Photodefined aperture plate and method for producing the same

Patent metadata

Field	Value
Publication number	US-12565710-B2
Application number	US-202418411467-A
Country	US
Kind code	B2
Filing date	Jan 12, 2024
Priority date	Dec 28, 2010
Publication date	Mar 3, 2026
Grant date	Mar 3, 2026

Abstract

In one embodiment, a method for manufacturing an aperture plate includes depositing a releasable seed layer above a substrate, applying a first patterned photolithography mask above the releasable seed layer, the first patterned photolithography mask having a negative pattern to a desired aperture pattern, electroplating a first material above the exposed portions of the releasable seed layer and defined by the first mask, applying a second photolithography mask above the first material, the second photolithography mask having a negative pattern to a first cavity, electroplating a second material above the exposed portions of the first material and defined by the second mask, removing both masks, and etching the releasable seed layer to release the first material and the second material. The first and second material form an aperture plate for use in aerosolizing a liquid. Other aperture plates and methods of producing aperture plates are described according to other embodiments.

First claim

What is claimed is:

1 . An aperture plate for use in aerosolizing a liquid in a nebulizer, comprising:
a first layer formed through a photolithography process and including a first thickness, the first layer defining a first plurality of apertures; and a second layer formed through a photolithography process and including a second thickness, the second layer positioned above the first layer and defining a second plurality of apertures, wherein a first aperture from the first plurality of apertures and a second aperture from the second plurality of apertures form two stepped-down cylinders, and wherein the second thickness is greater than the first thickness.

2 . The aperture plate of claim 1 , wherein the two stepped-down cylinders are coaxial.

3 . The aperture plate of claim 1 , wherein the two stepped-down cylinders are concentric.

4 . The aperture plate of claim 1 , wherein the first aperture forms an outlet and the second aperture forms an inlet.

5 . The aperture plate of claim 4 , wherein the outlet includes a diameter between 1 μm and 5 μm and the inlet includes a diameter between 50 μm and 100 μm.

6 . The aperture plate of claim 1 , further comprising a third layer formed through a photolithography process, the third layer positioned above the second layer and defining a third plurality of apertures, wherein the first aperture from the first plurality of apertures, the second aperture from the second plurality of apertures, and a third aperture from the third plurality of apertures form three stepped-down cylinders.

7 . The aperture plate of claim 1 , wherein the first layer and the second layer comprise the same material.

8 . The aperture plate of claim 7 , wherein the material includes palladium or nickel.

9 . The aperture plate of claim 1 , wherein the first layer comprises a first material and the second layer comprises a second material different than the first material.

10 . An aperture plate for use in aerosolizing a liquid in a nebulizer, comprising:
a first layer formed through a photolithography process, the first layer defining a first plurality of apertures; a second layer formed through a photolithography process, the second layer positioned above the first layer and defining a second plurality of apertures; and a third layer formed through a photolithography process, the third layer positioned above the second layer and defining a third plurality of apertures, wherein a first aperture from the first plurality of apertures, a second aperture from the second plurality of apertures, and a third aperture from the third plurality of apertures form three stepped-down cylinders.

11 . The aperture plate of claim 10 , wherein the first aperture forms an outlet cylinder, the second aperture forms an intermediate cylinder, and the third aperture forms an inlet cylinder.

12 . The aperture plate of claim 11 , wherein the outlet cylinder includes a diameter between 1 μm and 5 μm, the intermediate cylinder includes a diameter between 10 μm and 30 μm, and the inlet cylinder includes a diameter between 50 μm and 100 μm.

13 . The aperture plate of claim 10 , wherein the first layer, the second layer, and the third layer comprise the same material.

14 . The aperture plate of claim 10 , wherein the first layer comprises a first material, the second layer comprises a second material different than the first material, and the third layer comprises a third material different than the first material and the second material.

15 . A method for manufacturing an aperture plate for aerosolizing a liquid in a nebulizer, the method comprising:
applying a first patterned photolithography mask above the releasable seed layer; electroplating a first material above exposed portions of the releasable seed layer and between portions of the first patterned photolithography mask; applying a second patterned photolithography mask above the first material; electroplating a second material above exposed portions of the first material and between portions of the second patterned photolithography mask; removing the first patterned photolithography mask to form a first layer defining a first plurality of apertures; removing the second patterned photolithography mask to form a second layer defining a second plurality of apertures, wherein a first aperture from the first plurality of apertures and a second aperture from the second plurality of apertures form two stepped-down cylinders; and etching the releasable seed layer to release the first material and the second material.

16 . The method of claim 15 , wherein the two stepped-down cylinders are coaxial.

17 . The method of claim 15 , wherein the two stepped-down cylinders are concentric.

18 . The method of claim 15 , wherein the first aperture forms an outlet and the second aperture forms an inlet.

19 . The method of claim 15 , wherein the first layer includes a first thickness, wherein the second layer includes a second thickness, and wherein the second thickness is greater than the first thickness.

Assignees

• Stamford Devices Ltd

Inventors

• Xu Hong

Classifications

• C25D5/48

  After-treatment of electroplated surfaces · CPC title

• C25D5/34

  Pretreatment of metallic surfaces to be electroplated · CPC title

• C25D3/54

  of metals not provided for in groups C25D3/04 - C25D3/50 · CPC title

• C25D3/48

  of gold · CPC title

• C25D3/46

  of silver · CPC title