Substrate structure and manufacturing method thereof

US2015114698A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2015114698-A1
Application numberUS-201314105195-A
CountryUS
Kind codeA1
Filing dateDec 13, 2013
Priority dateOct 30, 2013
Publication dateApr 30, 2015
Grant date

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

A substrate structure includes a substrate and a filling material. The substrate has an upper surface, a lower surface, at least one first blind via and at least one second blind via. The substrate includes an insulation layer, a first copper foil layer and a second copper foil layer. The first copper foil layer and the second copper foil layer are respectively disposed on two opposite side surfaces of the insulation layer. The first blind via extends from the upper surface toward the second copper foil layer and exposes a portion of the second copper foil layer. The second blind via extends from the lower surface toward the first copper foil layer and exposes a portion of the first copper foil layer. The filling material is filled inside of the first blind via and the second blind via and covers the upper surface and the lower surface of the substrate.

First claim

Opening claim text (preview).

What is claimed is: 1 . A substrate structure, comprising: a substrate, having an upper surface and a lower surface opposite to each other, at least one first blind via and at least one second blind via, the substrate comprising an insulation layer, a first copper foil layer and a second copper foil layer, wherein the first copper foil layer and the second copper foil layer are located on two opposite side surfaces of the insulation layer, the first copper foil layer and the sec…

Assignees

Inventors

Classifications

Patent family

Related publications grouped by family.

External sources

Next steps

Free tools are coming soon. Tell us what you want to track and we'll notify you.

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US2015114698A1 cover?
A substrate structure includes a substrate and a filling material. The substrate has an upper surface, a lower surface, at least one first blind via and at least one second blind via. The substrate includes an insulation layer, a first copper foil layer and a second copper foil layer. The first copper foil layer and the second copper foil layer are respectively disposed on two opposite side sur…
Who is the assignee on this patent?
Huang Tzu-Wei, Wang Chin-Sheng, Subtron Technology Co Ltd
What technology area does this patent fall under?
Primary CPC classification H05K1/115. Mapped technology areas include Electricity.
When was this patent published?
Publication date Thu Apr 30 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).