Capacitance reduction for semiconductor devices based on wafer bonding
US-2020303238-A1 · Sep 24, 2020 · US
US12588485B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-12588485-B2 |
| Application number | US-202217855017-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jun 30, 2022 |
| Priority date | Jun 30, 2022 |
| Publication date | Mar 24, 2026 |
| Grant date | Mar 24, 2026 |
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Structures having airgaps for backside signal routing or power delivery are described. In an example, an integrated circuit structure includes a front-side structure including a device layer having a plurality of nanowire-based transistors, and a plurality of metallization layers above the nanowire-based transistors of the device layer. A backside structure is below the nanowire-based transistors of the device layer. The backside structure includes a first conductive line laterally spaced apart from a second conductive line by an air gap.
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What is claimed is: 1 . An integrated circuit structure, comprising: a front-side structure comprising: a device layer having a plurality of nanowire-based transistors; and a plurality of metallization layers above the nanowire-based transistors of the device layer; and a backside structure below the nanowire-based transistors of the device layer, the backside structure including a first conductive line laterally spaced apart from a second conductive line by an air gap. 2 . The integrated circuit structure of claim 1 , wherein one or both of the first conductive line or the second conductive line of the backside structure is for signal routing. 3 . The integrated circuit structure of claim 1 , wherein one or both of the first conductive line or the second conductive line of the backside structure is for power delivery. 4 . The integrated circuit structure of claim 1 , wherein the backside structure further includes a third conductive line laterally spaced apart from a fourth conductive line by a second air gap, the second airgap vertically beneath the airgap. 5 . The integrated circuit structure of claim 4 , wherein the backside structure further includes a fifth conductive line laterally spaced apart from a sixth conductive line by a third air gap, the third airgap vertically beneath the second airgap. 6 . An integrated circuit structure, comprising: a front-side structure comprising: a device layer having a plurality of fin-based transistors; and a plurality of metallization layers above the fin-based transistors of the device layer; and a backside structure below the fin-based transistors of the device layer, the backside structure including a first conductive line laterally spaced apart from a second conductive line by an air gap. 7 . The integrated circuit structure of claim 6 , wherein one or both of the first conductive line or the second conductive line of the backside structure is for signal routing. 8 . The integrated circuit structure of claim 6 , wherein one or both of the first conductive line or the second conductive line of the backside structure is for power delivery. 9 . The integrated circuit structure of claim 6 , wherein the backside structure further includes a third conductive line laterally spaced apart from a fourth conductive line by a second air gap, the second airgap vertically beneath the airgap. 10 . The integrated circuit structure of claim 9 , wherein the backside structure further includes a fifth conductive line laterally spaced apart from a sixth conductive line by a third air gap, the third airgap vertically beneath the second airgap. 11 . A computing device, comprising: a board; and a component coupled to the board, the component including an integrated circuit structure, comprising: a front-side structure comprising: a device layer having a plurality of nanowire-based transistors; and a plurality of metallization layers above the nanowire-based transistors of the device layer; and a backside structure below the nanowire-based transistors of the device layer, the backside structure including a first conductive line laterally spaced apart from a second conductive line by an air gap. 12 . The computing device of claim 11 , further comprising: a memory coupled to the board. 13 . The computing device of claim 11 , further comprising: a communication chip coupled to the board. 14 . The computing device of claim 11 , wherein the component is a packaged integrated circuit die. 15 . The computing device of claim 11 , wherein the component is selected from the group consisting of a processor, a communications chip, and a digital signal processor. 16 . A computing device, comprising: a board; and a component coupled to the board, the component including an integrated circuit structure, comprising: a front-side structure comprising: a device layer having a plurality of fin-based transistors; and a plurality of metallization layers above the fin-based transistors of the device layer; and a backside structure below the fin-based transistors of the device layer, the backside structure including a first conductive line laterally spaced apart from a second conductive line by an air gap. 17 . The computing device of claim 16 , further comprising: a memory coupled to the board. 18 . The computing device of claim 16 , further comprising: a communication chip coupled to the board. 19 . The computing device of claim 16 , wherein the component is a packaged integrated circuit die. 20 . The computing device of claim 16 , wherein the component is selected from the group consisting of a processor, a communications chip, and a digital signal processor.
Power or ground buses · CPC title
Insulating materials thereof · CPC title
oriented parallel to substrates · CPC title
characterised by the structure of the channel, e.g. transverse or longitudinal shape or doping profile (TFTs having channel structures for preventing kink or snapback effects H10D30/6708; TFTs having lightly-doped source or drain extensions H10D30/6715) · CPC title
having gates fully surrounding the channels, e.g. gate-all-around · CPC title
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