Heating type vaporizing device

US2016178187A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2016178187-A1
Application numberUS-201514952784-A
CountryUS
Kind codeA1
Filing dateNov 25, 2015
Priority dateDec 22, 2014
Publication dateJun 23, 2016
Grant date

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

This invention is a continuous type vaporizing device that makes it possible to output a large flow rate of the material gas stably while the vaporizing device is downsized. The vaporizing device comprises a vaporizing tank that has a vaporizing chamber and that outputs a material gas that is produced by vaporizing the liquid material that is introduced into the vaporizing chamber, a heater that promotes vaporization of the liquid material in the vaporizing chamber by heating the vaporization tank, and a partition wall that partitions a lower space of the vaporizing chamber into a first lower space into which the liquid material is introduced first and a second lower space into which the liquid material that overflows from the first lower space is introduced.

First claim

Opening claim text (preview).

1 . A vaporizing tank that has a vaporizing chamber heated by a heater and that outputs a material gas that is vaporized by heating a liquid material that is introduced into the vaporizing chamber, wherein comprising a partition wall that partitions a lower space of the vaporizing chamber into a first lower space into which the liquid material is introduced first and a second lower space into which the liquid material that overflows from the first lower space is introduced. 2 . The vaporizing tank described in claim 1 , wherein a liquid surface height at which the liquid material starts overflowing into the second lower space is set within a target liquid surface height range or at a height higher than the target liquid surface height range. 3 . The vaporizing tank described in claim 1 , wherein comprising a plurality of thermal conductors that project from an internal wall surface of the vaporizing chamber. 4 . The vaporizing tank described in claim 3 , comprising a block shaped body where a bottomed hole that opens in a predetermined surface is formed and a cap body that forms the vaporizing chamber by closing the opening of the bottomed hole, wherein the bottomed hole is formed by boring multiple portions of the predetermined surface of the body, and a remaining wall portion formed between the bottomed holes is so configured to perform a function as the thermal conductor. 5 . The vaporizing tank described in claim 1 , wherein a wall body that forms the vaporizing chamber is so configured that the heater to apply the heat to the liquid material can be buried. 6 . A vaporizer comprising a vaporizing tank that has a vaporizing chamber and that outputs a material gas produced by vaporizing a liquid material introduced into the vaporizing tank, a heater that applies heat to the vaporizing tank so as to promote vaporization of the liquid material in the vaporizing tank, and a partition wall that partitions a lower space of the vaporizing chamber into a first lower space into which the liquid material is introduced first and a second lower space into which the liquid material that overflows from the first lower space is introduced. 7 . A vaporizing device comprising the vaporizer described in claim 6 , a liquid surface sensor that detects a liquid surface height of a liquid material stored in a vaporizing chamber, a flow rate adjusting valve that is arranged on a liquid material introducing flow channel that communicates with the vaporizing chamber, and a control mechanism that controls the flow rate adjusting valve so as to make the liquid surface height detected by the liquid surface sensor within a predetermined target liquid surface height range, wherein the liquid surface height at which the liquid material overflows into the second lower space is set within or above the predetermined target liquid surface height range.

Assignees

Inventors

Classifications

  • Arrangement or mounting of grates or heating means · CPC title

  • Control systems for steam boilers (for regulating feed-water supply F22D5/00; for controlling superheat temperature F22G5/00) · CPC title

  • F24H1/00Primary

    Water heaters, e.g. boilers, continuous-flow heaters or water-storage heaters (steam boilers F22B) · CPC title

  • F22B15/00Primary

    Water-tube boilers of horizontal type, i.e. the water-tube sets being arranged horizontally · CPC title

  • Steam-generation plants, e.g. comprising steam boilers of different types in mutual association · CPC title

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What does patent US2016178187A1 cover?
This invention is a continuous type vaporizing device that makes it possible to output a large flow rate of the material gas stably while the vaporizing device is downsized. The vaporizing device comprises a vaporizing tank that has a vaporizing chamber and that outputs a material gas that is produced by vaporizing the liquid material that is introduced into the vaporizing chamber, a heater tha…
Who is the assignee on this patent?
Horiba Stec Co Ltd
What technology area does this patent fall under?
Primary CPC classification F24H1/00. Mapped technology areas include Mechanical Engineering.
When was this patent published?
Publication date Thu Jun 23 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).