Integrated circuit structures having airgaps for backside signal routing or power delivery

US12588485B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12588485-B2
Application numberUS-202217855017-A
CountryUS
Kind codeB2
Filing dateJun 30, 2022
Priority dateJun 30, 2022
Publication dateMar 24, 2026
Grant dateMar 24, 2026

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

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Structures having airgaps for backside signal routing or power delivery are described. In an example, an integrated circuit structure includes a front-side structure including a device layer having a plurality of nanowire-based transistors, and a plurality of metallization layers above the nanowire-based transistors of the device layer. A backside structure is below the nanowire-based transistors of the device layer. The backside structure includes a first conductive line laterally spaced apart from a second conductive line by an air gap.

First claim

Opening claim text (preview).

What is claimed is: 1 . An integrated circuit structure, comprising: a front-side structure comprising: a device layer having a plurality of nanowire-based transistors; and a plurality of metallization layers above the nanowire-based transistors of the device layer; and a backside structure below the nanowire-based transistors of the device layer, the backside structure including a first conductive line laterally spaced apart from a second conductive line by an air gap. 2 . The integrated circuit structure of claim 1 , wherein one or both of the first conductive line or the second conductive line of the backside structure is for signal routing. 3 . The integrated circuit structure of claim 1 , wherein one or both of the first conductive line or the second conductive line of the backside structure is for power delivery. 4 . The integrated circuit structure of claim 1 , wherein the backside structure further includes a third conductive line laterally spaced apart from a fourth conductive line by a second air gap, the second airgap vertically beneath the airgap. 5 . The integrated circuit structure of claim 4 , wherein the backside structure further includes a fifth conductive line laterally spaced apart from a sixth conductive line by a third air gap, the third airgap vertically beneath the second airgap. 6 . An integrated circuit structure, comprising: a front-side structure comprising: a device layer having a plurality of fin-based transistors; and a plurality of metallization layers above the fin-based transistors of the device layer; and a backside structure below the fin-based transistors of the device layer, the backside structure including a first conductive line laterally spaced apart from a second conductive line by an air gap. 7 . The integrated circuit structure of claim 6 , wherein one or both of the first conductive line or the second conductive line of the backside structure is for signal routing. 8 . The integrated circuit structure of claim 6 , wherein one or both of the first conductive line or the second conductive line of the backside structure is for power delivery. 9 . The integrated circuit structure of claim 6 , wherein the backside structure further includes a third conductive line laterally spaced apart from a fourth conductive line by a second air gap, the second airgap vertically beneath the airgap. 10 . The integrated circuit structure of claim 9 , wherein the backside structure further includes a fifth conductive line laterally spaced apart from a sixth conductive line by a third air gap, the third airgap vertically beneath the second airgap. 11 . A computing device, comprising: a board; and a component coupled to the board, the component including an integrated circuit structure, comprising: a front-side structure comprising: a device layer having a plurality of nanowire-based transistors; and a plurality of metallization layers above the nanowire-based transistors of the device layer; and a backside structure below the nanowire-based transistors of the device layer, the backside structure including a first conductive line laterally spaced apart from a second conductive line by an air gap. 12 . The computing device of claim 11 , further comprising: a memory coupled to the board. 13 . The computing device of claim 11 , further comprising: a communication chip coupled to the board. 14 . The computing device of claim 11 , wherein the component is a packaged integrated circuit die. 15 . The computing device of claim 11 , wherein the component is selected from the group consisting of a processor, a communications chip, and a digital signal processor. 16 . A computing device, comprising: a board; and a component coupled to the board, the component including an integrated circuit structure, comprising: a front-side structure comprising: a device layer having a plurality of fin-based transistors; and a plurality of metallization layers above the fin-based transistors of the device layer; and a backside structure below the fin-based transistors of the device layer, the backside structure including a first conductive line laterally spaced apart from a second conductive line by an air gap. 17 . The computing device of claim 16 , further comprising: a memory coupled to the board. 18 . The computing device of claim 16 , further comprising: a communication chip coupled to the board. 19 . The computing device of claim 16 , wherein the component is a packaged integrated circuit die. 20 . The computing device of claim 16 , wherein the component is selected from the group consisting of a processor, a communications chip, and a digital signal processor.

Assignees

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Classifications

  • Power or ground buses · CPC title

  • Insulating materials thereof · CPC title

  • oriented parallel to substrates · CPC title

  • characterised by the structure of the channel, e.g. transverse or longitudinal shape or doping profile (TFTs having channel structures for preventing kink or snapback effects H10D30/6708; TFTs having lightly-doped source or drain extensions H10D30/6715) · CPC title

  • having gates fully surrounding the channels, e.g. gate-all-around · CPC title

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What does patent US12588485B2 cover?
Structures having airgaps for backside signal routing or power delivery are described. In an example, an integrated circuit structure includes a front-side structure including a device layer having a plurality of nanowire-based transistors, and a plurality of metallization layers above the nanowire-based transistors of the device layer. A backside structure is below the nanowire-based transisto…
Who is the assignee on this patent?
Intel Corp
What technology area does this patent fall under?
Primary CPC classification H10W20/42. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Mar 24 2026 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).