Resin containing oxetane and epoxy groups and resin composition including the same

US2016145387A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2016145387-A1
Application numberUS-201514602889-A
CountryUS
Kind codeA1
Filing dateJan 22, 2015
Priority dateNov 24, 2014
Publication dateMay 26, 2016
Grant date

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A resin containing oxetane and epoxy groups is provided, being formed by reacting (a) a product of reacting 1 part by mole of a mono-oxetane with a hydroxyl group and 1.1 to 2.5 parts by mole of anhydride, and (b) 2.1 to 4.2 parts by mole of a diepoxy compound. The mono-oxetane with a hydroxyl group has a structure: wherein R 1 is H, C 1-6 alkyl group, C 1-6 fluoroalkyl group, alkenyl group, or phenyl group, and R 2 is C 1-6 alkylene group or vinyl ether group.

First claim

Opening claim text (preview).

What is claimed is: 1 . A resin containing oxetane and epoxy groups, being formed by reacting: (a) a product of reacting 1 part by mole of a mono-oxetane with a hydroxyl group and 1.1 to 2.5 parts by mole of anhydride, and (b) 2.1 to 4.2 parts by mole of a diepoxy compound. 2 . The resin as claimed in claim 1 , wherein the mono-oxetane with a hydroxyl group has a structure: wherein R 1 is H, C 1-6 alkyl group, C 1-6 fluoroalkyl group, alkenyl group, or phenyl group, and R 2 is C 1-6 alkylene group or vinyl ether group. 3 . The resin as claimed in claim 1 , wherein the mono-oxetane with a hydroxyl group has a structure: 4 . The resin as claimed in claim 1 , wherein the anhydride has a structure: wherein R 3 is or a combination thereof, each R 4 is independently of H, C 1-16 alkyl group, or C 1-16 alkyl group where a —CH 2 group is substituted by oxygen, ethylene group, carbonyl group, carboxyl group, cyclohexyl group, or phenyl group; wherein 5 . The resin as claimed in claim 1 , wherein the anhydride has a structure: 6 . The resin as claimed in claim 1 , wherein the diepoxy compound is or a combination thereof; wherein R 5 is wherein z1 is an integer of 0 to 3; R 6 is wherein z2 is a positive integer of 1 to 4. 7 . The resin as claimed in claim 1 , wherein the diepoxy compound is 8 . The resin as claimed in claim 1 , being: or a combination thereof, wherein R 1 is H, C 1-6 alkyl group, C 1-6 fluoroalkyl group, alkenyl group, or phenyl group; R 2 is C 1-6 alkylene group or vinyl ether group; R 3 is or a combination thereof, each R 4 is independently of H, C 1-16 alkyl group, or C 1-16 alkyl group where a —CH 2 group is substituted by oxygen, ethylene group, carbonyl group, carboxyl group, cyclohexyl group, or phenyl group; R 5 is R 6 is wherein z1 is an integer of 0 to 3, z2 is a positive integer of 1 to 4, m1 is a positive integer greater than 1, n1 is a positive integer greater than 1, m2 is a positive integer greater than 1, and n2 is a positive integer greater than 1. 9 . The resin as claimed in claim 1 , having a viscosity of 50 Pa·s to 1,100 Pa·s at room temperature. 10 . A resin composition, comprising: 100 parts by weight of the resin as claimed in claim 1 ; and 1 to 10 parts by weight of a curing agent. 11 . The resin composition as claimed in claim 10 , wherein the curing agent comprises UV cationic initiator, thermal cationic initiator, or thermal anionic initiator. 12 . The resin composition as claimed in claim 10 , further comprising 0.1 to 30 parts by weight of an additive. 13 . The resin composition as claimed in claim 12 , wherein the additive comprises filler, defoamer, leveling agent, or a combination thereof. 14 . The resin composition as claimed in claim 10 , wherein the mono-oxetane with a hydroxyl group has a structure: wherein R 1 is H, C 1-6 alkyl group, C 1-6 fluoroalkyl group, alkenyl group, or phenyl group, and R 2 is C1-6 alkylene group or vinyl ether group. 15 . The resin composition as claimed in claim 10 , wherein the mono-oxetane with a hydroxyl group has a structure: 16 . The resin composition as claimed in claim 10 , wherein the anhydride has a structure: R 3 is or a combination thereof, each R 4 is independently of H, C 1-16 alkyl group, or C 1-16 alkyl group where a —CH 2 group is substituted by oxygen, ethylene group, carbonyl group, carboxyl group, cyclohexyl group, or phenyl group; wherein 17 . The resin composition as claimed in claim 10 , wherein the anhydride has a structure: 18 . The resin composition as claimed in claim 10 , wherein the diepoxy compound is 19 . The resin composition as claimed in claim 10 , being: or a combination thereof, wherein R 1 is H, C 1-6 alkyl group, C 1-6 fluoroalkyl group, alkenyl group, or phenyl group; R 2 is C 1-6 alkylene group or vinyl ether group; R 3 is or a combination thereof, each R 4 is independently of H, C 1-16 alkyl group, or C 1-16 alkyl group where a —CH 2 group is substituted by oxygen, ethylene group, carbonyl group, carboxyl group, cyclohexyl group, or phenyl group; R 5 is R 6 is wherein z1 is an integer of 0 to 3, z2 is a positive integer of 1 to 4, m1 is a positive integer greater than 1, n1 is a positive integer greater than 1, m2 is a positive integer greater than 1, and n2 is a positive integer greater than 1. 20 . The resin composition as claimed in claim

Assignees

Inventors

Classifications

  • Oxetanes · CPC title

  • Cyclic ethers having at least one atom other than carbon and hydrogen outside the ring · CPC title

  • containing oxygen · CPC title

  • C08G67/04Primary

    Polyanhydrides · CPC title

  • Electricity · mapped topic

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What does patent US2016145387A1 cover?
A resin containing oxetane and epoxy groups is provided, being formed by reacting (a) a product of reacting 1 part by mole of a mono-oxetane with a hydroxyl group and 1.1 to 2.5 parts by mole of anhydride, and (b) 2.1 to 4.2 parts by mole of a diepoxy compound. The mono-oxetane with a hydroxyl group has a structure: …
Who is the assignee on this patent?
Ind Tech Res Inst
What technology area does this patent fall under?
Primary CPC classification C08G59/1438. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Thu May 26 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).