Metal foil for electromagnetic shielding, electromagnetic shielding material, and shielding cable

US2016165768A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2016165768-A1
Application numberUS-201414902188-A
CountryUS
Kind codeA1
Filing dateFeb 20, 2014
Priority dateJul 3, 2013
Publication dateJun 9, 2016
Grant date

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  1. Title

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  2. Abstract

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  5. First independent claim

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Abstract

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A metal foil for electromagnetic shielding, comprising: a metal foil base, an Sn—Ni alloy layer formed on one or both surfaces of the base, and an oxide layer formed on a surface of the Sn—Ni alloy layer, wherein the Sn—Ni alloy layer includes 20 to 80% by mass of Sn and has a thickness of 30 to 500 nm, and wherein when an analysis in a depth direction is carried out by an XPS being the depth from an outermost surface as X nm, and an atomic percentage (%) of Sn is represented by A Sn (X), an atomic percentage (%) of Ni is represented by A Ni (X), an atomic percentage (%) of oxygen is represented by A O (X), and X is defined to be X O when A O (X)=0, 30 nm=>X O =>0.5 nm, and 0.4=>∫A Ni (X)dx/∫A Sn (X)dx=>0.05 in a section [0, X 0 ] is satisfied.

First claim

Opening claim text (preview).

1 . A metal foil for electromagnetic shielding, comprising: a metal foil base, an Sn—Ni alloy layer formed on one or both surfaces of the base, and an oxide layer formed on a surface of the Sn—Ni alloy layer, wherein the Sn—Ni alloy layer includes 20 to 80% by mass of Sn and has a thickness of 30 to 500 nm, and wherein when an analysis in a depth direction is carried out by an XPS being the depth from an outermost surface as X nm, and an atomic percentage (%) of Sn is represented by A Sn (X), an atomic percentage (%) of Ni is represented by A Ni (X), an atomic percentage (%) of oxygen is represented by A O (X), and X is defined to be X O when A O (X)=0, 30 nm=>X O =>0.5 nm, and 0.4=>∫A Ni (X)dx/∫A Sn (X)dx=>0.05 in a section [0, X 0 ] is satisfied. 2 . The metal foil for electromagnetic shielding according to claim 1 , wherein the Sn—Ni alloy layer further includes one or more elements selected from the group consisting of P, W, Fe and Co. 3 . The metal foil for electromagnetic shielding according to claim 1 , wherein the Sn—Ni alloy layer includes 10% by mass of an element configuring the base. 4 . The metal foil for electromagnetic shielding according to claim 1 , further comprising: a underlayer composed of a Ni metal layer or an alloy layer of Ni and P, W, Fe, Co or Zn formed between the Sn—Ni alloy layer and the base. 5 . The metal foil for electromagnetic shielding according to claim 1 , wherein the base is composed of gold, silver, platinum, stainless steel, iron, nickel, zinc, copper, a copper alloy, aluminum or an aluminum alloy. 6 . The metal foil for electromagnetic shielding according to claim 1 , wherein the base is aluminum or the aluminum alloy, and wherein a Zn layer is formed between the base and the underlayer. 7 . An electromagnetic shielding material, comprising the metal foil for electromagnetic shielding according to claim 1 , and a resin layer laminated on one surface of the metal foil. 8 . The electromagnetic shielding material according to claim 7 , wherein the resin layer is a resin film. 9 . A shielding cable shielded by the electromagnetic shielding material according to claim 7 . 10 . A shielding cable shielded by the electromagnetic shielding material according to claim 8 . 11 . The metal foil for electromagnetic shielding according to claim 2 , wherein the Sn—Ni alloy layer includes 10% by mass of an element configuring the base. 12 . The metal foil for electromagnetic shielding according to claim 2 , further comprising: a underlayer composed of a Ni metal layer or an alloy layer of Ni and P, W, Fe, Co or Zn formed between the Sn—Ni alloy layer and the base. 13 . The metal foil for electromagnetic shielding according to claim 3 , further comprising: a underlayer composed of a Ni metal layer or an alloy layer of Ni and P, W, Fe, Co or Zn formed between the Sn—Ni alloy layer and the base. 14 . The metal foil for electromagnetic shielding according to claim 2 , wherein the base is composed of gold, silver, platinum, stainless steel, iron, nickel, zinc, copper, a copper alloy, aluminum or an aluminum alloy. 15 . The metal foil for electromagnetic shielding according to claim 3 , wherein the base is composed of gold, silver, platinum, stainless steel, iron, nickel, zinc, copper, a copper alloy, aluminum or an aluminum alloy. 16 . The metal foil for electromagnetic shielding according to claim 4 , wherein the base is composed of gold, silver, platinum, stainless steel, iron, nickel, zinc, copper, a copper alloy, aluminum or an aluminum alloy. 17 . The metal foil for electromagnetic shielding according to claim 2 , wherein the base is aluminum or the aluminum alloy, and wherein a Zn layer is formed between the base and the underlayer. 18 . The metal foil for electromagnetic shielding according to claim 3 , wherein the base is aluminum or the aluminum alloy, and wherein a Zn layer is formed between the base and the underlayer. 19 . The metal foil for electromagnetic shielding according to claim 4 , wherein the base is aluminum or the aluminum alloy, and wherein a Zn layer is formed between the base and the underlayer. 20 . The metal foil for electromagnetic shielding according to claim 5 , wherein the base is aluminum or the aluminum alloy, and wherein a Zn layer is formed between the base and the underlayer.

Assignees

Inventors

Classifications

  • containing more than 50% by weight of iron or nickel or cobalt · CPC title

  • Inert, i.e. inert to chemical degradation, corrosion · CPC title

  • comprising a plurality of shielding layers; combining different shielding material structure · CPC title

  • Strips or foils · CPC title

  • at least one layer being of nickel or chromium · CPC title

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What does patent US2016165768A1 cover?
A metal foil for electromagnetic shielding, comprising: a metal foil base, an Sn—Ni alloy layer formed on one or both surfaces of the base, and an oxide layer formed on a surface of the Sn—Ni alloy layer, wherein the Sn—Ni alloy layer includes 20 to 80% by mass of Sn and has a thickness of 30 to 500 nm, and wherein when an analysis in a depth direction is carried out by an XPS being the depth f…
Who is the assignee on this patent?
Jx Nippon Mining & Metals Corp
What technology area does this patent fall under?
Primary CPC classification C25D5/505. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Thu Jun 09 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).