Multi-zone pedestal for plasma processing

Patent metadata

Field	Value
Publication number	US-2016002779-A1
Application number	US-201514738610-A
Country	US
Kind code	A1
Filing date	Jun 12, 2015
Priority date	Jul 2, 2014
Publication date	Jan 7, 2016
Grant date	—

Abstract

A method and apparatus for a heated pedestal is provided. In one embodiment, the heated pedestal includes a body comprising a ceramic material, a plurality of heating elements encapsulated within the body, and one or more grooves formed in a surface of the body adjacent each of the plurality of heating elements, at least one side of the grooves being bounded by a ceramic plate.

First claim

What is claimed is:

1 . A pedestal for a semiconductor processing chamber, comprising:
a body comprising a ceramic material, wherein one or more grooves are formed in one or more surfaces of the body; a ceramic plate bounding at least one side of the grooves; and a plurality of heater elements encapsulated within the body.

2 . The pedestal of claim 1 , further comprising:
a hollow shaft comprising a ceramic material coupled to the body; and a dielectric insert having a plurality of channels formed therein disposed in the hollow shaft.

3 . The pedestal of claim 2 , wherein at least a portion of the channels in the dielectric insert comprise a curved portion having an end terminating at an end of at least one of the grooves formed in a surface of the body.

4 . The pedestal of claim 2 , further comprising multiple terminals disposed inside the dielectric insert.

5 . The pedestal of claim of claim 4 , wherein the terminals are symmetrically distributed with a center terminal connected to a metallic RF mesh.

6 . The pedestal of claim of 5 , wherein the center terminal is connected to ground, an RF generator, a tunable capacitor, or combinations thereof.

7 . The pedestal of claim 1 , wherein the plurality of heater elements comprises three to four heating elements.

8 . The pedestal of claim 7 , wherein the heater elements are concentric.

9 . The pedestal of claim 7 , wherein the heater elements are in a pie shape.

10 . The pedestal of claim 7 , wherein the heater elements are in different layers inside the ceramic body.

11 . The pedestal of claim 7 , wherein the heater elements are separated by thermal void formed in the body.

12 . A pedestal for a semiconductor processing chamber, comprising:
a body comprising a ceramic material, wherein one or more grooves are formed a major surface of the body; a ceramic plate coupled to the major surface and bounding at least one side of the grooves; a plurality of heater elements encapsulated within the body; a hollow shaft comprising a ceramic material coupled to the body; and a dielectric insert having a plurality of channels formed therein disposed in the hollow shaft.

13 . The pedestal of claim 12 , wherein at least a portion of the channels in the dielectric insert comprise a curved portion having an end terminating at an end of at least one of the grooves formed in the body.

14 . The pedestal of claim 12 , wherein the plurality of heater elements comprises three to four heating elements.

15 . The pedestal of claim 14 , wherein the heater elements are concentric.

16 . The pedestal of claim 14 , wherein the heater elements are in a pie shape.

17 . The pedestal of claim 14 , wherein the heater elements are in different layers inside the ceramic body.

18 . The pedestal of claim 14 , wherein the heater elements are separated by thermal void formed in the body.

19 . A pedestal for a semiconductor processing chamber, comprising:
a body comprising a ceramic material, wherein one or more grooves are formed a major surface of the body; a ceramic plate coupled to the major surface and bounding at least one side of the grooves; a plurality of heater elements encapsulated within the body; a hollow shaft comprising a ceramic material coupled to the body; and a dielectric insert having a plurality of channels formed therein disposed in the hollow shaft, wherein at least a portion of the channels in the dielectric insert comprise a curved portion having an end terminating at an end of at least one of the grooves formed in the body.

20 . The pedestal of claim 19 , further comprising multiple terminals disposed inside the dielectric insert.

Assignees

• Applied Materials Inc

Inventors

• Lin Xing
• Yang Bozhi
• Zhou Jianhua
• Dubois Dale R
• Rocha-Alvarez Juan Carlos
• Sankarakrishnan Ramprakash

Classifications

• H10P72/7626

  characterised by the construction of the shaft · CPC title

• H10P72/0434

  mainly by convection · CPC title

• H10P72/0432

  mainly by conduction · CPC title

• H10P72/76 Primary

  using mechanical means, e.g. clamps or pinches · CPC title

• H01J37/32724

  Temperature · CPC title