Rinse solution for silica thin film, method of producing silica thin film, and silica thin film

Patent metadata

Field	Value
Publication number	US-2016172188-A1
Application number	US-201514754346-A
Country	US
Kind code	A1
Filing date	Jun 29, 2015
Priority date	Dec 16, 2014
Publication date	Jun 16, 2016
Grant date	—

Abstract

A rinse solution for a silica thin film includes trimethylbenzene, diethylbenzene, indane, indene, tert-butyl toluene, methylnaphthalene, a mixture including an aromatic hydrocarbon having 12 or more carbon atoms, a mixture including an aliphatic hydrocarbon having 12 or more carbon atoms, a mixture including a hetero hydrocarbon compound including a phenyl group and an oxygen atom, or a combination thereof.

First claim

What is claimed is:

1 . A rinse solution for a silica thin film, comprising trimethylbenzene, diethylbenzene, indane, indene, methylanisole, tert-butyl toluene, a mixture comprising an aromatic hydrocarbon having 12 or more carbon atoms, a mixture comprising an aliphatic hydrocarbon having 12 or more carbon atoms, a mixture comprising a hetero hydrocarbon compound comprising a phenyl group and an oxygen atom, or a combination thereof.

2 . The rinse solution for the silica thin film of claim 1 , wherein the silica thin film comprises hydrogenated polysilazane, hydrogenated polysiloxazane, or a combination thereof.

3 . The rinse solution for the silica thin film of claim 1 , wherein the rinse solution for the silica thin film comprises a mixture comprising a C12 to C30 aromatic hydrocarbon, a mixture comprising a C12 to C30 aliphatic hydrocarbon, or a combination thereof.

4 . The rinse solution for the silica thin film of claim 1 , wherein the mixture comprising a hetero hydrocarbon compound comprises greater than or equal to about 10 wt % and less than or equal to about 70 wt % of the hetero hydrocarbon compound comprising a phenyl group and an oxygen atom.

5 . The rinse solution for the silica thin film of claim 1 , wherein the hetero hydrocarbon compound comprises an ether, an aldehyde, an alcohol, a ketone, or a combination thereof in the structure.

6 . The rinse solution for the silica thin film of claim 1 , wherein the hetero hydrocarbon compound comprises methylanisole, diphenylether, butylbenzoate, butylphenylether, allylmethylphenol, isobutylphenyl propionaldehyde, phenylcyclohexanone, or a combination thereof.

7 . A method of producing a silica thin film, the method comprising
preparing a substrate; coating a silicon-containing solution on the substrate; and partially spraying the rinse solution for the silica thin film of claim 1 on the substrate coated with the silicon-containing solution.

8 . The method of claim 7 , wherein the silica thin film comprises hydrogenated polysilazane, hydrogenated polysiloxazane, or a combination thereof.

9 . The method of claim 7 , wherein the rinse solution for the silica thin film comprises a mixture comprising a C12 to C30 aromatic hydrocarbon, a mixture comprising a C12 to C30 aliphatic hydrocarbon, or a combination thereof.

10 . The method of claim 7 , wherein the mixture comprising a hetero hydrocarbon compound comprises greater than or equal to about 10 wt % and less than or equal to about 70 wt % of the hetero hydrocarbon compound comprising a phenyl group and an oxygen atom.

11 . The method of claim 7 , wherein the hetero hydrocarbon compound comprises an ether, an aldehyde, an alcohol, a ketone, or a combination thereof in the structure.

12 . The method of claim 7 , wherein the hetero hydrocarbon compound comprises methylanisole, diphenylether, butylbenzoate, butylphenylether, allylmethylphenol, isobutylphenyl propionaldehyde, phenylcyclohexanone, or a combination thereof.

13 . A silica thin film produced utilizing the rinse solution for the silica thin film of claim 1 .

14 . The silica thin film of claim 13 , wherein the silica thin film comprises hydrogenated polysilazane, hydrogenated polysiloxazane, or a combination thereof.

15 . The silica thin film of claim 13 , wherein the rinse solution for the silica thin film comprises a mixture comprising a C12 to C30 aromatic hydrocarbon, a mixture comprising a C12 to C30 aliphatic hydrocarbon, or a combination thereof.

16 . The silica thin film of claim 13 , wherein the mixture comprising a hetero hydrocarbon compound comprises greater than or equal to about 10 wt % and less than or equal to about 70 wt % of the hetero hydrocarbon compound comprising a phenyl group and an oxygen atom.

17 . The silica thin film of claim 13 , wherein the hetero hydrocarbon compound comprises an ether, an aldehyde, an alcohol, a ketone, or a combination thereof in the structure.

18 . The silica thin film of claim 13 , wherein the hetero hydrocarbon compound comprises methylanisole, diphenylether, butylbenzoate, butylphenylether, allylmethylphenol, isobutylphenyl propionaldehyde, phenylcyclohexanone, or a combination thereof.

19 . The silica thin film of claim 13 , wherein the silica thin film has a step difference (ΔT) of less than or equal to about 400 nm measured according to the following Equation 1:
Step difference (Δ T )=(a maximum thickness of a silica thin film measured between one side end of the silica thin film and a point 10 mm apart therefrom)−(a thickness of the silica thin film measured at a point 10 mm apart from the one side end of the silica thin film).  Equation 1

Assignees

• Samsung Sdi Co Ltd

Inventors

• Lim Wan-Hee
• Jung Il
• Koh Sang-Ran
• Kim Woo-Han
• Kim Ha-Neul
• Yun Hui-Chan
• Lee Han-Song

Classifications

• H10P70/54

  Cleaning of wafer edges · CPC title

• H10P14/6922

  the material containing Si, O and at least one of H, N, C, F or other non-metal elements, e.g. SiOC, SiOC:H or SiONC · CPC title

• H10P14/6504

  In-situ cleaning · CPC title

• H10P14/6342

  Liquid deposition, e.g. spin-coating, sol-gel techniques or spray coating · CPC title

• H10P14/69215 Primary

  the material being a silicon oxide, e.g. SiO2 · CPC title