Polyamide-imide block copolymers, preparation method thereof and polyamide-imide film comprising the same

US12522729B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12522729-B2
Application numberUS-202017432886-A
CountryUS
Kind codeB2
Filing dateApr 9, 2020
Priority dateApr 9, 2019
Publication dateJan 13, 2026
Grant dateJan 13, 2026

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

The polyamide-imide block copolymer according to the present invention makes it possible to provide a polyamide-imide film having excellent thermal stability and chemical resistance and, at the same time, having excellent mechanical properties.

First claim

Opening claim text (preview).

What is claimed is: 1 . A polyamide-imide block copolymer comprising: a first repeat unit represented by the following Chemical Formula 1, a second repeat unit represented by the following Chemical Formula 2 and a third repeat unit represented by the following Chemical Formula 3: wherein, in the Chemical Formulae 1 to 3, each A is the same as or different from each other in each repeat unit, and is a substituted or unsubstituted tetravalent organic group, E 1 , E 2 , E 3 , E 4 , E 5 , E 6 and E 7 are the same as or different from each other in each repeat unit, and are a single bond or —NH—, each Z 1 is the same as or different from each other in each repeat unit, and is a trivalent organic group derived from at least one compound selected from the group consisting of triacyl halide, triamine and tricarboxylic acid, each Z 2 is the same as or different from each other in each repeat unit, and is a divalent organic group derived from at least one compound selected from the group consisting of diacyl halide, diamine and dicarboxylic acid, and Y 1 , Y 2 , and Y 3 are the same as or different from each other in each repeat unit, and each independently, a divalent aromatic organic group having 6 to 30 carbon atoms, wherein the divalent aromatic organic group exists alone; or two or more aromatic organic groups are bonded to each other to form a divalent condensed ring; or two or more aromatic organic groups are linked by a single bond, a fluorenylene group, —O—, —S—, —C(═O)—, —CH(OH)—, —S(═O) 2 —, —Si(CH 3 ) 2 —, —(CH 2 ) p , where 1≤p≤10, —(CF 2 ) q , where 1≤q≤10, —C(CH 3 ) 2 —, —C(CF 3 ) 2 —, or —C(═O)NH—, with the proviso that at least one of Y 1 , Y 2 and Y 3 is substituted with one or more photocurable functional groups selected from the group consisting of a (meth)acrylate group and a functional group represented by the following Chemical Formula 4, each R 1 is the same as or different from each other in each repeat unit, and is hydrogen or an alkyl group having 1 to 10 carbon atoms, and each L is the same as or different from each other in each repeat unit, and is a single bond or an alkylene having 1 to 10 carbon atoms, wherein the sum of the repeat units in which Y 1 , Y 2 and Y 3 are substituted with the photocurable functional group is 20 mol % to 50 mol % based on 100 moles of the total repeat units, and wherein a weight average molecular weight is 5,000 to 300,000 g/mol. 2 . The polyamide-imide block copolymer according to claim 1 , wherein each of the Y 1 , Y 2 and Y 3 is a group represented by the following Chemical Formula Y-1 or Y-2: wherein, in the Chemical Formula Y-1 and Chemical Formula Y-2, R 3 are each independently a (meth)acrylate group or a functional group represented by the following Chemical Formula 4, each R 1 is the same as or different from each other in each repeat unit, and is hydrogen or an alkyl group having 1 to 10 carbon atoms, each L is the same as or different from each other in each repeat unit, and is a single bond or an alkylene having 1 to 10 carbon atoms, n3, n4 and n5 are each independently 0 to 4, with the proviso that at least one of n3, n4 and n5 is 1 or more, and each R 4 is independently a single bond, —O—, —S—, —C(═O)—, —CH(OH)—, —S(═O) 2 —, —Si(CH 3 ) 2 —, —(CH 2 ) p , where 1≤p≤10, —(CF 2 ) q , where 1≤q≤10), —C(CH 3 ) 2 —, —C(CF 3 ) 2 —, or —C(═O)NH—. 3 . The polyamide-imide block copolymer according to claim 1 , wherein A is any one selected from groups represented by the following: 4 . The polyamide-imide block copolymer according to claim 1 , wherein the Z 1 is any one selected from groups represented by the following: 5 . The polyamide-imide block copolymer according to claim 1 , wherein the Z 2 is any one selected from groups represented by the following: 6 . The polyamide-imide block copolymer according to claim 1 , wherein the first repeat unit includes a repeat unit represented by Chemical Formula 1-1: wherein, in the Chemical Formula 1-1, Y 1 is as defined in claim 1 . 7 . The polyamide-imide block copolymer according to claim 1 , wherein the second repeat unit includes a repeat unit represented by Chemical Formula 2-1: wherein, in the Chemical Formula 2-1, Y 2 is as defined in claim 1 . 8 . The polyamide-imide block copolymer according to claim 1 , wherein the third repeat unit includes a repeat unit represented by Chemical Formula 3-1: wherein, in the Chemical Formula 3-1, Y 3 is as defined in claim 1 . 9 . The polyamide-imide block copolymer according to claim 1 , wherein a molar ratio of the sum of the second repeat unit and the third repeat unit is 10:90 to 90:10 relative to the first repeat unit. 10 . A polyamide-imide film comprising the polyamide-imide block copolymer according to claim 1 . 11 . The polyamide-imide film according to claim 10 , wherein a yellowness index (Y.I.) according to ASTM D1925 is 1.5 to 1.75. 12 . The polyamide-imide film according to claim 10 , wherein a modulus according to ASTM D648 is 4.0 GPa to 5.0 GPa.

Assignees

Inventors

Classifications

  • used for films · CPC title

  • Stabilised against heat, light or radiation or oxydation · CPC title

  • C08G73/14Primary

    Polyamide-imides · CPC title

  • the unsaturated precursors containing oxygen in the form of ether bonds in the main chain · CPC title

  • Wholly aromatic polyimides, i.e. having both tetracarboxylic and diamino moieties aromatically bound · CPC title

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What does patent US12522729B2 cover?
The polyamide-imide block copolymer according to the present invention makes it possible to provide a polyamide-imide film having excellent thermal stability and chemical resistance and, at the same time, having excellent mechanical properties.
Who is the assignee on this patent?
Lg Chemical Ltd
What technology area does this patent fall under?
Primary CPC classification C08G73/14. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Jan 13 2026 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 7 related publications on this page (citations in our corpus or others sharing the same primary CPC).