Laser-Induced Borane Production for Ion Implantation

Patent metadata

Field	Value
Publication number	US-2016175804-A1
Application number	US-201414576549-A
Country	US
Kind code	A1
Filing date	Dec 19, 2014
Priority date	Dec 19, 2014
Publication date	Jun 23, 2016
Grant date	—

Abstract

Systems and methods for the production of laser induced high mass molecular borane is disclosed for an ion implantation system. The system comprises a laser, a diborane gas source, a heated interaction chamber for generating a high mass molecular borane, a transport system for transferring the high mass molecular borane, and an ion source chamber for generating an ion beam in an ion beam path for implantation of a workpiece. The transport system comprises at least a first and a second flow control component at least a first heated chamber, wherein the first heated chamber is disposed between the first and second flow control components, and wherein the first heated chamber is configured to condense the high mass molecular borane. The laser comprises a CO 2 laser configured to irradiate the diborane source gas at a wavelength of about 10.6 μm at a R-16 (973 cm −1 ) line of excitation.

First claim

What is claimed is:

1 . A method of for the production of high mass molecular boranes in an ion implantation comprising:
providing a laser; irradiating diborane via the laser at a predetermined power level in a temperature and pressure controlled interaction chamber to produce the high mass molecular boranes; transferring the high mass molecular boranes to an ion source chamber of the ion implantation system.

2 . The method of claim 1 , wherein the diborane is irradiated with a CO 2 laser at a wavelength of about 10.6 μm at a R-16 (973 cm −1 ) line of excitation.

3 . The method of claim 1 , wherein the temperature of the interaction chamber comprises from about 40° C. to about 80° C. and the pressure of the interaction chamber comprises from about 50 torr to about 400 torr.

4 . The method of claim 1 , wherein the high mass molecular boranes comprise icosaborane or octadecaborane.

5 . The method of claim 1 , wherein transferring the high mass molecular borane to the ion source chamber comprises delivering the borane through a transfer system comprising at least a first and a second flow control component and at least a first heated chamber, wherein the first heated chamber is disposed between the first and second flow control components, and wherein the first heated chamber is operable to condense the high mass molecular borane.

6 . The method of claim 5 , wherein the transfer of the high mass molecular borane is a semi-continuous process.

7 . The method of claim 5 , the transferring of the high mass molecular borane further comprises delivering the high mass molecular borane through a third flow control component, wherein the third flow control component is operably coupled to the ion source chamber and a second heated chamber, wherein the second heated chamber disposed between the second and third flow control components.

8 . The method of claim 1 , further comprising accumulating high mass molecular borane in an accumulation chamber operably coupled to ion source chamber.

9 . An interaction and transport system for the production and transfer of high mass molecular borane in an ion implantation system, the interaction and transport system comprising:
a temperature controlled interaction chamber; at least a first and a second flow control component; at least a first heated chamber, the first heated chamber disposed between the first and second flow control components, wherein the first heated chamber is operable to condense the high mass molecular borane.

10 . The system of claim 9 , wherein the interaction chamber comprises a heater configured to heat the interaction chamber to a temperature of from about 40° C. to about 80° C.

11 . The system of claim 9 , further comprising a third flow control component, wherein the third flow control component is coupled to an ion source chamber in the ion implantation system.

12 . The system of claim 11 , further comprising a second heated chamber, the second heated chamber disposed between the second and third flow control components.

13 . The system of claim 9 , wherein the first and second flow control components are configured to supply the high mass diborane to the ion source chamber in a semi-continuous manner.

14 . The system of claim 11 , wherein the first and second flow control components are configured to supply the high mass diborane to the ion source chamber such that the diborane produced in the interaction chamber is consumed at the same rate in the ion source chamber.

15 . The system of claim 9 , further comprising an accumulation chamber disposed between the second heated chamber and the ion source chamber.

16 . A system for the production of high mass molecular diborane for ion implantation, the system comprising:
a laser; a diborane source gas; a heated interaction chamber for generating a high mass molecular borane; a transport system for transferring the high mass molecular borane; an ion source chamber for generating an ion beam in an ion beam path for implantation of a workpiece; a beamline assembly that receives the ion beam from the ion source chamber and processes the ion beam; and a process chamber that receives the ion beam from the beam line assembly and implants the ions into a workpiece.

17 . The system of claim 16 , wherein the laser comprises a CO 2 laser configured to irradiate the diborane source gas at a wavelength of about 10.6 μm at a R-16 (973 cm −1 ) line of excitation.

18 . The system of claim 17 , wherein the high mass molecular borane comprises an octadecaborane or an icosaborane.

19 . The system of claim 17 , wherein the transport system comprises:
at least a first and a second flow control component; at least a first heated chamber, wherein the first heated chamber is disposed between the first and second flow control components, and wherein the first heated chamber is configured to condense the high mass molecular borane.

20 . The system of claim 17 , further comprising an accumulation chamber disposed between the second heated chamber and the ion source chamber.

Assignees

• Axcelis Tech Inc

Inventors

• Lee William Davis
• Divergilio William
• Tieger Daniel R

Classifications

• B01J2219/12

  Processes employing electromagnetic waves · CPC title

• H01J37/08

  Ion sources; Ion guns · CPC title

• B01J2219/0869

  Feeding or evacuating the reactor · CPC title

• B01J19/121 Primary

  Coherent waves, e.g. laser beams (lasers per se H01S3/00) · CPC title

• H01J2237/08

  Ion sources · CPC title