Techniques for controlling equivalent series resistance of a capacitor

US2016183386A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2016183386-A1
Application numberUS-201514617864-A
CountryUS
Kind codeA1
Filing dateFeb 9, 2015
Priority dateDec 19, 2014
Publication dateJun 23, 2016
Grant date

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  7. Citations and related patents

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Abstract

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Methods and apparatus for controlling an equivalent-series resistance (ESR) of a capacitor are provided. An exemplary apparatus includes a substrate having a land side, the capacitor mounted on the land side of the substrate and having both the ESR and terminals, a resistive pattern coupled to the terminals, and a plurality of vias coupled to the resistive pattern. The resistive pattern is configured to control the ESR. The resistive pattern can be formed of a resistive paste. The resistive pattern can be formed in a substantially semicircular shape having an arc ranging from substantially 45 degrees to substantially 135 degrees. The capacitor can be a surface mount device. The resistive pattern can be formed in a shape of a land-side capacitor mounting pad, a via, or both.

First claim

Opening claim text (preview).

What is claimed is: 1 . An apparatus, comprising: a substrate having a land side; a capacitor mounted on the land side of the substrate and having an equivalent series resistance (ESR) and terminals; a resistive pattern coupled to the terminals; and a plurality of vias coupled to the resistive pattern, wherein the resistive pattern is configured to control the ESR. 2 . The apparatus of claim 1 , wherein the resistive pattern is formed of a resistive paste. 3 . The apparatus of claim 1 , wherein the resistive pattern is formed in a substantially semicircular shape having an arc ranging from substantially 45 degrees to substantially 135 degrees. 4 . The apparatus of claim 1 , wherein the resistive pattern is formed in a substantially semicircular shape that is substantially centered on an axis and varies in cross-section along a radius extending from the axis. 5 . The apparatus of claim 1 , wherein the resistive pattern has a substantially right-angle bend. 6 . The apparatus of claim 1 , wherein the resistive pattern is formed in a shape of a land-side capacitor mounting pad, a via, or both. 7 . The apparatus of claim 1 , wherein the capacitor includes at least one electrically conductive mounting pad, electrically conductive pin, or electrically conductive ball. 8 . The apparatus of claim 1 , wherein the capacitor is a surface mount device. 9 . The apparatus of claim 1 , further comprising a base station of which the apparatus is a constituent part, a mobile device of which the apparatus is a constituent part, or both. 10 . A method for fabricating a capacitor pad formed of conductive paste, comprising: forming a via in a substrate; forming a patterned resist layer on the via; removing a portion of the patterned resist layer adjacent to the via to define a cavity adjacent to the via; at least partially filling the cavity with conductive paste; and mounting an electrical contact of a capacitor to the conductive paste. 11 . The method of claim 10 , wherein the conductive paste is formed in a substantially semicircular shape having an arc ranging from substantially 45 degrees to substantially 135 degrees. 12 . The method of claim 10 , wherein the conductive paste is formed in a substantially semicircular shape that is substantially centered on an axis and varies in cross-section along a radius extending from the axis. 13 . The method of claim 10 , wherein the conductive paste is formed in a substantially right-angle bend. 14 . The method of claim 10 , wherein the electrical contact of the capacitor includes at least one electrically conductive mounting pad, electrically conductive pin, or electrically conductive ball. 15 . The method of claim 10 , wherein the capacitor is a surface mount device. 16 . The method of claim 10 , further comprising integrating the substrate into a base station, integrating the substrate into a mobile device, or both. 17 . A method for fabricating a capacitor pad and a via, comprising: forming, on a substrate, a laminated layer including a cavity defining the via and the capacitor pad; forming a patterned resist layer on the laminated layer, wherein the patterned resist layer has a pattern; at least partially filling, through the pattern in the patterned resist layer, the cavity with a conductive paste; removing the patterned resist layer; and mounting an electrical contact of a capacitor to the conductive paste. 18 . The method of claim 17 , wherein the conductive paste is formed in a substantially semicircular shape having an arc ranging from substantially 45 degrees to substantially 135 degrees. 19 . The method of claim 17 , wherein the conductive paste is formed in a substantially semicircular shape that is substantially centered on an axis and varies in cross-section along a radius extending from the axis. 20 . The method of claim 17 , wherein the conductive paste is formed in a substantially right-angle bend. 21 . The method of claim 17 , wherein the electrical contact of the capacitor includes at least one electrically conductive mounting pad, electrically conductive pin, or electrically conductive ball. 22 . The method of claim 17 , wherein the capacitor is a surface mount device. 23 . The method of claim 17 , further comprising integrating the substrate into a base station, integrating the substrate into a mobile device, or both. 24 . An apparatus, comprising: a substrate having a land side; a capacitor mounted on the land side of the substrate and having an equivalent series resistance (ESR) and terminals; a means for providing a resistance, wherein the means for providing the resistance is coupled to the terminals and is configured to control the ESR; and a plurality of vias coupled to the means for providing the resistance. 25 . The apparatus of claim 24 , wherein the means for providing the resistance is formed of a resistive paste. 26 . The apparatus of claim 24 , wherein the means for providing the resistance is formed in a substantially semicircular shape having an arc ranging from substantially 45 degrees to substantially 135 degrees. 27 . The apparatus of claim 24 , wherein the means for providing the resistance is formed in a substantially semicircular shape that is substantially centered on an axis and varies in cross-section along a radius extending from the axis. 28 . The apparatus of claim 24 , wherein the means for providing the resistance has a substantially right-angle bend. 29 . The apparatus of claim 24 , wherein the means for providing the resistance is formed in a shape of a land-side capacitor mounting pad, a via, or both. 30 . The apparatus of claim 24 , further comprising a base station of which the substrate is a constituent part, a mobile device of which the substrate is a constituent part, or both.

Assignees

Inventors

Classifications

  • incorporating printed resistors · CPC title

  • Multilayer circuits · CPC title

  • Non-printed capacitor · CPC title

  • having edge contacts, e.g. leadless chip capacitors, chip carriers · CPC title

  • Printed circuits associated with mounted high frequency components · CPC title

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What does patent US2016183386A1 cover?
Methods and apparatus for controlling an equivalent-series resistance (ESR) of a capacitor are provided. An exemplary apparatus includes a substrate having a land side, the capacitor mounted on the land side of the substrate and having both the ESR and terminals, a resistive pattern coupled to the terminals, and a plurality of vias coupled to the resistive pattern. The resistive pattern is conf…
Who is the assignee on this patent?
Qualcomm Inc
What technology area does this patent fall under?
Primary CPC classification H05K1/0231. Mapped technology areas include Electricity.
When was this patent published?
Publication date Thu Jun 23 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).