Laminate and application therefor

Patent metadata

Field	Value
Publication number	US-2016168422-A1
Application number	US-201615047945-A
Country	US
Kind code	A1
Filing date	Feb 19, 2016
Priority date	Aug 30, 2013
Publication date	Jun 16, 2016
Grant date	—

Abstract

Provided are a laminate capable of providing a temporary support for a member to be treated by a strongly adhesive force when the member to be treated is subjected to a mechanical or chemical treatment, and of easily releasing the temporary support for the treated member while not damaging the treated member, in which the TTV of the treated member is excellent; a composition for forming a protective layer; a composition for forming an adhesive layer; and a kit.
The laminate has, on a support (A), an adhesive layer having a softening point of 250° C. or higher (B), a protective layer (C), and a device wafer (D) in this order, in which the adhesive layer (B) is a cured product of an adhesive layer precursor and the adhesive layer precursor has a polymerizable compound (b-1).

First claim

1 . A laminate comprising, on a support (A):
an adhesive layer having a softening point of 250° C. or higher (B); a protective layer (C); and a device wafer (D) in this order, wherein the adhesive layer (B) is a cured product of an adhesive layer precursor and the adhesive layer precursor has a polymerizable compound (b-1).

2 . The laminate according to claim 1 , wherein the adhesive layer has a 3-dimensional crosslinked structure.

3 . The laminate according to claim 1 , wherein the polymerizable compound (b-1) includes at least one kind of trifunctional or higher functional radically polymerizable compound.

4 . The laminate according to claim 1 , wherein the polymerizable compound (b-1) includes at least one kind of radically polymerizable compound containing a fluorine atom.

5 . The laminate according to claim 1 , wherein the adhesive layer precursor further includes a photo-radical initiator (b-2).

6 . The laminate according to claim 1 , wherein the adhesive layer precursor further includes a thermo-radical initiator (b-3).

7 . The laminate according to claim 1 , wherein the adhesive layer precursor further includes a polymer compound (b-4).

8 . The laminate according to claim 1 , wherein the softening point of the protective layer (C) is from 170° C. to 250° C.

9 . The laminate according to claim 1 , wherein the protective layer (C) is a thermoplastic resin.

10 . The laminate according to claim 1 , wherein the protective layer (C) is at least one kind of thermoplastic resin selected from a polyethersulfone resin, a polyimide resin, a polyester resin, a polybenzimidazole resin, a polyester resin, a polyamideimide resin, and a polyetheretherketone resin.

11 . The laminate according to claim 1 , wherein the device wafer (D) has a structure having a height of from 1 μm to 150 μm on the surface.

12 . The laminate according to claim 1 , wherein the film thickness of the device wafer (D) is 100 μm or less.

13 . The laminate according to claim 1 , wherein the temperature difference in the softening point between the adhesive layer and the protective layer is from 10° C. to 300° C.

14 . A composition for forming a protective layer, used for producing the laminate according to claim 1 , comprising a resin and a solvent.

15 . The composition for forming a protective layer according to claim 14 , wherein the softening point of the resin is from 170° C. to 250° C.

16 . A composition for forming an adhesive layer, used for producing an adhesive layer of the laminate according to claim 1 , comprising a solvent and a polymerizable compound (b-1).

17 . The composition for forming an adhesive layer according to claim 16 , further comprising a photo-radical initiator (b-2).

18 . The composition for forming an adhesive layer according to claim 16 , further comprising a thermo-radical initiator (b-3).

19 . The composition for forming an adhesive layer according to claim 16 , further comprising a polymer compound (b-4).

20 . A kit comprising a composition for forming a protective layer, comprising a resin and a solvent, and a composition for forming an adhesive layer, including a solvent and a polymerizable compound.

21 . The kit according to claim 20 , in which the softening point of the resin included in the composition for forming a protective layer is from 170° C. to 250° C.

22 . The kit according to claim 20 , which is a kit for the production of a laminate comprising, on a support (A):
an adhesive layer having a softening point of 250° C. or higher (B); a protective layer (C); and a device wafer (D) in this order, wherein the adhesive layer (B) is a cured product of an adhesive layer precursor and the adhesive layer precursor has a polymerizable compound (b-1).

Assignees

• Fujifilm Corp

Inventors

• Iwai Yu
• Koyama Ichiro
• Kamochi Yoshitaka

Classifications

• H10W72/0198

  batch processes · CPC title

• H10P72/7422

  used to protect an active side of a device or wafer · CPC title

• H10P72/7416

  used during dicing or grinding · CPC title

• H10P72/7412

  the auxiliary support including means facilitating the separation of a device or wafer from the auxiliary support · CPC title

• H10P72/744

  Details of chemical or physical process used for separating the auxiliary support from a device or a wafer · CPC title