Adjustable spatial filter for laser scribing apparatus
US-2015104956-A1 · Apr 16, 2015 · US
Microwave Processing Apparatus and Microwave Processing Method
US2015206778A1 · US · A1
| Field | Value |
|---|---|
| Publication number | US-2015206778-A1 |
| Application number | US-201514591214-A |
| Country | US |
| Kind code | A1 |
| Filing date | Jan 7, 2015 |
| Priority date | Jan 20, 2014 |
| Publication date | Jul 23, 2015 |
| Grant date | — |
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Abstract
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A microwave processing apparatus for processing a substrate by irradiating a microwave to the substrate includes: a processing container configured to accommodate a substrate; and a microwave introducing device configured to have a microwave source that generates a microwave and introduce the microwave into a microwave radiation space within the processing container. The microwave introducing device includes: a waveguide configured to form a transmission path to guide the microwave into the processing container; a first microwave transmission window interposed between the transmission path and the microwave radiation space; and a second microwave transmission window installed to be closer to the microwave source than the first microwave transmission window, and configured to change a traveling direction of the microwave.
First claim
Opening claim text (preview).
What is claimed is: 1 . A microwave processing apparatus for processing a substrate by irradiating a microwave to the substrate, comprising: a processing container configured to accommodate a substrate; and a microwave introducing device configured to have a microwave source that generates a microwave and introduce the microwave into a microwave radiation space within the processing container, wherein the microwave introducing device comprises: a waveguide configured to form a transmission path to guide the microwave into the processing container; a first microwave transmission window interposed between the transmission path and the microwave radiation space; and a second microwave transmission window installed to be closer to the microwave source than the first microwave transmission window, and configured to change a traveling direction of the microwave. 2 . The microwave processing apparatus of claim 1 , wherein the second microwave transmission window includes one or more dielectric plates, and wherein permittivity within each of the dielectric plates is not uniform. 3 . The microwave processing apparatus of claim 2 , wherein the permittivity within each of the dielectric plates is not uniform in a direction perpendicular to the traveling direction of the microwave transmitted through the waveguide. 4 . The microwave processing apparatus of claim 2 , wherein the second microwave transmission window has a stacked structure of the dielectric plates. 5 . The microwave processing apparatus of claim 4 , wherein each of the dielectric plates of the second microwave transmission window is rotatably installed. 6 . The microwave processing apparatus of claim 1 , wherein the second microwave transmission window includes one or more dielectric members, each of the dielectric members having a configuration in which thicknesses thereof are changed, and forms an incident angle, rather than a right angle, with respect to the traveling direction of the microwave transmitted through the waveguide. 7 . The microwave processing apparatus of claim 6 , wherein each of the dielectric members has a wedge-shaped cross-section along the traveling direction of the microwave. 8 . The microwave processing apparatus of claim 6 , wherein the second microwave transmission window has a stacked structure of the dielectric members. 9 . The microwave processing apparatus of claim 8 , wherein each of the dielectric members is rotatably installed. 10 . A microwave processing method for processing a substrate using the microwave processing apparatus as set forth in claim 1 .
Assignees
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Classifications
Thermal treatments, e.g. annealing or sintering · CPC title
- H10P72/0436Primary
mainly by radiation · CPC title
using waveguides · CPC title
Electricity · mapped topic
- H01L21/67115Primary
Electricity · mapped topic
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- What does patent US2015206778A1 cover?
- A microwave processing apparatus for processing a substrate by irradiating a microwave to the substrate includes: a processing container configured to accommodate a substrate; and a microwave introducing device configured to have a microwave source that generates a microwave and introduce the microwave into a microwave radiation space within the processing container. The microwave introducing d…
- Who is the assignee on this patent?
- Tokyo Electron Ltd
- What technology area does this patent fall under?
- Primary CPC classification H10P72/0436. Mapped technology areas include Electricity.
- When was this patent published?
- Publication date Thu Jul 23 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).