Freestanding ceramic seal for a gas turbine
US-2020165713-A1 · May 28, 2020 · US
Freestanding ceramic tile manufacture
US12545986B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-12545986-B2 |
| Application number | US-202318509828-A |
| Country | US |
| Kind code | B2 |
| Filing date | Nov 15, 2023 |
| Priority date | Dec 1, 2022 |
| Publication date | Feb 10, 2026 |
| Grant date | Feb 10, 2026 |
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- Title
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Abstract
Official abstract text for this publication.
A method of producing a freestanding ceramic tile. The method involves: grit-blasting a substrate using a grit size in the range from 36 to 220 mesh; depositing a release layer of carbon or graphite from 2 to 10 microns thick on the grit-blasted surface of the substrate; applying ceramic over the release layer until a desired thickness of ceramic is achieved to form a ceramic layer; heating the substrate, release layer, and ceramic layer to a temperature of from 800 to 1000 degrees Celsius; keeping the substrate, release layer, and ceramic layer at a temperature from 800 to 1000 degrees Celsius for a time from 10 to 20 minutes to remove the release layer; and cooling the substrate and ceramic layer at a rate of at least 200 degrees Celsius per minute, such that the ceramic layer separates from the substrate to produce a freestanding ceramic tile.
First claim
Opening claim text (preview).
We claim: 1 . A method of producing a freestanding ceramic tile, the method comprising the steps of: grit-blasting a substrate using a grit size in the range from 36 mesh to 220 mesh; depositing a release layer on the grit-blasted surface of the substrate, wherein the release layer is a layer of carbon or a layer of graphite, the release layer being from 2 to 10 microns thick; applying ceramic over the release layer until a desired thickness of ceramic is achieved to form a ceramic layer; heating the substrate, release layer, and ceramic layer to a temperature of from 800 to 1000 degrees Celsius; keeping the substrate, release layer, and ceramic layer at a temperature from 800 to 1000 degrees Celsius for a time from 10 to 20 minutes to remove the release layer; and cooling the substrate and ceramic layer via quenching at a rate of at least 200 degrees Celsius per minute, such that the ceramic layer separates from the substrate to produce a freestanding ceramic tile. 2 . The method of claim 1 , wherein the substrate comprises at least one selected from the list of nickel and stainless steel. 3 . The method of claim 1 , wherein the grit comprises one or more of alumina, metal shot, sand, or solid CO 2 . 4 . The method of claim 1 , wherein the release layer is applied using vacuum sputtering or physical abrasion. 5 . The method of claim 1 , wherein the ceramic is applied over the release layer by plasma spray. 6 . The method of claim 1 , wherein the thickness of the ceramic layer is 1.5 mm or more. 7 . The method of claim 1 , wherein the substrate is heated using an air furnace. 8 . The method of claim 1 , wherein the substrate is quenched using at least one selected from the list of air, and water.
Assignees
Inventors
Classifications
Pretreatment of the material to be coated, e.g. for coating on selected surface areas · CPC title
Plasma spraying · CPC title
Setting, e.g. drying, dehydrating or firing ceramic articles (B28B11/242 takes precedence) · CPC title
Treating surfaces of moulds, cores, or mandrels to prevent sticking · CPC title
Sputtering · CPC title
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- What does patent US12545986B2 cover?
- A method of producing a freestanding ceramic tile. The method involves: grit-blasting a substrate using a grit size in the range from 36 to 220 mesh; depositing a release layer of carbon or graphite from 2 to 10 microns thick on the grit-blasted surface of the substrate; applying ceramic over the release layer until a desired thickness of ceramic is achieved to form a ceramic layer; heating the…
- Who is the assignee on this patent?
- Rolls Royce Plc
- What technology area does this patent fall under?
- Primary CPC classification C23C4/185. Mapped technology areas include Chemistry & Metallurgy.
- When was this patent published?
- Publication date Tue Feb 10 2026 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 3 related publications on this page (citations in our corpus or others sharing the same primary CPC).