Plenum driven hydroxyl combustion oxidation

Patent metadata

Field	Value
Publication number	US-12559841-B2
Application number	US-202318139103-A
Country	US
Kind code	B2
Filing date	Apr 25, 2023
Priority date	Apr 25, 2023
Publication date	Feb 24, 2026
Grant date	Feb 24, 2026

Abstract

A method and processing chamber for plenum driven hydroxyl combustion oxidation. A mixture is produced in a plenum. The mixture includes a first reactive gas injected from a first inlet and a second reactive gas injected from a second inlet. The mixture is injected towards a substrate of a processing chamber at a jet gas velocity greater than a flame gas velocity. A radical is produced as a function of the first gas and the second gas while heating the chamber.

First claim

What is claimed is:

1 . A process chamber, comprising:
a first side, a second side, and a third side, wherein the first side, the second side, and the third side are different; a substrate support disposed within the process chamber; a first plenum located on the first side, wherein the first plenum is a first enclosed structure, comprising:
a first inlet configured to allow a first gas into the plenum;
a second inlet configured to allow a second gas into the plenum, wherein the first inlet and the second inlet are different, and wherein the first gas and the second gas are different; and
a plurality of outlets facing the substrate support and configured to provide a mixture of the first gas and the second gas toward the substrate support at a jet gas velocity greater than a flame gas velocity;
a second plenum located on the second side, wherein the second plenum is a second enclosed structure having a plurality of gas inlets on one or more first walls of the second enclosed structure, and wherein the second plenum has a plurality of gas outlets on one or more second walls of the second enclosed structure facing the substrate support; and a third plenum located on the third side.

2 . The chamber of claim 1 , wherein the first gas is a reactive gas comprising H 2 or O 2 .

3 . The chamber of claim 2 , wherein the second gas is a reactive gas comprising H 2 or O 2 .

4 . The chamber of claim 1 , wherein the plurality of outlets comprises about 3 orifices to about 20 orifices.

5 . The chamber of claim 1 , wherein:
a first inlet of the plurality of gas inlets of the second plenum is configured to allow a third gas into the second plenum; a second inlet of the plurality of gas inlets of the second plenum is configured to allow a fourth gas into the second plenum; and the plurality of gas outlets of the second plenum are configured to provide a mixture of the third gas and the fourth gas toward the substrate support at a jet gas velocity greater than a flame gas velocity.

6 . The chamber of claim 5 , wherein the second plenum further comprises a third inlet configured to allow an eighth gas into the second plenum, wherein the third inlet is separate from the first inlet and the second inlet.

7 . The chamber of claim 6 , wherein the eighth gas is different than the third gas and the fourth gas.

8 . The chamber of claim 5 , wherein the third plenum is a third enclosed structure and further comprises:
a first inlet configured to allow a fifth gas into the third plenum; a second inlet configured to allow a sixth gas into the third plenum; and a plurality of outlets facing the substrate support and configured to provide a mixture of the fifth gas and the sixth gas toward the substrate support at a jet gas velocity greater than a flame gas velocity.

9 . The chamber of claim 8 , wherein the third plenum further comprises a third inlet configured to allow a ninth gas into the third plenum, wherein the third inlet is separate from the first inlet and the second inlet.

10 . The chamber of claim 9 , wherein the ninth gas is different than the fifth gas and the sixth gas.

11 . The chamber of claim 1 , wherein the first plenum further comprises a third inlet configured to allow a seventh gas into the first plenum, wherein the third inlet is separate from the first inlet and the second inlet.

12 . The chamber of claim 11 , wherein the seventh gas is different than the first gas and the second gas.

Assignees

• Applied Materials Inc

Inventors

• Olsen Christopher S
• Helmy Sameh
• Lo Hansel
• Shono Eric Kihara

Classifications

• H10P14/6529

  by exposure to a gas or vapour · CPC title

• H10P14/6522

  introduced into a nitride material, e.g. changing SiN to SiON · CPC title

• H10P72/0402

  Apparatus for fluid treatment (H10P72/0441, H10P72/0448 take precedence) · CPC title

• H10P72/0436 Primary

  mainly by radiation · CPC title

• C23C16/45517

  Confinement of gases to vicinity of substrate · CPC title