Inductor manufacturing method

US2016141101A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2016141101-A1
Application numberUS-201514834635-A
CountryUS
Kind codeA1
Filing dateAug 25, 2015
Priority dateNov 13, 2014
Publication dateMay 19, 2016
Grant date

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A method of manufacturing an inductor, includes: forming a coil pattern on a substrate by forming a conductive pattern on the substrate then growing the conductive pattern by plating; removing, if a plating residue is adhering to the coil pattern, the plating residue from the coil pattern; and outputting a cleaning request alarm that requests a plating bath to be cleaned if a number of times the plating residue has been removed or an amount of plating residue that has been removed exceeds a first threshold.

First claim

Opening claim text (preview).

What is claimed is: 1 . A method of manufacturing an inductor, comprising: forming a coil pattern on a substrate by forming a conductive pattern on the substrate then growing the conductive pattern by plating; removing, if a plating residue is adhering to the coil pattern, the plating residue from the coil pattern; and outputting a cleaning request alarm that requests a plating bath to be cleaned if a number of times the plating residue has been removed or an amount of plating residue that has been removed exceeds a first threshold. 2 . The method according to claim 1 , further comprising cleaning the plating bath if the cleaning request alarm is output in the outputting. 3 . The method according to claim 1 , further comprising issuing an inspection request alarm that requests the plating bath to be inspected if a frequency at which the cleaning request alarm is output in the outputting exceeds a second threshold. 4 . The method according to claim 1 , further comprising providing a through-hole between adjacent conductors of coil patterns, the through-hole passing through the substrate in a thickness direction of the substrate, wherein in the removing, the plating residue adhering to the coil pattern is dropped into the through-hole. 5 . The method according to claim 1 , wherein in the providing, the through-hole is formed along the coil pattern.

Assignees

Inventors

Classifications

  • H01F41/041Primary

    Printed circuit coils (apparatus or processes for manufacturing printed circuits in general H05K3/00) · CPC title

  • Electroplating characterised by the process; Pretreatment or after-treatment of workpieces · CPC title

  • by thin film techniques · CPC title

  • Process control or regulation (controlling or regulating in general G05) · CPC title

  • by electroless plating (adhesives therefor H05K3/387) · CPC title

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What does patent US2016141101A1 cover?
A method of manufacturing an inductor, includes: forming a coil pattern on a substrate by forming a conductive pattern on the substrate then growing the conductive pattern by plating; removing, if a plating residue is adhering to the coil pattern, the plating residue from the coil pattern; and outputting a cleaning request alarm that requests a plating bath to be cleaned if a number of times th…
Who is the assignee on this patent?
Fujitsu Ltd
What technology area does this patent fall under?
Primary CPC classification H01F41/041. Mapped technology areas include Electricity.
When was this patent published?
Publication date Thu May 19 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).