Acid mist suppression in copper electrowinning
US-12098474-B2 · Sep 24, 2024 · US
US2016186346A1 · US · A1
| Field | Value |
|---|---|
| Publication number | US-2016186346-A1 |
| Application number | US-201414585228-A |
| Country | US |
| Kind code | A1 |
| Filing date | Dec 30, 2014 |
| Priority date | Dec 30, 2014 |
| Publication date | Jun 30, 2016 |
| Grant date | — |
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Reaction products of one or more amino acids and one or more epoxies are included in copper and copper alloy electroplating baths to provide good throwing power. Such reaction products may plate copper and copper alloys with good surface properties and good physical reliability.
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What is claimed is: 1 . A compound comprising a reaction product of one or more amino acids and one or more epoxies. 2 . The compound of claim 1 , wherein the reaction product further comprises one or more non-amino acid amines. 3 . The compound of claim 1 , wherein the one or more amino acids are chosen from α-amino acids, β-amino acids and γ-amino acids. 4 . The compound of claim 3 , wherein the one or more α-amino acids are chosen from arginine, alanine, glycine, tryptophan, asparagine, lysine, histidine, tyrosine, glutamine, proline and salts thereof. 5 . The compound of claim 1 , wherein a molar ratio of a moiety from the amino acid to a moiety from the epoxide ranges from 0.5:2-2:0.5. 6 . The compound of claim 1 , wherein the one or more epoxide compounds have a formula: Wherein Y, R 2 and R 3 may be the same or different and are chosen from hydrogen and (C 1 -C 4 )alkyl, X is a halogen, A=OR 4 or R 5 ; R 4 ═((CR 6 R 7 ) m O), (aryl-O) p , CR 6 R 7 —Z—CR 6 CR 7 , or OZ′ t O, R 5 ═(CH 2 ) y , B is (C 5 -C 12 )cycloalkyl, Z=a 5- or 6-membered ring, Z′ is R 8 OArOR 8 , (R 9 O) b Ar(OR 9 ), or (R 9 O) b , Cy(OR 9 ), Cy=(C 5 -C 12 )cycloalkyl, R 6 and R 7 are independently chosen from hydrogen, methyl, or hydroxyl, R 8 represents (C 1 -C 8 )alkyl, R 9 represents a (C 2 -C 6 )alkyleneoxy, R 10 is a hydrogen atom, a formyl group, or one or two glycidyl ether groups each optionally containing a carbonyl group constituted by C 4 -C 8 and C 2 -C 4 , R 11 is a hydrogen atom, a methyl group or an ethyl group, and R 12 is a hydrogen atom, a formyl group, or one or two glycidyl ether groups each optionally containing a carbonyl group constituted by C 4 -C 8 and C 2 -C 4 , b=1-10, m=1-6, n=1-4, p=1-6, t=1-4 and y=0-6. 7 . A composition comprising one or more sources of copper ions, an electrolyte and one or more compounds comprising a reaction product of one or more amino acids and one or more epoxies. 8 . A method comprising: a) providing a substrate; b) providing a composition comprising one or more sources of copper ions, an electrolyte and one or more compounds comprising a reaction product of one or more amino acids and one or more epoxies; c) contacting a substrate with the composition; d) applying a current to the substrate and the composition; and e) depositing copper or copper alloy on the substrate. 9 . The method of claim 9 , wherein the one or more sources or metal ions are chosen from copper salts and tin salts. 10 . The method of claim 9 wherein the substrate comprises a plurality of one or more of through-holes, trenches and vias.
containing only hydrogen and carbon atoms in addition to the ring oxygen atoms · CPC title
Electroplating characterised by the article coated · CPC title
containing more than 50% by weight of copper · CPC title
by etherified hydroxyl radicals · CPC title
of copper · CPC title
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