Laser processing method

US2015231738A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2015231738-A1
Application numberUS-201514624954-A
CountryUS
Kind codeA1
Filing dateFeb 18, 2015
Priority dateFeb 18, 2014
Publication dateAug 20, 2015
Grant date

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  1. Title

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  2. Abstract

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A laser processing method includes steps of providing a mask material of which thickness is equal to or greater than 10 μm onto an object, and forming a hole in the object or cutting the object in a state where the mask material is provided on the object, in a manner that an ultrashort-pulse laser light is irradiated from above the object and an opening portion is formed at the mask material to penetrate the mask material while ablation processing is performed to a portion of the object by the ultrashort-pulse laser light, the portion of the object being below the opening portion.

First claim

Opening claim text (preview).

1 . A laser processing method comprising steps of: providing a mask material of which thickness is equal to or greater than 10 μm onto an object; and forming a hole in the object or cutting the object in a state where the mask material is provided on the object, in a manner that an ultrashort-pulse laser light is irradiated from above the object and an opening portion is formed at the mask material to penetrate the mask material while ablation processing is performed to a portion of the object by the ultrashort-pulse laser light, the portion of the object being below the opening portion. 2 . The laser processing method according to claim 1 , wherein the mask material made of low-melting-point alloy is provided onto the object in the step of providing the mask material. 3 . The laser processing method according to claim 1 , wherein the mask material corresponding to resin sheet is provided onto the object to be in close contact with the object in the step of providing the mask material. 4 . The laser processing method according to claim 2 , wherein the low-melting-point alloy is melted at a temperature that is higher than a melting point of the low-melting-point alloy and the melted low-melting-point alloy is applied onto the object in the step of providing the mask material. 5 . The laser processing method according to claim 4 , comprising a step of: removing the mask material with the use of water heated to a temperature that is higher than the melting point of the mask material in a state where the mask material is provided on the object. 6 . The laser processing method according to claim 4 , wherein a resin sheet, opaque resin tape, or thermally foaming adhesive film configured to be removed when heated is used as the mask material. 7 . The laser processing method according to claim 4 , wherein irradiation power of the ultrashort-pulse laser light is higher than a processing threshold of the mask material and is higher than a processing threshold of the object. 8 . A laser processing apparatus used in a laser processing method, the laser processing method comprising steps of: providing a mask material of which thickness is equal to or greater than 10 μm onto an object; and forming a hole in the object or cutting the object in a state where the mask material is provided on the object, in a manner that an ultrashort-pulse laser light is irradiated from above the object and an opening portion is formed at the mask material to penetrate the mask material while ablation processing is performed to a portion of the object by the ultrashort-pulse laser light, the portion of the object being below the opening portion.

Assignees

Inventors

Classifications

  • B23K26/381Primary

    Operations & Transport · mapped topic

  • B23K26/382Primary

    by boring · CPC title

  • disposed on the workpiece · CPC title

  • by boring or cutting · CPC title

  • using ultrashort pulses, i.e. pulses of 1 ns or less · CPC title

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What does patent US2015231738A1 cover?
A laser processing method includes steps of providing a mask material of which thickness is equal to or greater than 10 μm onto an object, and forming a hole in the object or cutting the object in a state where the mask material is provided on the object, in a manner that an ultrashort-pulse laser light is irradiated from above the object and an opening portion is formed at the mask material to…
Who is the assignee on this patent?
Aisin Seiki
What technology area does this patent fall under?
Primary CPC classification B23K26/381. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Thu Aug 20 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).