion of formula (i), (ii), (iii) or (iv) wherein each X is the same or different and is an electron withdrawing group, optionally wherein X is CF 3 or CF 2 CF 3 . 2 . A process according to claim 1 which comprises treating the organic semiconductor with a composition comprising from 80 to 100 wt % of the oxidised salt of the organic semiconductor. 3 . A process according to claim 1 wherein the organic semiconductor comprises: an organic semiconductor comprising a triarylamine moiety, an organic semiconductor comprising a conjugated polymer, an organic semiconductor comprising a conjugated oligomer, or an organic semiconductor comprising a polycyclic aromatic hydrocarbon. 4 . A process according to claim 1 wherein the organic semiconductor comprises a compound of formula (V), (I), (II), (III), (IV), (VI) or (VII): wherein: each A 1 is the same or different and is an unsubstituted or substituted aryl ring or an unsubstituted or substituted heteroaryl ring; L is a conjugated linker; n is 3 or 4; and m is an integer of 2 or more. 5 . A process according to claim 1 wherein the organic semiconductor comprises unsubstituted or substituted polythiophene or an unsubstituted or substituted oligothiophene. 6 . A process according to claim 1 wherein the organic semiconductor comprises a compound of formula (V) or (Vb): wherein each A 1 is the same or different and is an unsubstituted or substituted aryl ring or an unsubstituted or substituted heteroaryl ring; wherein each R 1 is the same or different and is a group selected from hydrogen, C 1-8 alkyl, C 2-8 alkenyl, C 2-8 alkynyl, C 1-8 alkoxy, hydroxyl, mono-C 1-8 alkylamino, di-C 1-8 alkylamino, amino, halide, cyano, nitro, and thiol. 7 . A process according to claim 1 wherein A is bis(trifluoromethanesulfonyl)imide, bis(pentafluoroethanesulfonyl)imide, bis(perfluoropropanesulfonyl)imide, trifluoroacetate, or trifluoromethanesulfonate. 8 . A process according to claim 1 wherein the process further comprises producing the oxidised salt of the organic semiconductor by a process comprising: (a) treating the organic semiconductor with an oxidant to produce an oxidation product; (b) isolating the oxidation product; (c) performing an anion exchange with A on the oxidation product to produce an oxidised salt of the organic semiconductor comprising A, wherein A is as defined in claim 21 and (d) isolating the oxidised salt of the organic semiconductor. 9 . A process according to claim 8 wherein the oxidant comprises a compound selected from percyanocarbon compounds, quinone compounds, chloroquinone compounds, halogen compounds or interhalogen compounds; a cation selected from triarylaminium radical cations, heterocyclic radical cations, triarylcarbenium cations, tropylium cations, complex cations of metals or nitrosonium cation; or an anion selected from a hexacyanotrimethylenecyclopropane radical anion [C 3 {C(CN) 2 } 3 ] − , or a hexachloroplatinate anion [PtCl 6 ] 2- . 10 . A process according to claim 8 wherein the oxidant comprises a compound selected from TCNE, TCNQ, F4TCNQ, DDQ, 1,2-benzoquinone, 1,4-benzoquinone, 1,4-napthoquinone, dichlorobenzoquinone, chloranil, fluorine, chlorine, bromine, or iodine; or a cation selected from [NAr 3 ] + , thianthrene cation, phenoxathiin cation, phenothiazine cation, N-methylphenothiazine cation, N-phenylphenothiazine cation, [CAr 3 ] + , [Ru(phen) 3 ] 3+ , [Fe(bipy) 3 ] 3+ , [Fe(η-C 5 H 4 COMe) 2 ] + , [Fe(η-C 5 H 4 COMe)Cp] + , or [FeCp 2 ] + ; wherein Ar is an unsubstituted or substituted aryl group. 11 . A process according to claim 8 wherein the oxidant comprises a cation selected from [N(4-C 6 H 4 Br) 3 ] + , [N(2,4-C 6 H 3 Br 2 ) 3 ] + , [N(2,4,6-C 6 H 2 Br 3 ) 3 ] + , N(4-C 6 H 4 Cl) 3 ] + , [N(2,4-C 6 H 3 Cl 2 ) 3 ] + , [N(2,4,6-C 6 H 2 Cl 3 ) 3 ] + , [N(C 6 Cl 5 ) 3 ] + , [N(4C 6 H 4 —CN) 3 ] + , [N(4-C 6 H 4 CO 2 Me) 3 ] + , [N(4-C 6 H 4 Me) 3 ] + , [N(4-C 6 H 4 OMe) 3 ] + , or [N(4-C 6 H 4 NO 2 ) 3 ] + . 12 . A process according to claim 8 wherein the oxidant comprises an anion selected from [SbCl 6 ] − , [BCl 4 ] − , [AlCl 4 ] − , [PF 6 ] − , [SbF 6 ] − , [BF 4 ] − , [AlF 4 ] − , [ClO 4 ] − , or [NO 3 ] − . 13 . A process according to claim 8 wherein the oxidant comprises [N(4-C 6 H 4 Br) 3 ][SbCl 6 ] or [N(4-C 6 H 4 Br) 3 ][SbF 6 ]. 14 . A process according to claim 8 wherein the amount of the oxidant is from 1 to 2 equivalents relative to the amount of the organic semiconductor. 15 . A process according to claim 8 wherein (c) comprises treating the oxidation product with a salt comprising A. 16 . A process according to claim 8 wherein (c) comprises treating the oxidation product with a salt of formula [M][A], wherein M is a cation selected from metal cations, ammonium cations or a sulfonium cation. 17 . A process according to claim 16 wherein M is selected from Li + , Na + , K + , Be 2+ , Mg 2+ , Ca 2+ , Ag + or Zn 2+ . 18 . A process according to claim 8 wherein (c) comprises treating the oxidation product with a salt selected from LiTFSI, NaTFSI, KTFSI, AgTFSI, Zn(TFSI) 2 , LiBETI, NaBETI, KBETI, AgBETI, Zn(BETI) 2 . 19 . A process according to claim 8 wherein (c) comprises treating the oxidation product with 10 to 30 equivalents of a salt comprising the anion A. 20 . A process according to claim 1 wherein the organic semiconductor is treated with from 0.1 to 50 mol % of the oxidised salt of the organic semiconductor relative to the amount of the organic semiconductor. 21 . A process for producing a layer of p-doped organic semiconductor comprising: (a) producing a p-doped organic semiconductor by a process comprising treating an organic semiconductor with a composition comprising an oxidised salt of the organic semiconductor, which oxidised salt of the organic semiconductor is a salt of formula [OS][A], wherein OS is a cation of an organic semiconductor and A is ClO 4 − , NO 3 − or an anion of formula (i), (ii), (iii) or (iv) wherein each X is the same or different and is an electron withdrawing group, optionally wherein X is CF 3 or CF 2 CF 3 ; (b) disposing on a substrate a composition comprising a solvent and the p-doped organic semiconductor; and (c) removing the solvent. 22 . A process according to claim 21 wherein the composition disposed on the substrate further comprises LiTFSI and/or tert-butyl pyridine. 23 . A process according to claim 22 wherein the composition comprises from 1 to 40 mol % LiTFSI and from 50 to 150 mol % tert-butyl py
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