Substrate processing apparatus and substrate processing method

Patent metadata

Field	Value
Publication number	US-12550658-B2
Application number	US-202418406880-A
Country	US
Kind code	B2
Filing date	Jan 8, 2024
Priority date	Jan 11, 2023
Publication date	Feb 10, 2026
Grant date	Feb 10, 2026

Abstract

Provided is an apparatus for processing a substrate, the apparatus including: a liquid treatment chamber; a drying chamber; and a light treatment chamber, in which the light treatment chamber includes: a treatment housing having a treatment space in which the substrate is processed; a support member for supporting the substrate in the treatment space; a light source for irradiating the substrate supported on the support member with light in the form of pulses; and a light filter for selecting a set range of wavelengths of the light generated by the light source and allowing the selected wavelengths to pass through.

First claim

What is claimed is:

1 . An apparatus for processing a substrate, the apparatus comprising:
a liquid treatment chamber configured to liquid-treat a substrate by supplying a treatment liquid to the substrate; a drying chamber configured to dry treat the substrate treated in the liquid treatment chamber; and a light treatment chamber configured to irradiate the substrate treated in the drying chamber with light to remove an organic matter residual on the substrate, wherein the light treatment chamber includes: a treatment housing having a treatment space in which the substrate is processed; a support member for supporting the substrate in the treatment space; a light source configured to irradiate the substrate supported on the support member with light in pulses, the light source configured to generate wavelengths of light in a range of 300 nm to 1,000 nm; and a light filter for selecting a set range of selected wavelengths of the light generated by the light source and allowing the selected wavelengths to pass through, wherein the light filter is configured to filter wavelengths of light other than the selected wavelengths of light generated by the light source and the selected wavelengths are 350 nm to 700 nm.

2 . The apparatus of claim 1 , wherein the light filter has a tube shape surrounding the light source.

3 . The apparatus of claim 2 , wherein the light filter is formed from a material including quartz, and a film that filters wavelengths other than the selected wavelengths is attached to a surface of the light filter, or a coating layer is formed on the surface of the light filter.

4 . The apparatus of claim 1 , wherein the light treatment chamber includes: a light source housing that defines a space in which the light source is placed, and
the light filter is disposed between the light source housing and the treatment housing, and
the light filter has a plate shape to compartmentalize the treatment space of the treatment housing and the space of the light source housing from each other, and a film that filters the wavelengths other than the selected wavelengths is attached to a surface of the light filter or a coating layer is formed on the surface of the light filter.

5 . The apparatus of claim 1 , wherein the light source is a xenon flash lamp.

6 . The apparatus of claim 1 , further comprising:
a light source controller for controlling an operation of the light source, wherein the light source controller is configured to control at least one of an output of the light generated by the light source, a duty ratio in a unit pulse of light, and a period of the unit pulse of light.

7 . The apparatus of claim 6 , wherein the light source controller controls the light source such that an output of the unit pulse of the light generated by the light source in an on state or a high state is constant during light treatment of the substrate supported on the support member.

8 . The apparatus of claim 6 , wherein the light source controller controls the light source such that an output of the unit pulse of the light generated by the light source in an on state or a high state becomes gradually smaller during light treatment of the substrate supported on the support member.

9 . The apparatus of claim 6 , wherein the light source controller controls the light source such that the duty ratio of the unit pulse of the light generated by the light source varies during light treatment of the substrate supported on the support member.

10 . The apparatus of claim 9 , wherein the light source controller controls the light source such that the duty ratio of the unit pulse of the light generated by the light source becomes gradually smaller during light treatment of the substrate supported on the support member.

11 . An apparatus for processing a substrate, the apparatus comprising:
a liquid treatment chamber for liquid-treating a substrate by supplying an organic solvent to the substrate; a drying chamber for drying the substrate by supplying a supercritical fluid to the substrate treated in the liquid treatment chamber; and a light treatment chamber for irradiating the substrate treated in the drying chamber with light to remove an organic matter residual on the substrate, wherein the light treatment chamber includes: a treatment housing having a treatment space in which the substrate is processed; a support member for supporting the substrate in the treatment space; and a light irradiation unit located on an upper side of the treatment housing and for irradiating the substrate supported on the support member with light, and the light irradiation unit includes: a xenon flash lamp for irradiating the substrate supported on the support member with light in pulses, in which the xenon flash lamp is configured to generate light having wavelengths in a range of 300 to 1000 nm; a light source housing providing a space in which the xenon flash lamp is installed; a light filter configured to select wavelengths in the visible light range in the wavelengths of the light generated by the xenon flash lamp and allows the selected wavelengths to pass through, the light filter is configured to filter wavelengths of light other than the selected wavelengths of light generated by the light source and the selected wavelengths of light are 350 nm to 700 nm; a reflective member installed on a top side of the xenon flash lamp, and for reflecting light generated by the xenon flash lamp toward the substrate; a middle plate disposed between the light source housing and the treatment housing, and having a middle plate refrigerant flow path formed therein; and a refrigerant supply unit for supplying a refrigerant, and the refrigerant supply unit includes: a refrigerant supply source for supplying the refrigerant; a first supply line for supplying the refrigerant from the refrigerant supply source to a reflective member refrigerant flow path formed in the reflective member; and a first delivery line for delivering the refrigerant from the reflective member refrigerant flow path to the middle plate refrigerant flow path.

12 . An apparatus for processing a substrate, the apparatus comprising:
a liquid treatment chamber for liquid-treating a substrate by supplying an organic solvent to the substrate; a drying chamber for drying the substrate by supplying a supercritical fluid to the substrate treated in the liquid treatment chamber; and a light treatment chamber for irradiating the substrate treated in the drying chamber with light to remove an organic matter residual on the substrate, wherein the light treatment chamber includes: a treatment housing having a treatment space in which the substrate is processed; a support member for supporting the substrate in the treatment space; and a light irradiation unit located on an upper side of the treatment housing and for irradiating the substrate supported on the support member with light, and the light irradiation unit includes: a xenon flash lamp for irradiating the substrate supported on the support member with light in pulses, in which the xenon flash lamp is configured to generate light having wavelengths in a range of 300 to 1000 nm; a light source housing providing a space in which the xenon flash lamp is installed; a light filter configured to select wavelengths in the visible light range in the wavelengths of the light generated by the xenon flash lamp and allows the selected wavelengths to pass through; a reflective member installed on a top side of the xenon flash lamp, and for reflecting light generated by the xenon flash lamp toward the substrate; a middle plate disposed between the l

Assignees

• Semes Co Ltd

Inventors

• Yoon Do Hyeon
• Kim Eun Seok
• Park Mi So

Classifications

• H10P72/0456

  in-line arrangement · CPC title

• H10P72/0436

  mainly by radiation · CPC title

• H10P70/20

  Cleaning during device manufacture · CPC title

• H10P72/0406 Primary

  for cleaning followed by drying, rinsing, stripping, blasting or the like · CPC title

• B08B7/0035

  by radiant energy, e.g. UV, laser, light beam or the like · CPC title