Substrate thinning process using temporary bond with low thickness variation

US12507593B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12507593-B2
Application numberUS-202117515630-A
CountryUS
Kind codeB2
Filing dateNov 1, 2021
Priority dateNov 3, 2020
Publication dateDec 23, 2025
Grant dateDec 23, 2025

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

An article including a support unit, the support unit including a support substrate and a bonding layer such that the bonding layer is bonded to a surface of the support substrate. Furthermore, a total thickness variation TTV across a width of the support unit is about 2.0 microns or less.

First claim

Opening claim text (preview).

What is claimed is: 1 . An article comprising: a support unit comprising: a support substrate comprised of glass, glass ceramic, ceramic, or silicon and having a surface; and a bonding layer directly bonded to the surface of the support substrate, wherein a total thickness variation TTV across an entire width of the bonding layer is about 3.0 microns or less and a total thickness variation TTV across an entire width of the support unit is about 2.0 microns or less. 2 . The article of claim 1 , wherein the total thickness variation TTV across the width of the support unit is about 1.0 microns or less. 3 . The article of claim 2 , wherein the total thickness variation TTV across the width of the support unit is about 0.2 microns or less. 4 . The article of claim 1 , wherein: a total thickness variation TTV across a width of the support substrate is about 1.0 micron or less, and a total thickness variation TTV across a width of the bonding layer is about 1.0 micron or less. 5 . The article of claim 1 , wherein the support substrate has a surface roughness of about 1.0 nm or less. 6 . The article of claim 1 , further comprising a first substrate, the bonding layer coupling the support substrate with the first substrate. 7 . The article of claim 6 , wherein the first substrate comprises lithium tantalate (LiTaO 3 ), lithium niobate (LiNbO 3 ), aluminum nitride (AlN), lead zirconate titanate (PZT) (Pb[Zr x Ti 1-x ]O 3 (0≤x≤1), or a combination thereof. 8 . The article of claim 6 , wherein the first substrate has a thickness of about 2.0 microns or less. 9 . The article of claim 1 , wherein the bonding layer has a thickness of about 100 nm or less. 10 . The article of claim 9 , wherein the thickness of the bonding layer is about 20 nm or less. 11 . The article of claim 1 , wherein the bonding layer comprises one or more surfactants, one or more polymers, one or more organic salts, one or more inorganic materials, or combinations thereof. 12 . The article of claim 11 , wherein the bonding layer consists of alternating layers of first and second layers, the first layer being a monolayer of a cationic polymer and the second layer being a monolayer of an anionic polymer. 13 . The article of claim 12 , wherein one of the first layers is directly attached to the support substrate. 14 . The article of claim 13 , wherein the bonding layer comprises a cationic surfactant with a head group comprising a charged nitrogen selected from a group consisting of primary, secondary, tertiary, or quaternary ammonium, pyridinium, and combinations thereof. 15 . The article of claim 1 , wherein a thickness of the support substrate is in a range from about 0.3 mm to about 1.0 mm. 16 . An article comprising: a support unit comprising: a support substrate comprised of glass, glass ceramic, ceramic, or silicon and having a surface; and a bonding layer directly bonded to the surface of the support substrate, wherein a total thickness variation TTV across an entire width of the bonding layer is about 3.0 microns or less and a total thickness variation TTV across a width of the support unit is about 2.0 microns or less; a first substrate, the bonding layer coupling the support substrate with the first substrate; and a device support wafer removably coupled with the support substrate.

Assignees

Inventors

Classifications

  • Intermediate layers, e.g. barrier, adhesion or growth control buffer layers · CPC title

  • Alkali metal based oxides, e.g. lithium, sodium or potassium niobates · CPC title

  • by polishing or grinding · CPC title

  • H10N30/072Primary

    by laminating or bonding of piezoelectric or electrostrictive bodies · CPC title

  • H10N30/073Primary

    by fusion of metals or by adhesives · CPC title

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Frequently asked questions

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What does patent US12507593B2 cover?
An article including a support unit, the support unit including a support substrate and a bonding layer such that the bonding layer is bonded to a surface of the support substrate. Furthermore, a total thickness variation TTV across a width of the support unit is about 2.0 microns or less.
Who is the assignee on this patent?
Corning Inc
What technology area does this patent fall under?
Primary CPC classification H10N30/072. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Dec 23 2025 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 11 related publications on this page (citations in our corpus or others sharing the same primary CPC).