Apparatus for analyzing thin film

Patent metadata

Field	Value
Publication number	US-2016178541-A1
Application number	US-201514972879-A
Country	US
Kind code	A1
Filing date	Dec 17, 2015
Priority date	Dec 19, 2014
Publication date	Jun 23, 2016
Grant date	—

Abstract

An apparatus analyzes a thin film having multiple layers. The apparatus includes an X-ray generator, a detector, and a signal processor. The X-ray generator radiates multi-wavelength X-rays sequentially onto a substrate stacked with the multi-layer thin film. The detector detects the multi-wavelength X-rays reflected from the substrate. The signal processor analyzes the multi-wavelength X-rays detected in the detector to determine a thickness of the multi-layer thin film.

First claim

What is claimed is:

1 . An apparatus for analyzing a thin film, comprising:
an X-ray generator to radiate multi-wavelength X-rays sequentially onto a substrate stacked with a multi-layer thin film; a detector to detect the multi-wavelength X-rays reflected from the substrate; and a signal processor to analyze the multi-wavelength X-rays detected in the detector.

2 . The apparatus as claimed in claim 1 , wherein the X-ray generator includes a plurality of metal targets including different elements.

3 . The apparatus as claimed in claim 2 , wherein the metal targets include different ones of Cr, Fe, Co, Cu, Mo, Ag, V, Mn, Fe, Ni, Zr, or Rh.

4 . The apparatus as claimed in claim 2 , wherein the X-ray generator includes:
a target supporter to support the metal targets; and a rotator to rotate the target supporter.

5 . The apparatus as claimed in claim 4 , wherein the target supporter is divided into a plurality of regions having fan shapes like a dart board.

6 . The apparatus as claimed in claim 5 , wherein:
the metal targets are in a circular arrangement on the target supporter, and the metal targets are divided into a plurality of regions having fan shapes like a dart board.

7 . The apparatus as claimed in claim 4 , wherein:
the rotator is to rotate the target supporter for an interval in a range of 5 seconds to 30 seconds, and the rotator is connected to a position controller to be synchronized with rotation of the metal targets.

8 . The apparatus as claimed in claim 2 , wherein the X-ray generator includes a beryllium window.

9 . The apparatus as claimed in claim 2 , further comprising:
a monochromator to monochromatize the multi-wavelength X-rays.

10 . The apparatus as claimed in claim 9 , further comprising:
a position controller connected to the X-ray generator and the monochromator, the position controller to adjust a position of the monochromator to correspond to the multi-wavelength X-rays.

11 . An apparatus for analyzing a thin film, comprising:
a stage to support a substrate stacked with a multi-layer thin film; an X-ray generator to radiate multi-wavelength X-rays sequentially onto the substrate; and a detector to detect the multi-wavelength X-rays reflected from the substrate.

12 . The apparatus as claimed in claim 11 , further comprising:
a signal processor to measure and analyze a reflectance of the multi-wavelength X-rays detected in the detector.

13 . The apparatus as claimed in claim 11 , wherein the X-ray generator includes:
an electron beam generator to receive electrons from an electron source and to generate an electron beam; a plurality of metal targets in a region to which the electron beam is radiated, the metal targets including different elements; a target supporter to support the metal targets; and a rotator to rotate the target supporter.

14 . The apparatus as claimed in claim 13 , wherein the rotator is to rotate the target supporter for an interval in a range of 5 seconds to 30 seconds.

15 . The apparatus as claimed in claim 13 , wherein the target supporter includes at least one of Be, Zr, or Al.

16 . An apparatus for measuring a thickness of a thin film using multi-wavelength X-rays, comprising:
a stage configured to support a substrate stacked with a multi-layer thin film; an X-ray generator configured to radiate multi-wavelength X-rays sequentially onto the substrate; a detector configured to detect the multi-wavelength X-rays reflected from the substrate; and a signal processor configured to analyze the multi-wavelength X-rays detected in the detector.

17 . The apparatus of claim 16 , further comprising:
a monochromator configured to monochromatize the multi-wavelength X-rays; and a position controller connected to the X-ray generator and the monochromator, and configured to adjust a position of the monochromator so as to correspond to the multi-wavelength X-rays.

18 . The apparatus of claim 17 , wherein the X-ray generator comprises:
an electron beam generator configured to receive electrons from an electron source and generate an electron beam; a plurality of metal targets located in a region into which the electron beam is radiated, and formed of various elements; a target supporter configured to support the plurality of metal targets; a rotation unit configured to rotate the target supporter; and a window which is an incident path of the multi-wavelength X-rays emitted from the plurality of metal targets.

19 . The apparatus of claim 18 , wherein the window includes beryllium.

20 . The apparatus of claim 18 , wherein the rotation unit rotates the target supporter for an interval in a range of 5 seconds to 30 seconds, and the position controller is connected to the rotation unit and synchronized with a rotation of the plurality of metal targets.

Assignees

• Samsung Electronics Co Ltd

Inventors

• Hwang Byunghyun
• Lee Junhwan

Classifications

• G01N23/203

  Measuring back scattering · CPC title

• G01N23/20091 Primary

  Measuring the energy-dispersion spectrum [EDS] of diffracted radiation · CPC title

• G01N23/20025

  Sample holders or supports therefor · CPC title

• G01N23/20075 Primary

  by measuring interferences of X-rays, e.g. Borrmann effect · CPC title

• G01B15/02 Primary

  for measuring thickness · CPC title