Arc-beam position monitoring and position control in PICVD coating systems

Patent metadata

Field	Value
Publication number	US-12577671-B2
Application number	US-202218264619-A
Country	US
Kind code	B2
Filing date	Feb 9, 2022
Priority date	Feb 9, 2021
Publication date	Mar 17, 2026
Grant date	Mar 17, 2026

Abstract

A method to stabilize position and shape of a plasma beam established between a cathode and an anode, where an electrical field is established between the cathode and the anode and where the shortest electrical field line between the cathode and the anode defines a reference line, wherein at least one oriented electromagnetic coil is provided and the at least one oriented electromagnetic coil has its coil axis oriented in a non-colinear manner to the reference line in such a way that at least one of the straight lines which are intersecting both of the coil openings and which are parallel to the coil axis intersects with the reference line and where a current is sent through the at least one oriented electromagnetic coil in order to establish a magnetic field which is used to deflect or attract the plasma beam.

First claim

The invention claimed is:

1 . A method for stabilizing a position and a shape of a plasma beam established between a cathode and an anode, the method comprising the steps of:
establishing an electrical field between the cathode and the anode, wherein a shortest electrical field line between the cathode and the anode defines a reference line, wherein at least one oriented electromagnetic coil is provided, wherein the at least one oriented electromagnetic coil has a coil axis oriented in a non-colinear manner to the reference line in such a way that at least one straight line which intersects a coil opening of the at least one oriented electromagnetic coil and which is parallel to the coil axis intersects with the reference line; sending a current through the at least one oriented electromagnetic coil; producing by a set of coils magnetic fields Bx, By configured to deflect or attract the plasma beam, wherein the magnetic fields Bx, By are oriented perpendicular to an axial magnetic field Bz thereby stabilizing the plasma beam; and using the magnetic fields Bx By and a determination of an arc impedance to determine a plasma beam position.

2 . The method according to claim 1 , wherein the non-colinear orientation is a perpendicular orientation.

3 . The method according to claim 1 , further Including providing at least one mirrored electromagnetic coil oriented and positioned with respect to the at least one oriented electromagnetic coil in a mirrored manner, the reference line being used as mirror axis, the at least one oriented electromagnetic coil and the mirrored electromagnetic coil forming a first pair of electromagnetic coils.

4 . The method according to claim 3 , further including providing a second pair of electromagnetic coils arranged in such a manner that their coil axis is oriented in a non-collinear manner with the reference line, wherein the coil axis of the second pair of electromagnetic coils intersect the reference line and the second pair of electromagnetic coils is oriented in a non-colinear manner with an axis of the first pair of electromagnetic coils.

5 . The method according to claim 4 , wherein the coil axis of the second pair of electromagnetic coils is perpendicular to the reference line.

6 . The method according to claim 1 , further including arranging the magnetic fields so that field lines are parallel to the coil axis from the cathode to the anode and a field strength is approximately homogeneous.

7 . The method according to claim 1 , further including extracting a static position of the plasma beam from a modulated voltage signal using a demodulation technique.

8 . The method according to claim 1 , further including offsetting a position of the are plasma beam can be expressed in coordinates x and y by a transformation from polar to cartesian coordinates.

9 . The method according to claim 1 , further including determining the position of the plasma beam in view of a curvature of an arc impedance paraboloid.

10 . The method according to claim 1 , further including using static offset currents Isx and Isy for correction of an actual are plasma beam position.

11 . The method according to claim 1 , further including iteratively repeating wherein a correction process for plasma beam centering.

12 . The method according to claim 9 , further including determining the curvature of the arc impedance paraboloid by manually testing an arc voltage for static offset currents Isx and Isy.

13 . The method according to claim 12 , further including choosing intentionally non-equal coil modulation currents Imx and Imy corresponding to the first and second pair of electromagnetic coils for determining the curvature required for determination of the beam position.

14 . The method according to claim 13 , further including assuming uniaxial symmetry of the impedance paraboloid, determining the values of the curvature of arc impedance paraboloid ahead of the process for each step, and obtaining the curvature required for determining the beam position.

15 . The method according to claim 5 , wherein an orientation of the coil axis of the second pair of electromagnetic coils is perpendicular to the coil axis of the first pair of electromagnetic coils.

16 . The method according to claim 1 , further including extracting a static position of the plasma beam from a modulated voltage signal using a phase sensitive quadrature demodulation applied to the modulated voltage signal, wherein both an amplitude and a phase delay to an imposed field modulation is detected.

17 . The method according to claim 8 , wherein an amplitude provides a static offset position from a center alignment and a phase delay gives an angle direction of a misalignment of the arc beam.

18 . The method according to claim 1 , further including using static offset currents Isx and Isy for correction of an actual arc plasma position by superimposing the static offset currents Isx and Isy to a coil modulation signal, and wherein the arc beam is centered by using the estimation that Isx=−dIx and Isy=−dIy, wherein a check of the centering of the beam is indicated by a disappearance of the coil modulation signal.

19 . The method according to claim 11 , wherein the iteration procedure is automated as an on-line plasma beam centering method which maintains the plasma beam position in a centered position over time.

Assignees

• Oerlikon Surface Solutions Ag Pfaeffikon

Inventors

• Züger Othmar

Classifications

• H01J37/32669

  Particular magnets or magnet arrangements for controlling the discharge · CPC title

• H01J37/32064

  Circuits specially adapted for controlling the arc discharge (for plasma torches H01H1/36) · CPC title

• C23C16/52

  Controlling or regulating the coating process {(C23C16/45557, C23C16/279 take precedence)} · CPC title

• H05H1/24

  Generating plasma {(nuclear fusion reactors G21B1/00; gas-filled discharge reactors H01J37/32)} · CPC title

• C23C16/517

  using a combination of discharges covered by two or more of groups C23C16/503 - C23C16/515 · CPC title