Multilayer interface coating with thermally-grown oxide for improved durability

US12565454B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12565454-B2
Application numberUS-202217866024-A
CountryUS
Kind codeB2
Filing dateJul 15, 2022
Priority dateJul 15, 2022
Publication dateMar 3, 2026
Grant dateMar 3, 2026

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Abstract

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A coated fiber structure for use in a ceramic matrix composite comprises a fiber and a coating system applied to and circumscribing the fiber. The coating system comprises a first boron nitride layer, a silicon carbide layer extending coaxially with and in direct contact with the first boron nitride layer, a first thermally-grown oxide layer formed on the silicon carbide layer, and a second boron nitride layer extending coaxially with and in direct contact with the first thermally-grown oxide layer.

First claim

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The invention claimed is: 1 . A coated fiber structure for use in a ceramic matrix composite, the coated fiber structure comprising: a fiber comprising silicon carbide; and a coating system applied to and circumscribing the fiber, the coating system comprising: a first thermally-grown oxide layer formed on the fiber, wherein the first thermally-grown oxide layer comprises silica; a first boron nitride layer extending coaxially with and in direct contact with the first thermally-grown oxide layer, wherein the first boron nitride layer comprises an anisotropic region adjacent to the first thermally grown oxide layer; a silicon carbide layer extending coaxially with and in direct contact with the first boron nitride layer; a second thermally-grown oxide layer formed on the silicon carbide layer, wherein the second thermally-grown oxide layer comprises silica; and a second boron nitride layer extending coaxially with and in direct contact with the second thermally-grown oxide layer, wherein the second boron nitride layer comprises an anisotropic region adjacent to the second thermally grown oxide layer. 2 . The coated fiber structure of claim 1 , wherein the second boron nitride layer further comprises an isotropic region on a side of the anisotropic region opposite the second thermally-grown oxide layer. 3 . The coated fiber structure of claim 1 , wherein: the first boron nitride layer has a thickness ranging from 50 nm to 200 nm; the silicon carbide layer has a thickness ranging from 50 nm to 500 nm; the second thermally-grown oxide layer has a thickness ranging from 50 nm to 200 nm; and the second boron nitride layer has a thickness ranging from 50 nm to 200. 4 . The coated fiber structure of claim 3 , wherein the silicon carbide layer has a thickness ranging from 250 nm to 500 nm. 5 . The coated fiber structure of claim 3 , wherein the second first boron nitride layer further comprises an isotropic region on a side of the anisotropic region opposite the first thermally-grown oxide layer. 6 . The coated fiber structure of claim 3 , wherein the first thermally-grown oxide layer has a thickness ranging from 50 nm to 100 nm. 7 . The coated fiber structure of claim 3 and further comprising: a silicon-doped boron nitride layer extending coaxially with and in direct contact with the second boron nitride layer, the silicon-doped boron nitride layer having a thickness ranging from 50 nm to 200 nm. 8 . A ceramic matrix composite comprising: a plurality of the coated fiber structures of claim 1 ; and a silicon carbide matrix formed upon the second boron nitride layer of the plurality of the coated fiber structures. 9 . A method of forming a ceramic matrix composite, the method comprising: forming a fibrous preform by: arranging a plurality of ceramic fibers; forming a first thermally-grown oxide layer on the plurality of ceramic fibers; depositing a first boron nitride layer on the first thermally-grown oxide layer, wherein the first boron nitride layer extends coaxially and is in direct contact with the first thermally-grown oxide layer; depositing a silicon carbide layer on the first boron nitride layer; forming a second thermally-grown oxide layer on the silicon carbide layer, wherein the second thermally-grown oxide layer comprises silica; and depositing a second boron nitride layer on the second thermally-grown oxide layer, wherein the second boron nitride layer extends coaxially and is in direct contact with the second thermally-grown oxide layer; and depositing a silicon carbide matrix on the fibrous preform. 10 . The method of claim 9 , wherein the second boron nitride layer comprises: an anisotropic region adjacent the second thermally-grown oxide layer; and an isotropic region on a side of the anisotropic region opposite the second thermally-grown oxide layer. 11 . The method of claim 9 , wherein the first boron nitride layer comprises: an anisotropic region adjacent the first thermally-grown oxide layer; and an isotropic region on a side of the anisotropic region opposite the first thermally-grown oxide layer. 12 . The method of claim 11 , wherein forming the first thermally-grown oxide layer and the second thermally-grown oxide layer comprises heating the preform to a temperature ranging from 800° C. to 1200° C. for a period ranging from one hour to 24 hours. 13 . The method of claim 9 , wherein the step of depositing each of the first boron nitride layer, the silicon carbide layer, and the second boron nitride layer comprises chemical vapor infiltration. 14 . The method of claim 9 and further comprising: prior to depositing the silicon carbide matrix, depositing a silicon-doped boron nitride layer on the second boron nitride layer. 15 . The method of claim 14 , wherein the step of depositing the silicon-doped boron nitride layer comprises chemical vapor infiltration. 16 . The method of claim 9 , wherein the step of depositing the silicon carbide matrix comprises at least one of chemical vapor infiltration, slurry infiltration, melt infiltration, and polymer infiltration and pyrolysis.

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What does patent US12565454B2 cover?
A coated fiber structure for use in a ceramic matrix composite comprises a fiber and a coating system applied to and circumscribing the fiber. The coating system comprises a first boron nitride layer, a silicon carbide layer extending coaxially with and in direct contact with the first boron nitride layer, a first thermally-grown oxide layer formed on the silicon carbide layer, and a second bor…
Who is the assignee on this patent?
Raytheon Tech Corp, Rtx Corp
What technology area does this patent fall under?
Primary CPC classification C04B35/62849. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Mar 03 2026 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).