Method and layout for detecting die cracks

US2015048373A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2015048373-A1
Application numberUS-201414527756-A
CountryUS
Kind codeA1
Filing dateOct 29, 2014
Priority dateJul 4, 2013
Publication dateFeb 19, 2015
Grant date

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A method of detecting a crack in a semiconductor die is provided. The method includes the following steps. A semiconductor die having an outer edge is provided, wherein a conductive feature is formed on semiconductor die along the outer edge. The conductive feature is biased, and a leakage current of the semiconductor die is measured, such that the crack propagating in the semiconductor the is detected. A semiconductor the with a layout for detecting a die crack and the method of manufacturing it are also provided. The semiconductor the includes a semiconductor the having an outer edge, and a conductive feature on the semiconductor die along the outer edge. The conductive feature is configured to be biased by an external pin.

First claim

Opening claim text (preview).

What is claimed is: 1 . A semiconductor die with a layout for detecting a die crack, comprising: a semiconductor die having an outer edge; and a conductive feature on the semiconductor die along the outer edge, wherein the conductive feature is configured to be biased by an external pin. 2 . The semiconductor die of claim 1 , wherein the semiconductor die comprises a off-die barrier structure around the perimeter of the outer edge. 3 . The method of claim 1 , wherein the semiconductor die comprise two adjacent conductive paths around the perimeter, wherein an outer conductive path is an off-die barrier structure, and an inner conductive path is an elevated voltage bus for electrical fuse operations. 4 . The semiconductor die of claim 1 , wherein the conductive feature is a metal line. 5 . The semiconductor die of claim 4 wherein the metal line is extended from a bus of the semiconductor die. 6 . The semiconductor die of claim 5 , wherein the bus is a grounded bus.

Assignees

Inventors

Classifications

  • Structural properties, e.g. testing or measuring thicknesses, line widths, warpage, bond strengths or physical defects · CPC title

  • Circuits for electrically characterising or monitoring manufacturing processes, e.g. circuits in tested chips or circuits in testing wafers · CPC title

  • H01L22/32Primary

    Electricity · mapped topic

  • Adaptations of individual semiconductor devices to facilitate the testing thereof · CPC title

  • Testing of materials or semi-finished products, e.g. semiconductor wafers or substrates (G01R31/318511 takes precedence; testing during manufacture H10P74/00) · CPC title

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What does patent US2015048373A1 cover?
A method of detecting a crack in a semiconductor die is provided. The method includes the following steps. A semiconductor die having an outer edge is provided, wherein a conductive feature is formed on semiconductor die along the outer edge. The conductive feature is biased, and a leakage current of the semiconductor die is measured, such that the crack propagating in the semiconductor the is …
Who is the assignee on this patent?
Nanya Technology Corp
What technology area does this patent fall under?
Primary CPC classification H01L22/32. Mapped technology areas include Electricity.
When was this patent published?
Publication date Thu Feb 19 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).