Photodefined aperture plate and method for producing the same

US10508353B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10508353-B2
Application numberUS-201715625639-A
CountryUS
Kind codeB2
Filing dateJun 16, 2017
Priority dateDec 28, 2010
Publication dateDec 17, 2019
Grant dateDec 17, 2019

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  5. First independent claim

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Abstract

Official abstract text for this publication.

In one embodiment, a method for manufacturing an aperture plate includes depositing a releasable seed layer above a substrate, applying a first patterned photolithography mask above the releasable seed layer, the first patterned photolithography mask having a negative pattern to a desired aperture pattern, electroplating a first material above the exposed portions of the releasable seed layer and defined by the first mask, applying a second photolithography mask above the first material, the second photolithography mask having a negative pattern to a first cavity, electroplating a second material above the exposed portions of the first material and defined by the second mask, removing both masks, and etching the releasable seed layer to release the first material and the second material. The first and second material form an aperture plate for use in aerosolizing a liquid. Other aperture plates and methods of producing aperture plates are described according to other embodiments.

First claim

Opening claim text (preview).

What is claimed is: 1. A nebulizer aperture plate for use in aerosolising a liquid in a nebulizer, comprising: a first material having a plurality of first apertures; and a second material above the first material, the second material having a plurality of second apertures above the plurality of first apertures in the first material, wherein the plurality of second apertures define generally cylindrical shapes defining liquid supply cavities; wherein at least one of the first material or the second material includes a characteristic of being formed through a photolithography process; wherein at least some of the plurality of first apertures are within the diameter of the liquid supply cavity defined by one of the second apertures; and wherein the first material and the second material collectively form a dome-shaped aperture plate. 2. The aperture plate of claim 1 , wherein a height of the second material is taller than a height of the first material. 3. The aperture plate of claim 1 , wherein a diameter of the at least some of the plurality of first apertures is within a range of from 0.5 μm to 6 μm, and wherein the liquid supply cavities of the second apertures have a diameter within a range of from 20 μm to 100 μm. 4. The aperture plate of claim 1 , wherein the aperture plate includes two or more concentric cylinders. 5. The aperture plate of claim 1 , further including: a third material above the second material, the third material having a plurality of third apertures above the plurality of second apertures in the second material. 6. The aperture plate of claim 5 , wherein the third material has a characteristic of being formed through a photolithography process. 7. The aperture plate of claim 5 , wherein at least one of the third apertures has a diameter larger than the diameter of the liquid supply cavity defined by the one of the second apertures. 8. The aperture plate of claim 5 , wherein the aperture plate includes three or more concentric cylinders. 9. A nebulizer aperture plate for use in aerosolising a liquid in a nebulizer, comprising: a first material having a plurality of first apertures; and a second material above the first material, the second material having a plurality of second apertures above the plurality of first apertures in the first material, wherein the plurality of second apertures define generally cylindrical shapes defining liquid supply cavities; wherein at least one of the first material or the second material includes a characteristic of being formed through a photolithography process; and wherein the plurality of the first apertures and the plurality of second apertures are arranged in an inverted ziggurat shape. 10. The nebulizer of claim 9 , wherein a height of the second material is taller than a height of the first material. 11. The aperture plate of claim 9 , wherein a diameter of the at least some of the plurality of first apertures is within a range of from 0.5 μm to 6 μm, and wherein the liquid supply cavities of the second apertures each have a diameter within a range of from 20 μm to 100 μm. 12. The aperture plate of claim 9 , wherein each of the first material and the second material comprise one or more of Ni, Co, Pd, Pt, alloys thereof, or mixtures thereof. 13. The aperture plate of claim 9 , further including: a third material above the second material, the third material having a plurality of third apertures above the plurality of second apertures in the second material. 14. The aperture plate of claim 13 , wherein the third material has a characteristic of being formed through a photolithography process. 15. The aperture plate of claim 13 , wherein at least one of the third apertures has a diameter larger than the diameter of the liquid supply cavity defined by the one of the second apertures. 16. A nebulizer aperture plate for use in aerosolising a liquid in a nebulizer, comprising: a first material having a plurality of first apertures; and a second material above the first material, the second material having a plurality of second apertures above the plurality of first apertures in the first material; wherein at least one of the first material or the second material includes a characteristic of being formed through a photolithography process; wherein at least some of the plurality of the first apertures and at least some of the plurality of second apertures are arranged as concentric cylinders; wherein the first material and the second material collectively form a dome-shaped aperture plate. 17. The aperture plate of claim 16 , wherein a height of the second material is taller than a height of the first material. 18. The aperture plate of claim 16 , wherein a diameter of at least some of the plurality of first apertures is within a range of from 0.5 μm to 6 μm, and wherein a diameter of at least some of the plurality of second apertures is within a range of from 20 μm to 100 μm. 19. The aperture plate of claim 16 , further including: a third material above the second material, the third material having a plurality of third apertures above the plurality of second apertures in the second material. 20. The aperture plate of claim 19 , wherein the third material has a characteristic of being formed through a photolithography process.

Assignees

Inventors

Classifications

  • Vibrating plates, i.e. plates being directly subjected to the vibrations, e.g. having a piezoelectric transducer attached thereto · CPC title

  • Manufacturing of the nozzle plates · CPC title

  • wet etching · CPC title

  • electroforming · CPC title

  • using masking means · CPC title

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What does patent US10508353B2 cover?
In one embodiment, a method for manufacturing an aperture plate includes depositing a releasable seed layer above a substrate, applying a first patterned photolithography mask above the releasable seed layer, the first patterned photolithography mask having a negative pattern to a desired aperture pattern, electroplating a first material above the exposed portions of the releasable seed layer a…
Who is the assignee on this patent?
Stamford Devices Ltd
What technology area does this patent fall under?
Primary CPC classification C25D7/00. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Dec 17 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 3 related publications on this page (citations in our corpus or others sharing the same primary CPC).