Charged Particle Beam System

Patent metadata

Field	Value
Publication number	US-2016013012-A1
Application number	US-201514668060-A
Country	US
Kind code	A1
Filing date	Mar 25, 2015
Priority date	Mar 26, 2014
Publication date	Jan 14, 2016
Grant date	—

Abstract

A charged particle beam system has a charged particle beam source ( 110 ) for producing a charged particle beam (EB), a beam blanker ( 1 ) and a sample stage ( 130 ) on which a sample (S) is held. The sample (S) is irradiated with the beam (EB) passed through the beam blanker ( 1 ). The beam blanker ( 1 ) has a multistage deflector assembly ( 20 ) and a first apertured portion ( 30 ). Multiple stages of deflectors ( 20 a, 20 b, 20 c ) for deflecting the beam (EB) are arranged in the multistage deflector assembly ( 20 ). The first apertured portion ( 30 ) is disposed between the first stage of deflector ( 20 a ) and the second stage of deflector ( 20 b ) of the deflector assembly ( 20 ). The beam (EB) which has passed through the first aperture portion ( 30 ) after being deflected by the first stage of deflector ( 20 a ) is deflected back to an optical axis (OA) by the second and subsequent stages of deflectors ( 20 a, 20 b ).

First claim

The invention claimed is:

1 . A charged particle beam system comprising:
a charged particle beam source for producing a charged particle beam; a beam blanker for blanking the charged particle beam produced from the charged particle beam source; and a sample stage for holding a sample on which the charged particle beam passed through the beam blanker impinges, wherein the beam blanker has a multistage deflector assembly having multiple stages of deflectors for deflecting the charged particle beam and a first apertured portion disposed between first and second stages of deflectors of the multistage deflector assembly; and wherein the charged particle beam which has passed through the first apertured portion after being deflected by the first stage of deflector is deflected back to an optical axis by the second and subsequent stages of deflectors of the multistage deflector assembly.

2 . The charged particle beam system as set forth in claim 1 , further comprising a condenser lens assembly for focusing said charged particle beam passed through said beam blanker onto said sample, and wherein the beam blanker is disposed between said charged particle beam source and the condenser lens assembly.

3 . The charged particle beam system as set forth in claim 1 , wherein said beam blanker has a lens for forming a crossover of said charged particle beam at a principal plane of deflection of the first stage of deflector.

4 . The charged particle beam system as set forth in claim 1 , further comprising an imaging lens system for focusing said charged particle beam transmitted through said sample.

5 . The charged particle beam system as set forth in claim 1 , further comprising an objective lens having an upper polepiece and a lower polepiece which are disposed on opposite sides of said sample stage, and wherein said beam blanker is disposed between the upper polepiece and the sample stage.

6 . The charged particle beam system as set forth in claim 1 , wherein said multistage deflector assembly produces electric fields to deflect said charged particle beam.

7 . The charged particle beam system as set forth in claim 1 ,
wherein said multiple stages of deflectors of said multistage deflector assembly are three stages of deflectors; wherein the angle of deflection θ 1 of the charged particle beam in the first stage of deflector, the angle of deflection θ 2 of the beam in the second stage of deflector, and the angle of deflection θ 3 of the beam in the third stage of deflector have the relationship: |θ 1 |:|θ 2 |:|θ 3 |=1:2:1; and wherein the angle of deflection θ 1 and angle of deflection θ 3 are opposite in sign to the angle of deflection θ 2 .

8 . The charged particle beam system as set forth in claim 7 , wherein said beam blanker further includes a second apertured portion disposed between the second stage of deflector and the third stage of deflector.

9 . The charged particle beam system as set forth in claim 1 , further comprising a current measuring section for measuring the amount of current of said charged particle beam impinging on said first apertured portion.

10 . The charged particle beam system as set forth in claim 1 , wherein said first apertured portion includes an apertured plate having a plurality of aperture openings, and wherein the apertured plate is movably mounted.

11 . The charged particle beam system as set forth in claim 8 , further comprising a current measuring section for measuring the amount of current of said charged particle beam impinging on said second apertured portion.

Assignees

• Jeol Ltd

Inventors

• Sasaki Takeo

Classifications

• H01J2237/2802

  Transmission microscopes · CPC title

• H01J37/045 Primary

  Beam blanking or chopping, i.e. arrangements for momentarily interrupting exposure to the discharge · CPC title

• H01J37/28 Primary

  with scanning beams {(H01J37/268, H01J37/292, H01J37/2955 take precedence)} · CPC title

• H01J37/10

  Lenses · CPC title

• H01J2237/0435

  Multi-aperture · CPC title