Process chamber volume adjustment

Patent metadata

Field	Value
Publication number	US-12546008-B2
Application number	US-202318395006-A
Country	US
Kind code	B2
Filing date	Dec 22, 2023
Priority date	Dec 28, 2022
Publication date	Feb 10, 2026
Grant date	Feb 10, 2026

Abstract

Methods and apparatuses for adjusting a process chamber volume are described. For example, a process chamber, after removing at least a component used to perform a function associated with the process chamber, may be installed with a fixture to adjust a volume of the process chamber. The process chamber with the fixture may reduce the amount of precursor gases and processing time for coating a workpiece. The workpiece, after the coating, may be placed in another process chamber to perform a function associated with the other process chamber.

First claim

What is claimed is:

1 . A method comprising:
removing, from a process chamber comprising internal walls and at least one component, wherein the internal walls define a first volume, the at least one component; installing, in the process chamber, a fixture, wherein the fixture and at least some of the internal walls define a second volume, wherein the second volume is smaller than the first volume; inserting, into the process chamber with the second volume, a workpiece; flowing, across the workpiece, a precursor gas; coating, based on the precursor gas flowing across the workpiece, the workpiece as a coated workpiece; and removing, based on the coating, the coated workpiece from the process chamber with the second volume.

2 . The method of claim 1 , further comprising:
installing, in a second process chamber for processing semiconductor substrates, the coated workpiece; and performing at least one semiconductor processing step on the semiconductor substrates, wherein the coated workpiece, installed in the second process chamber, is configured to perform a function associated with the at least one semiconductor processing step.

3 . The method of claim 1 , wherein the removing the at least one component comprises removing, from the process chamber, at least one of:
a substrate support and a shaft, or a lift pin configured to lift the substrate support.

4 . The method of claim 1 , wherein the coating comprises coating, in the process chamber with the second volume:
a heater, a showerhead, a pneumatic valve manifold (PVM), or a gas channel plate (GCP).

5 . The method of claim 1 ,
wherein the inserting comprises seating the workpiece in the process chamber with the second volume, wherein at least a part of the workpiece is processed in the second volume, and wherein the flowing comprises flowing the precursor gas through the process chamber with the second volume, bounded by the fixture and the at least some of the internal walls.

6 . The method of claim 1 , wherein the installing comprises sealing the fixture to restrict the precursor gas from flowing into a portion of the first volume not contained in the second volume.

7 . The method of claim 1 ,
wherein the process chamber comprises an inside wall having a first circumference and a gate valve, in the inside wall, configured to permit passage of an object, and wherein the installing the fixture comprises:
seating, in the process chamber, a first annulus of the fixture, wherein the first annulus, with a second circumference extends along the inside wall, wherein the gate valve is blocked by the first annulus;
installing, onto the first annulus, a bottom plate; and
seating, in the first annulus and above the bottom plate, a second annulus.

8 . The method of claim 1 ,
wherein the process chamber comprises an inside wall having a first circumference and a gate valve, in the inside wall, configured to permit passage of an object, wherein the fixture comprises an annulus having a second circumference, a center, at least one tab, at least one rivet attaching the at least one tab to the annulus, and a bottom plate, wherein a location of the at least one tab is based on dimensions of the workpiece, and wherein the installing the fixture comprises:
seating, in the process chamber, the annulus, wherein the annulus extends along the inside wall; and
seating the bottom plate of the fixture on the at least one tab, fixed to the annulus, by pressing the bottom plate downward against the at least one tab, wherein the at least one tab passes through at least a corresponding hole of the bottom plate.

9 . The method of claim 8 ,
wherein the seating the bottom plate comprises seating the bottom plate on the at least one tab, each tab comprising metal and comprising at least four segments, and wherein the at least four segments comprise:
a first segment configured to be fastened, by a rivet, to the inside wall of the annulus;
a second segment angled relative to the first segment and extending inwardly to the center of the annulus;
a third segment angled relative to the second segment and extending inwardly toward the center of the annulus; and
a fourth segment angled relative to the third segment and extending outwardly away from the center of the annulus, wherein a length of the fourth segment is more than twice of a length of the third segment.

10 . The method of claim 8 ,
wherein the seating the bottom plate comprises seating the bottom plate on at least two different types of tabs, wherein a first type tab of the at least two different types of tabs is configured to fasten, by a first mechanism, the bottom plate to the first type tab, wherein a second type tab of the at least two different types of tabs is configured to fasten, by a second mechanism, the bottom plate to the second type tab, and wherein removal of the bottom plate, fastened by the second mechanism, from the second type tab is easier than removal of the bottom plate, fastened by the first mechanism, from the first type tab.

11 . A method comprising:
removing, from a process chamber comprising internal walls and at least one component, wherein the internal walls define a first volume, the at least one component; installing, in the process chamber, a fixture, wherein the fixture and at least some of the internal walls divide the first volume into a plurality of second volumes, wherein one of the plurality of second volumes is smaller than a sum of remaining ones of the plurality of second volumes; performing a coating process using the one of the plurality of second volumes; and removing a product of the coating process from the process chamber.

12 . The method of claim 11 , further comprising installing the product of the coating process in another process chamber configured to operate with the product.

13 . The method of claim 11 ,
wherein the product comprises a heater plate and a heater stem configured to support the heater plate, wherein a tabbed annulus of the fixture, surrounded by an inside wall of the process chamber, extends circumferentially around the heater stem, wherein a flanged annulus of the fixture, partially surrounded by an inside wall of the tabbed annulus, extends circumferentially around a part of the heater stem and a part of the heater plate, and wherein the installing the fixture comprises:
seating the tabbed annulus in the process chamber;
seating a bottom plate of the fixture on at least one tab extending radially inward from the tabbed annulus, wherein a center aperture of the bottom plate is registered with the heater stem; and
seating the flanged annulus in the tabbed annulus.

14 . The method of claim 13 , wherein the performing the coating process comprises:
flowing at least a coating precursor gas into the one of the plurality of second volumes; and coating, based on the at least the coating precursor gas, the heater plate and at least a part of the heater stem.

15 . The method of claim 13 ,
wherein the at least one tab is configured to clip into a hole of the bottom plate, wherein the seating the bottom plate comprises fastening the bottom plate to four tabs, and wherein each of the four tabs through a corresponding hole of the bottom plate, the fastening being easier than unfastening the bottom plate from the four tabs.

16 . The method of claim 13 , wherein the seating the bottom plate comprises adjusting, based on a length of the heater stem of the product, positions of the at least one tab.

Assignees

• Asm Ip Holding Bv

Inventors

• Falcone Christopher
• Nandwana Dinkar
• Fondurulia Kyle
• Shakti Vishnu

Classifications

• H10P72/0441

  Apparatus for sealing, encapsulating, glassing, decapsulating or the like · CPC title

• H10P72/0431

  Apparatus for thermal treatment · CPC title

• H10P72/0402 Primary

  Apparatus for fluid treatment (H10P72/0441, H10P72/0448 take precedence) · CPC title

• H10P72/0462 Primary

  characterised by the construction of the processing chambers, e.g. modular processing chambers · CPC title

• C23C16/45565

  Shower nozzles · CPC title