Cleaning composition for removing oxide and method of cleaning using the cleaning composition

Patent metadata

Field	Value
Publication number	US-2016186100-A1
Application number	US-201514808128-A
Country	US
Kind code	A1
Filing date	Jul 24, 2015
Priority date	Dec 24, 2014
Publication date	Jun 30, 2016
Grant date	—

Abstract

The present disclosure relates to a cleaning composition for removing an oxide including an acid selected from an organic acid, an inorganic acid, and a combination thereof; a salt selected from an organic salt, an inorganic salt, and a combination thereof; a surfactant; and water, and a method of cleaning using the cleaning composition.

First claim

What is claimed is:

1 . A cleaning composition for removing an oxide, comprising:
an acid selected from an organic acid, an inorganic acid, and a combination thereof; a salt selected from an organic salt, an inorganic salt, and a combination thereof; a surfactant; and water.

2 . The cleaning composition of claim 1 , wherein based on 100 wt % of the cleaning composition for removing the oxide, an amount of the acid is in a range of about 0.1 wt % to about 50 wt %, an amount of the salt is in a range of about 0.1 wt % to about 35 wt %, an amount of the surfactant is in an range of about 0.1 wt % to about 15 wt %, and the remainder is water.

3 . The cleaning composition of claim 1 , wherein based on 100 wt % of the cleaning composition for removing the oxide, an amount of the acid is in a range of about 0.1 wt % to about 35 wt %, an amount of the salt is in a range of about 0.1 wt % to about 20 wt %, an amount of the surfactant is in a range of about 0.1 wt % to about 3 wt %, and the remainder is water.

4 . The cleaning composition of claim 1 , wherein the acid is an organic acid.

5 . The cleaning composition of claim 1 , wherein the acid is an inorganic acid.

6 . The cleaning composition of claim 1 , wherein the organic acid comprises at least one carboxylic acid selected from an acetic acid, a formic acid, a propionic acid, a butyric acid, an isobutyric acid, a valeric acid, an ethylmethyl acetic acid, a trimethyl acetic acid, a succinic acid, an adipic acid, a citric acid, an oxalic acid, a lactic acid, a tartaric acid, a malic acid, an ascorbic acid, and a malonic acid.

7 . The cleaning composition of claim 1 , wherein the inorganic acid comprises at least one acid selected from a sulfuric acid, a hydrochloric acid, a phosphoric acid, a nitric acid, and a perchloric acid.

8 . The cleaning composition of claim 1 , wherein the salt comprises at least one salt selected from an inorganic salt comprising at least one of a sulfate, a phosphate, a hydrochloride, and a nitrate; and an organic salt comprising at least one of carboxylate and sulfonate.

9 . The cleaning composition of claim 1 , wherein the salt comprises at least one salt selected from
an inorganic salt comprising at least one of a sodium sulfate, a potassium sulfate, a magnesium sulfate, and an ammonium sulfate; and an organic salt comprising at least one of a sodium acetate, a potassium acetate, a sodium citrate, and a potassium citrate.

10 . The cleaning composition of claim 1 , wherein the surfactant comprises at least one surfactant selected from
an anionic surfactant comprising at least one of an alkyl sulfate, an alkyl ether sulfate, an alkyl sulfonate, an alkyl ether sulfonate, an alkyl phosphate, an alkyl ether phosphate, an alkyl carbonate, and an alkyl ether carbonate; and a nonionic surfactant comprising at least one of a polyoxyethylene alkyl ether, a polyoxyethylene fatty acid ester, a polyoxyethylene alkyl phenol ether, a sorbitan fatty acid ester, a polyoxyethylene sorbitan fatty acid ester, and a sucrose fatty acid ester.

11 . The cleaning composition of claim 1 , wherein the cleaning composition is capable of reducing at least one oxide of a metal selected from iron (Fe), cobalt (Co), chromium (Cr), manganese (Mn), nickel (Ni), titanium (Ti), molybdenum (Mo), a steel use stainless (SUS) alloy, an Inconel alloy, a Kovar alloy, and an Invar alloy.

12 . A method of cleaning, the method comprising:
preparing a mask base material comprising an oxide; and performing a first cleaning by contacting the cleaning composition of claim 1 with the mask base material.

13 . The method of claim 12 , wherein the mask base material comprises at least one metal selected from Fe, Co, Cr, Mn, Ni, Ti, Mo, an SUS alloy, an Inconel alloy, a Kovar alloy, and an Invar alloy.

14 . The method of claim 12 , wherein the oxide naturally formed in response to irradiating the mask base material with a laser.

15 . The method of claim 12 , wherein the first cleaning comprises contacting the cleaning composition with the mask base material by using a spray method, a spin coating, or a dipping method.

16 . The method of claim 12 , wherein the first cleaning comprises using a dipping method in a temperature range of about 10° C. to about 50° C. for about 60 minutes to about 1440 minutes.

17 . The method of claim 12 , further comprising at least one of, after the first cleaning is complete,
performing a second cleaning by using a cleaning mixture comprising a first alcohol, a surfactant, and water; performing a third cleaning by using distilled water; and performing a fourth cleaning by using a second alcohol.

18 . The method of claim 17 , wherein the second cleaning, third cleaning, and fourth cleaning are performed consecutively after the first cleaning is complete.

19 . The method of claim 17 , wherein the second cleaning comprises using a dipping method in a temperature range of about 10° C. to about 50° C. for about 60 minutes to about 120 minutes.

20 . The method of claim 17 , wherein the surfactant in the cleaning mixture used in the second cleaning comprises
at least one surfactant selected from an anionic surfactant comprising at least one of an alkyl sulfate, an alkyl ether sulfate, an alkyl sulfonate, an alkyl ether sulfonate, an alkyl phosphate, an alkyl ether phosphate, an alkyl carbonate, and an alkyl ether carbonate; and a nonionic surfactant comprising at least one of a polyoxyethylene alkyl ether, a polyoxyethylene fatty acid ester, a polyoxyethylene alkyl phenol ether, a sorbitan fatty acid ester, a polyoxyethylene sorbitan fatty acid ester, and a sucrose fatty acid ester, and the first alcohol and the second alcohol each independently comprise at least one alcohol selected from methanol, ethanol, pentanol, 2-methyl-2-butanol, 3-methyl-2-butanol, n-propanol, iso-propanol, butanol, iso-butyl alcohol, 2-butanol, 2-methyl-2-propanol, hexanol, cyclohexanol, benzyl alcohol, propyl alcohol, ethylene glycol, propylene glycol, diethylene glycol, glycerine, and dipropylene glycol.

Assignees

• Samsung Display Co Ltd

Inventors

• Im Sungsoon
• Hwang Kyuhwan
• Kong Inho
• Kim Changsub
• Kim Hotae
• Jin Jaehwan
• Hwang Donguk

Classifications

• H10P70/50

  characterised by the part to be cleaned · CPC title

• C11D3/046

  Salts · CPC title

• B08B3/08

  the liquid having chemical or dissolving effect · CPC title

• C11D3/2086 Primary

  Hydroxy carboxylic acids-salts thereof · CPC title

• C11D3/2075

  Carboxylic acids-salts thereof · CPC title