Component including two semiconductor elements, between which at least two hermetically sealed cavities are formed and method for establishing a corresponding bonding connection between two semiconductor elements
US-2015353347-A1 · Dec 10, 2015 · US
US2016016790A1 · US · A1
| Field | Value |
|---|---|
| Publication number | US-2016016790-A1 |
| Application number | US-201414773270-A |
| Country | US |
| Kind code | A1 |
| Filing date | Feb 5, 2014 |
| Priority date | Mar 6, 2013 |
| Publication date | Jan 21, 2016 |
| Grant date | — |
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An encapsulated component and a method for producing an encapsulated component are specified. The component includes a carrier substrate, a functional structure, a thin-film cover and a reinforcement layer comprising glass. The carrier substrate, the thin-film cover and the reinforcement layer together enclose a cavity around at least parts of the functional structure.
Opening claim text (preview).
1 - 10 . (canceled) 11 . An encapsulated component, comprising: a carrier substrate; a functional structure over the carrier substrate; a thin-film cover above the functional structure; and a reinforcement layer comprising glass above the thin-film cover, wherein the carrier substrate, the thin-film cover and the reinforcement layer together enclose a cavity, at least one part of the functional structure being arranged in the cavity. 12 . The component according to claim 11 , wherein the functional structure comprises a MEMS structure. 13 . The component according to claim 11 , wherein the functional structure comprises a micro acoustic structure. 14 . The component according to claim 11 , wherein an opening is structured in the thin-film cover, the opening being closed by the reinforcement layer. 15 . The component according to claim 11 , wherein the thin-film cover comprises a material selected from the group consisting of SiO 2 , Si x N y , Al 2 O 3 , and wherein the carrier substrate comprises glass or Si. 16 . The component according to claim 11 , wherein: the cavity has a width of at least 10 μm and a height of less than 100 μm; the thin-film cover has a thickness of less than 5 μm; and the reinforcement layer has a thickness of less than 50 μm. 17 . The component according to claim 11 , wherein the functional structure is interconnected with a connection pad via a line, the connection pad being covered by neither the thin-film cover nor the reinforcement layer. 18 . A method for producing an encapsulated component, the method comprising: structuring a functional structure on a carrier substrate; applying a sacrificial layer above the carrier substrate; applying a thin-film cover above the sacrificial layer, the thin-film cover having an opening; removing the sacrificial layer through the opening in the thin-film cover; and applying a reinforcement layer above the thin-film cover. 19 . The method according to claim 18 , wherein the sacrificial layer comprises an organic material and wherein removing the sacrificial layer comprises removing the sacrificial layer by oxidation through heating in an oxygen containing atmosphere. 20 . The method according to claim 19 , wherein applying the reinforcement layer comprises: applying a glass paste; closing the opening in the thin-film cover; and firing the glass paste. 21 . The method according to claim 20 , wherein: the glass paste comprises glass frit composed of a suspension of fine glass particles in a binder matrix; the glass paste is applied to the thin-film cover by blade coating; and the binder completely decomposes during the firing of the glass paste. 22 . The method according to claim 18 , wherein the sacrificial layer is applied above the functional structure. 23 . The method according to claim 18 , wherein the thin-film cover is applied directly on the sacrificial layer. 24 . The method according to claim 18 , wherein the reinforcement layer hermetically seals the opening in the thin-film cover. 25 . An encapsulated component, comprising: a carrier substrate; a functional structure over the carrier substrate; a thin-film cover above the functional structure; a reinforcement layer comprising glass above the thin-film cover; a solder ball located next to the reinforcement layer and electrically connected to the functional structure via a lead; wherein the carrier substrate, the thin-film cover and the reinforcement layer together enclose a cavity; wherein at least one part of the functional structure is arranged in the cavity; and wherein the reinforcement layer touches the substrate such that a mechanical connection between the thin film cover and the substrate is reinforced. 26 . The component according to claim 25 , further comprising a lead extending from the functional structure to the solder ball. 27 . The component according to claim 26 , wherein the lead extends along a surface of the carrier.
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