Method for producing sic single crystal

US2016122901A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2016122901-A1
Application numberUS-201514920397-A
CountryUS
Kind codeA1
Filing dateOct 22, 2015
Priority dateOct 31, 2014
Publication dateMay 5, 2016
Grant date

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  1. Title

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  5. First independent claim

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Abstract

Official abstract text for this publication.

A method for producing a SiC single crystal, comprising using a Si—C solution having a temperature gradient in which the temperature decreases from the interior toward the surface to grow a SiC single crystal from a seed crystal substrate, wherein the Si—C solution includes Si and Cr, the boron density difference Bs−Bg between the boron density Bs in the seed crystal substrate and the boron density Bg in the growing single crystal is 1×10 17 /cm 3 or greater, the chromium density difference Crg−Crs between the chromium density Crs in the seed crystal substrate and the chromium density Crg in the growing single crystal is 1×10 16 /cm 3 or greater, and the nitrogen density difference Ng−Ns between the nitrogen density Ns in the seed crystal substrate and the nitrogen density Ng in the growing single crystal is 3.5×10 18 /cm 3 to 5.8×10 18 /cm 3 .

First claim

Opening claim text (preview).

What is claimed is: 1 . A method for producing a SiC single crystal, comprising using a Si—C solution having a temperature gradient in which the temperature decreases from the interior toward the surface to grow a SiC single crystal from a SiC seed crystal substrate, wherein: the Si—C solution includes Si and Cr, the boron density difference Bs−Bg between the boron density Bs in the seed crystal substrate and the boron density Bg in the growing SiC single crystal is 1×10 17 /cm 3 or greater, the chromium density difference Crg−Crs between the chromium density Crs in the seed crystal substrate and the chromium density Crg in the growing SiC single crystal is 1×10 16 /cm 3 or greater, and the nitrogen density difference Ng−Ns between the nitrogen density Ns in the seed crystal substrate and the nitrogen density Ng in the growing SiC single crystal is 3.5×10 18 /cm 3 to 5.8×10 18 /cm 3 . 2 . The method for producing a SiC single crystal according to claim 1 , wherein the boron density difference Bs−Bg is 8×10 17 /cm 3 or greater. 3 . The method for producing a SiC single crystal according to claim 1 , wherein the chromium density difference Crg−Crs is 6×10 16 /cm 3 or greater. 4 . The method for producing a SiC single crystal according to claim 1 , wherein the seed crystal substrate is one that has been grown by a sublimation process. 5 . The method for producing a SiC single crystal according to claim 1 , wherein the Si—C solution has a composition of Si/Cr=50 to 80/20 to 50, as the atomic composition percentage. 6 . The method for producing a SiC single crystal according to claim 1 , wherein the Si—C solution has a surface temperature of 1800 to 2200° C.

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Classifications

  • C30B19/04Primary

    the solvent being a component of the crystal composition · CPC title

  • Carbides · CPC title

  • Controlling or regulating (controlling or regulating in general G05) · CPC title

  • adding crystallising material or reactants forming it in situ to the liquid · CPC title

  • characterised by the substrate · CPC title

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What does patent US2016122901A1 cover?
A method for producing a SiC single crystal, comprising using a Si—C solution having a temperature gradient in which the temperature decreases from the interior toward the surface to grow a SiC single crystal from a seed crystal substrate, wherein the Si—C solution includes Si and Cr, the boron density difference Bs−Bg between the boron density Bs in the seed crystal substrate and the boron den…
Who is the assignee on this patent?
Toyota Motor Co Ltd
What technology area does this patent fall under?
Primary CPC classification C30B19/04. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Thu May 05 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).