Actuators and microlithography projection exposure systems and methods using the same
US-2015370176-A1 · Dec 24, 2015 · US
Illumination optical apparatus and device manufacturing method
US2016147162A1 · US · A1
| Field | Value |
|---|---|
| Publication number | US-2016147162-A1 |
| Application number | US-201514938013-A |
| Country | US |
| Kind code | A1 |
| Filing date | Nov 11, 2015 |
| Priority date | Nov 21, 2014 |
| Publication date | May 26, 2016 |
| Grant date | — |
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Abstract
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Provided is an illumination optical apparatus for illuminating a mask with light from a light source. The apparatus includes an optical integrator configured to cause a light intensity distribution to be uniform in an emission end surface by reflecting the light incident from an incident end surface in an inner surface a plurality of times, an image forming optical system configured to form an image of the emission end surface of the optical integrator on the mask, and an adjustment unit configured to adjust telecentricity of the light so that a principal ray incident on the mask and a normal line of the mask approach parallelism and configured to be disposed outside the image forming optical system.
First claim
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What is claimed is: 1 . An illumination optical apparatus for illuminating a mask with light from a light source, the apparatus comprising: an optical integrator configured to cause a light intensity distribution to be uniform in an emission end surface by reflecting the light incident from an incident end surface in an inner surface a plurality of times; an image forming optical system configured to form an image of the emission end surface of the optical integrator on the ma…
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Physics · mapped topic
Physics · mapped topic
Physics · mapped topic
- G03F7/70141Primary
Physics · mapped topic
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- What does patent US2016147162A1 cover?
- Provided is an illumination optical apparatus for illuminating a mask with light from a light source. The apparatus includes an optical integrator configured to cause a light intensity distribution to be uniform in an emission end surface by reflecting the light incident from an incident end surface in an inner surface a plurality of times, an image forming optical system configured to form an …
- Who is the assignee on this patent?
- Canon Kk
- What technology area does this patent fall under?
- Primary CPC classification G03F7/70141. Mapped technology areas include Physics.
- When was this patent published?
- Publication date Thu May 26 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).