Multi charged particle beam writing apparatus
US-2024242922-A1 · Jul 18, 2024 · US
Multi charged particle beam writing apparatus, and multi charged particle beam writing method
US9190246B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9190246-B2 |
| Application number | US-201414278177-A |
| Country | US |
| Kind code | B2 |
| Filing date | May 15, 2014 |
| Priority date | May 24, 2013 |
| Publication date | Nov 17, 2015 |
| Grant date | Nov 17, 2015 |
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Abstract
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A multi charged particle beam writing apparatus includes a dose calculation unit to calculate a first dose resolving the resist of the target object, for a first beam of the multiple beams, corresponding to a pattern forming region, in which a pattern is arranged, and to calculate a second dose not resolving the resist, for a second beam of the multiple beams, corresponding to a no-pattern forming region, which surrounds the whole perimeter of the pattern and in which no pattern is arranged, and a deflection control unit to control a plural blankers so that a dose of the first beam is to be the first dose calculated and a dose of the second beam is to be the second dose calculated.
First claim
Opening claim text (preview).
What is claimed is: 1. A multi charged particle beam writing apparatus, comprising: a stage configured to mount a target object and to be continuously movable, a resist having been applied to the target object; an emission unit configured to emit a charged particle beam; an aperture member, in which a plurality of openings are formed, configured to form multiple beams by letting a region including a whole of the plurality of openings be irradiated with the charged particle bea…
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Electricity · mapped topic
- H01J37/3177Primary
Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
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- What does patent US9190246B2 cover?
- A multi charged particle beam writing apparatus includes a dose calculation unit to calculate a first dose resolving the resist of the target object, for a first beam of the multiple beams, corresponding to a pattern forming region, in which a pattern is arranged, and to calculate a second dose not resolving the resist, for a second beam of the multiple beams, corresponding to a no-pattern form…
- Who is the assignee on this patent?
- Nuflare Technology Inc
- What technology area does this patent fall under?
- Primary CPC classification H01J37/3177. Mapped technology areas include Electricity.
- When was this patent published?
- Publication date Tue Nov 17 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).