Voltage control for crosspoint memory structures

US2016189775A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2016189775-A1
Application numberUS-201314908667-A
CountryUS
Kind codeA1
Filing dateJul 31, 2013
Priority dateJul 31, 2013
Publication dateJun 30, 2016
Grant date

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Abstract

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The present disclosure provides a memory cell that includes a resistive memory element disposed between a first conductor and a second conductor, the first conductor and the second conductor configured to activate the resistive memory element. The memory cell also includes a diode disposed in parallel with the memory element between the first conductor and the second conductor.

First claim

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What is claimed is: 1 . A memory cell, comprising: a resistive memory element disposed between a first conductor and a second conductor, the first conductor and the second conductor configured to activate the resistive memory element; and a diode disposed in parallel with the memory element between the first conductor or the second conductor. 2 . The memory cell of claim 1 , wherein the resistive memory element comprises at least one of a memristor, a Phase Change Material resistor, a conductive bridge resistor, and a transition metal oxide based resistor. 3 . The memory cell of claim 1 , wherein a first conduction threshold voltage of the diode is approximately equal to a designed set voltage of the memory element and a second conduction threshold voltage of the diode is approximately equal to a designed reset voltage of the memory element. 4 . The memory cell of claim 3 , wherein the first conduction threshold voltage of the diode is the forward conduction mode threshold voltage and a second conduction threshold voltage of the diode is the reverse conduction mode threshold voltage. 5 . The memory cell of claim 1 , wherein the diode is a Zener diode or an avalanche diode. 6 . A data storage device, comprising a memory cell array comprising a plurality memory cells; word lines electrically coupled to the plurality of memory cells; and bit lines electrically coupled to the plurality of memory cells, wherein each memory cell in the plurality of memory cells lies at a crosspoint of one of the word lines and one of the bit lines; wherein each of the plurality of memory cells comprises: a resistive memory element disposed between one of the word lines and one of the bit lines; and a diode disposed in parallel with the memory element between the the word line and the bit line. 7 . The data storage device of claim 6 , wherein the resistive memory element comprises at least one of a Resistive Random Access Memory (RRAM) element, a Spin-Transfer Torque Random Access Memory (STT-RAM) element, a conductive bridge resistor, and a transition metal oxide based resistor. 8 . The data storage device of claim 6 , wherein a first conduction threshold voltage of the diode is approximately equal to a designed set voltage of the memory element and a second conduction threshold voltage of the diode is approximately equal to a designed reset voltage of the memory element. 9 . The data storage device of claim 8 , wherein the first conduction threshold voltage of the diode is the forward conduction mode threshold voltage and a second conduction threshold voltage of the diode is the reverse conduction mode threshold voltage. 10 . The data storage device of claim 6 , wherein the memory cell array is a multi-layer array comprising alternating layers of memory cells, bit lines, and word lines. 11 . The data storage device of claim 6 , wherein a selected memory cell is configured to be read by applying a voltage across the word line and the bit line corresponding to the selected memory cell, a magnitude of the voltage being less than a magnitude of a threshold voltage of the diode. 12 . A method of forming a memory cell, comprising: disposing a resistive memory element between two electrodes; disposing a diode in parallel with the resistive memory element between the two electrodes. 13 . The method of claim 12 , wherein disposing the resistive memory element comprises forming a memristor. 14 . The method of claim 12 , wherein disposing the diode comprises forming a zener diode or an avalanche diode. 15 . The method of claim 12 , wherein disposing the diode comprises forming a diode with a first conduction threshold voltage approximately equal to a designed set voltage of the memory element and a second conduction threshold voltage approximately equal to a designed reset voltage of the memory element.

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What does patent US2016189775A1 cover?
The present disclosure provides a memory cell that includes a resistive memory element disposed between a first conductor and a second conductor, the first conductor and the second conductor configured to activate the resistive memory element. The memory cell also includes a diode disposed in parallel with the memory element between the first conductor and the second conductor.
Who is the assignee on this patent?
Hewlett Packard Entpr Dev Lp
What technology area does this patent fall under?
Primary CPC classification G11C13/003. Mapped technology areas include Physics.
When was this patent published?
Publication date Thu Jun 30 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).