Multi-block sputtering target with interface portions and associated methods and articles

Patent metadata

Field	Value
Publication number	US-2016196962-A1
Application number	US-201615067652-A
Country	US
Kind code	A1
Filing date	Mar 11, 2016
Priority date	May 9, 2012
Publication date	Jul 7, 2016
Grant date	—

Abstract

A sputtering target that includes at least two consolidated blocks, each block including an alloy including a first metal (e.g., a refractory metal such as molybdenum in an amount greater than about 30 percent by weight) and at least one additional alloying ingredient; and a joint between the at least two consolidated blocks, the joint being prepared free of any microstructure derived from a diffusion bond of an added loose powder. A process for making the target includes hot isostatically pressing (e.g., below a temperature of 1080° C.), consolidated preform blocks that, prior to pressing, have interposed between the consolidated powder metal blocks at least one continuous solid interface portion. The at least one continuous solid interface portion may include a cold spray body, which may be a mass of cold spray deposited powders on a surface a block, a sintered preform, a compacted powder body (e.g., a tile), or any combination thereof.

First claim

What is claimed is:

1 . A sputtering target, comprising:
a. at least two consolidated blocks, each block including an alloy including molybdenum in an amount greater than about 30 percent by weight and at least one additional alloying element; b. at least one continuous solid interface portion derived from a cold spray deposition, a sintered preform body, a compacted powder body or any combination thereof; and c. a joint between the at least two consolidated blocks, which joins the blocks together to define a target body, the joint including the at least one continuous solid interface portion, wherein the sputtering target along the joint exhibits a transverse rupture strength per ASTM B528-10, of at least about 400 MPa.

2 . The sputtering target of claim 1 , wherein throughout the target body there is a substantially continuous and uniform distribution of three phases.

3 . The sputtering target of claim 2 , wherein throughout the target body there is a substantially continuous and uniform distribution of a substantially pure molybdenum phase, a substantially pure phase of the at least one additional alloying element and a third phase that includes an alloy of molybdenum and the at least one additional alloying element.

4 . The sputtering target of claim 3 , wherein the at least one additional alloying element includes titanium.

5 . The sputtering target of claim 4 , wherein the amount of the substantially pure molybdenum phase is about 30 to about 60 vol % of the sputtering target body.

6 . The sputtering target of claim 5 , wherein the amount of the substantially pure molybdenum phase is less than about 48 vol % of the sputtering target body.

7 . The sputtering target of claim 6 , wherein the amount of the substantially pure phase of the at least one additional alloying element is about 5 to about 25 vol %.

8 . The sputtering target of claim 7 , wherein the substantially pure phase of the at least one additional alloying element is titanium and is present in an amount less than about 10 vol %.

9 . The sputtering target of claim 7 , wherein the amount of the alloy of molybdenum and the at least one additional alloying element is about 40 to about 65 vol %.

10 . The sputtering target of claim 7 , wherein the alloy of molybdenum and the at least one additional alloying element includes a β-phase of molybdenum and titanium, in an amount greater than about 40 vol % of the alloy, of the target, or both.

11 - 20 . (canceled)

21 . The sputtering target of claim 1 , wherein the continuous solid interface portion includes a cold spray deposition onto an edge surface of at least one of the consolidated blocks.

22 . The sputtering target of claim 21 , wherein the continuous solid interface portion is a cold spray deposition onto a first edge surface of one of the consolidated blocks and a cold spray deposition onto a second edge surface of a different consolidated block, wherein the first edge surface and the second edge surface are contacted and joined surfaces.

23 . The sputtering target of claim 22 , wherein the continuous solid interface portion is interposed between the two consolidated blocks.

24 . The sputtering target of claim 23 , wherein the two or more consolidated blocks have the same composition, and wherein the sputtering target includes the molybdenum and at least one alloying element selected from titanium, chromium, niobium, tantalum, tungsten, zirconium, or any combination thereof.

25 . The sputtering target of claim 24 , wherein the at least one alloying element is tantalum or niobium.

26 . The sputtering target of claim 24 , wherein the at least one alloying element is tantalum and the sputtering target has a microstructure that is characterized as including a pure titanium phase, a pure molybdenum phase and an alloy phase of titanium and molybdenum.

27 . The sputtering target of claim 23 , the consolidated joint of the sputtering target has a transverse rupture strength per ASTM B528-10, of at least about 620 MPa.

28 . The sputtering target of claim 23 , wherein the continuous solid interface portion is a cold spray deposition having a porosity of 5 to 25% by volume as measured by ASTM B962-08 prior to the step of isostatically pressing the contacted structure.

29 . The sputtering target of claim 1 , wherein the continuous solid interface portion is a tile having a density of 60% to 85% of theoretical density prior to the step of isostatically pressing the contacted structure.

30 . A material system for forming a sputtering target comprising: two or more consolidated blocks including:
a. a first consolidated block having a first edge surface; and b. a second consolidated block having a second edge surface;
wherein the first and second consolidated blocks include about 30 to about 70 atomic percent molybdenum,
the first edge surface includes a cold spray deposition having a porosity of 5 to 25 volume percent as measured by ASTM B962-08;
the first consolidate block and the second consolidated block have a surface having a combined area of 1.5 m 2 or more; and
the first and second edge surfaces are in direct contact with the cold spray deposition interposed between the first and second consolidated blocks.

31 . The material system of claim 30 , wherein the first consolidated block and the second consolidated block are encapsulated in a sealed vessel.

Assignees

• Starck H C Inc

Inventors

• Rozak Gary Alan
• Gaydos Mark E
• Michaluk Christopher

Classifications

• B22F7/064

  using an intermediate powder layer · CPC title

• C23C14/3407 Primary

  Cathode assembly for sputtering apparatus, e.g. Target · CPC title

• C22C27/04

  Alloys based on tungsten or molybdenum · CPC title

• C23C14/3414 Primary

  Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy · CPC title

• B22F3/15 Primary

  Hot isostatic pressing · CPC title