Thin film optics

US12560751B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12560751-B2
Application numberUS-202318197007-A
CountryUS
Kind codeB2
Filing dateMay 12, 2023
Priority dateJun 11, 2018
Publication dateFeb 24, 2026
Grant dateFeb 24, 2026

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A method of manufacturing a thin film optical apparatus includes providing a substrate and applying an alignment layer over the substrate. The alignment layer ranges from about 50 to 100 nm in thickness. The method includes imprinting a hologram with a desired optic pattern onto the alignment layer and applying at least one layer of mesogen material over the alignment layer.

First claim

Opening claim text (preview).

What is claimed is: 1 . An optical apparatus, comprising: a substrate comprising a first thickness; a first alignment layer positioned over the substrate, the first alignment layer comprising a second thickness less than the first thickness; a hologram integrated into the first alignment layer, the hologram comprising an optical pattern; at least one layer of mesogen material applied over the first alignment layer; a layer of reflective material positioned between the first alignment layer and the substrate; a first birefringent layer positioned over the first alignment layer, the first birefringent layer comprising a third thickness less than the first thickness and greater than the second thickness; a second alignment layer positioned over the first birefringent layer; and a second birefringent layer positioned over the second alignment layer. 2 . The optical apparatus of claim 1 , wherein the layer of reflective material comprises a dielectric material. 3 . The optical apparatus of claim 2 , further comprising a retarder between the first alignment layer and the reflective material. 4 . The optical apparatus of claim 1 , further comprising a buffer layer between the first birefringent layer and the second alignment layer. 5 . The optical apparatus of claim 1 , wherein the optical pattern comprises a polarization interference pattern. 6 . The optical apparatus of claim 1 , wherein the at least one layer of mesogen is configured to provide a retardance. 7 . An optical apparatus, comprising: a substrate; a first alignment layer positioned over the substrate; a quarter wave retarder positioned between the substrate and the first alignment layer, wherein in response to a light beam passing through the quarter wave retarder in a first direction, the quarter wave retarder is configured to alter a polarization state of the light beam passing through the quarter wave retarder in a second direction different from the first direction; a reflective layer positioned between and in contact with the quarter wave retarder and the substrate; a second alignment layer; and a first buffer layer positioned between and in contact with the first alignment layer and the second alignment layer, wherein in response to a light beam passing through the quarter wave retarder, the first alignment layer, the second alignment layer, and the first buffer layer: the first alignment layer, the first buffer layer, and the second alignment layer combine to form an achromatic lens for a first polarization state, and the quarter wave retarder is configured to change the first polarization state to a second polarization state. 8 . The optical apparatus of claim 7 , further comprising a first birefringent layer positioned between the first alignment layer and the second alignment layer. 9 . The optical apparatus of claim 8 , further comprising a second birefringent layer positioned over the second alignment layer. 10 . The optical apparatus of claim 8 , wherein: the substrate comprises a first thickness, the first alignment layer comprising a second thickness less than the first thickness, and the first birefringent layer comprising a third thickness less than the first thickness and greater than the second thickness. 11 . The optical apparatus of claim 1 , further comprising a quarter wave retarder, wherein the layer of reflective material is in contact with the substrate and the quarter wave retarder.

Assignees

Inventors

Classifications

  • Phase only modulation (G03H1/0244 takes precedence) · CPC title

  • Scanning light beam · CPC title

  • Polarised light · CPC title

  • for recording Holographic Optical Element [HOE] · CPC title

  • Recording geometries or arrangements (G03H1/0443, G03H1/0476, G03H1/16 take precedence) · CPC title

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Frequently asked questions

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What does patent US12560751B2 cover?
A method of manufacturing a thin film optical apparatus includes providing a substrate and applying an alignment layer over the substrate. The alignment layer ranges from about 50 to 100 nm in thickness. The method includes imprinting a hologram with a desired optic pattern onto the alignment layer and applying at least one layer of mesogen material over the alignment layer.
Who is the assignee on this patent?
Lockheed Corp
What technology area does this patent fall under?
Primary CPC classification G02B5/3016. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Feb 24 2026 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 5 related publications on this page (citations in our corpus or others sharing the same primary CPC).