Wet cleaning of a chamber component

Patent metadata

Field	Value
Publication number	US-2016017263-A1
Application number	US-201414650565-A
Country	US
Kind code	A1
Filing date	Jan 21, 2014
Priority date	Mar 14, 2013
Publication date	Jan 21, 2016
Grant date	—

Abstract

Embodiments of the invention generally provide methods for cleaning a UV processing chamber component. In one embodiment, a method for cleaning a UV processing chamber component includes soaking the chamber component having a SiCO residue formed thereon in a cleaning solution for about 1 to 10 minutes. The cleaning solution comprises about 5% by weight to about 60% weight of NH 4 F and about 0.5% by weight to about 10% by weight of HF. The method also includes polishing the chamber component. In another embodiment, a method of cleaning a processing chamber component fabricated from quartz includes soaking the chamber component having a SiCO residue formed thereon in a cleaning solution comprising about 36% by weight of NH 4 F and about by weight of HF for about 3 minutes. The method also includes applying an ultrasonic power to the cleaning solution, and mechanically polishing the chamber component.

First claim

1 . A method for cleaning an ultraviolet (UV) processing chamber component, comprising:
soaking the chamber component having a SiCO residue formed thereon in a cleaning solution comprising about 5% by weight to about 60% by weight of NH 4 F and about 0.5% by weight to about 10% by weight of HF for about 1 to about 10 minutes; and polishing the chamber component.

2 . The method of claim 1 , wherein the cleaning solution further comprises water.

3 . The method of claim 1 , wherein the cleaning solution comprises about 30% by weight to about 40% by weight of NH 4 F.

4 . The method of claim 3 , wherein the cleaning solution comprises about 3% by weight to about 10% by weight of HF.

5 . The method of claim 1 , wherein the chamber component is soaked for about 3 to about 10 minutes.

6 . The method of claim 1 , wherein the method further comprises:
applying an ultrasonic power to the cleaning solution.

7 . The method of claim 6 , wherein the ultrasonic power is applied at a power of about 45 W/gallon of the cleaning solution to about 55 W/gallon of the cleaning solution, at a frequency of about 35 kHz to about 45 kHz.

8 . The method of claim 7 , wherein the wherein the ultrasonic power is applied at a power of about 50 W/gallon of the cleaning solution, at a frequency of about 40 kHz.

9 . The method of claim 1 , wherein the chamber component is fabricated from quartz.

10 . The method of claim 9 , wherein the chamber component is a gas distribution showerhead.

11 . A method of cleaning a processing chamber component fabricated from quartz comprising:
soaking the chamber component having a SiCO residue formed thereon in a cleaning solution comprising about 36% by weight of NH 4 F and about 5% by weight of HF for about 3 minutes; applying an ultrasonic power to the cleaning solution; and mechanically polishing the chamber component.

12 . The method of claim 11 , wherein the cleaning solution further comprises water.

13 . The method of claim 11 , wherein the ultrasonic power is applied at a power of about 45 W/gallon of the cleaning solution to about 55 W/gallon of the cleaning solution, at a frequency of about 35 kHz to about 45 kHz.

14 . The method of claim 13 , wherein the wherein the ultrasonic power is applied at a power of about 50 W/gallon of the cleaning solution, at a frequency of about 40 kHz.

15 . The method of claim 14 , wherein the chamber component is a gas distribution showerhead.

Assignees

• Applied Materials Inc

Inventors

• Duan Ren-Guan
• Rocha-Alvarez Juan Carlos
• Baluja Sanjeev
• Raj Daemian
• Turevsky Inna

Classifications

• H10P72/0406 Primary

  for cleaning followed by drying, rinsing, stripping, blasting or the like · CPC title

• B08B3/12

  by sonic or ultrasonic vibrations · CPC title

• C11D11/007 Primary

  Chemistry & Metallurgy · mapped topic

• B08B3/10

  with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration · CPC title

• C11D11/0041

  Chemistry & Metallurgy · mapped topic