Metal-enolate precursors for depositing metal-containing films
US-8962875-B2 · Feb 24, 2015 · US
US2015031908A1 · US · A1
| Field | Value |
|---|---|
| Publication number | US-2015031908-A1 |
| Application number | US-201414333792-A |
| Country | US |
| Kind code | A1 |
| Filing date | Jul 17, 2014 |
| Priority date | Jul 23, 2013 |
| Publication date | Jan 29, 2015 |
| Grant date | — |
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Porous metal-organic frameworks (MOFs) and metallated porous MOFs are provided. Also provided are methods of metallating porous MOFs using atomic layer deposition and methods of using the metallated MOFs as catalysts and in remediation applications.
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What is claimed is: 1 . A method of metallating a porous metal-organic framework comprising inorganic nodes and organic linkers, the method comprising depositing a film comprising a metal on the surfaces within the pores of the metal-organic framework via atomic layer deposition. 2 . The method of claim 1 , wherein the inorganic nodes of the metal-organic framework comprise zirconium. 3 . The method of claim 1 , wherein the film compr…
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