High-throughput batch porous silicon manufacturing equipment design and processing methods

Patent metadata

Field	Value
Publication number	US-2016186358-A1
Application number	US-201514792412-A
Country	US
Kind code	A1
Filing date	Jul 6, 2015
Priority date	Jan 15, 2009
Publication date	Jun 30, 2016
Grant date	—

Abstract

This disclosure enables high-productivity fabrication of porous semiconductor layers (made of single layer or multi-layer porous semiconductors such as porous silicon, comprising single porosity or multi-porosity layers). Some applications include fabrication of MEMS separation and sacrificial layers for die detachment and MEMS device fabrication, membrane formation and shallow trench isolation (STI) porous silicon (using porous silicon formation with an optimal porosity and its subsequent oxidation). Further, this disclosure is applicable to the general fields of photovoltaics, MEMS, including sensors and actuators, stand-alone, or integrated with integrated semiconductor microelectronics, semiconductor microelectronics chips and optoelectronics.

First claim

What is claimed is:

1 . A bath-in-bath batch processing apparatus for producing porous semiconductor on a plurality of semiconductor wafers, comprising:
an electrolyte-filled outer housing; an electrolyte-filled inner housing removable from said outer housing, said inner housing operable to open and close, and forming a seal when closed; an anode disposed at a first end of said inner housing; a cathode disposed at an opposite end of said inner housing, said anode and said cathode coupled to electrical circuitry capable of providing an electrical power comprising electrical voltage and current; a plurality of semiconductor wafers arranged between said anode and said cathode, wherein each said wafer is held in place by a peripheral wafer clamp disposed around a peripheral of said wafer, said peripheral wafer clamp allowing substantially all of a front and a back surface of each said wafer exposure to said electrolyte; a plurality of vent ports in said inner housing for allowing evolved hydrogen gas to escape, said vent ports extending beyond a surface of said electrolyte to prevent current leakage through said vent ports; and a plurality of fluid fill ports in said inner housing for replenishing said electrolyte and sweeping said hydrogen gas away from said plurality of wafers.

2 . The apparatus of claim 1 , further comprising a conductive anode membrane separating said anode from said plurality of semiconductor wafers.

3 . The apparatus of claim 1 , further comprising a conductive cathode membrane separating said cathode from said plurality of semiconductor wafers.

4 . The apparatus of claim 1 , wherein said electrical circuitry is operable to produce a graded porosity layer of porous semiconductor comprising at least two different porosities on said plurality of semiconductor wafers.

5 . The apparatus of claim 4 , wherein said graded porosity layer comprises a higher porosity in depth compared to a lower porosity on the surface.

6 . The apparatus of claim 1 , wherein said electrical circuitry is operable to produce a multilayer of porous semiconductor on said plurality of semiconductor wafers, said multilayer comprising discrete layers of porous semiconductor having at least two different porosities.

7 . The apparatus of claim 6 , wherein said multilayer comprises a buried porous semiconductor layer with a higher porosity value and a surface porous semiconductor layer with a lower porosity value.

8 . The apparatus of claim 1 , wherein said electrical circuitry is operable to produce a porous semiconductor layer on both sides of each of said plurality of semiconductor wafers by switching a voltage polarity and current direction during the porous semiconductor formation process.

9 . The apparatus of claim 1 , wherein said semiconductor wafers are crystalline silicon wafers and said porous semiconductor is porous silicon.

10 . The apparatus of claim 1 , further comprising a loading and unloading mechanism for transferring said inner housing into and out of said outer housing.

11 . The apparatus of claim 1 , further comprising a loading and unloading mechanism for transferring batches of said semiconductor wafers into and out of said inner housing.

12 . The apparatus of claim 1 , wherein said semiconductor wafers are circular shaped.

13 . The apparatus of claim 1 , wherein said semiconductor wafers are square shaped.

14 . The apparatus of claim 1 , wherein said semiconductor wafers are crystalline silicon wafers.

15 . The apparatus of claim 1 , wherein said inner housing may open in multiple sections.

Assignees

• Solexel Inc

Inventors

• Yonehara Takao
• Tamilmani Subramanian
• Kramer Karl-Josef
• Ashjaee Jay
• Moslehi Mehrdad M
• Miyaji Yasuyoshi
• Hayashi Noriyuki
• Inahara Takamitsu

Classifications

• H10P90/15

  by making porous regions on the surface · CPC title

• H10P72/7624

  characterised by the mechanical construction of the susceptor, stage or support · CPC title

• H10P72/7621

  characterised by supporting two or more semiconductor substrates · CPC title

• H10P72/7606

  characterised by edge clamping, e.g. clamping ring · CPC title

• H10P72/3412

  Batch transfer of wafers · CPC title