Measurement apparatus, measurement method, and program

Patent metadata

Field	Value
Publication number	US-12492941-B2
Application number	US-202418654699-A
Country	US
Kind code	B2
Filing date	May 3, 2024
Priority date	May 16, 2023
Publication date	Dec 9, 2025
Grant date	Dec 9, 2025

Abstract

A measurement apparatus 1 according to this disclosure includes a controller 80 and a spectroscope 10 having an optical element in which an aperture 132 a to pass light L 1 to be measured is formed. The controller 80 executes a first process to generate a synthetic spectrum Sr(i) of the narrowed light L 1 by synthesizing at least a first spectrum S 1 ( i ) when a beam spot P of the light L 1 is at a first position x 1 within the aperture 132 a and a second spectrum S 2 ( i ) when the beam spot P of the light L 1 is at a second position x 2 within the aperture 132 a . The first position x 1 includes a position shifted to one side in a predetermined direction D from a reference position x 0 of the beam spot P within the aperture 132 a . The second position x 2 includes a position shifted to the other side from the reference position x 0.

First claim

The invention claimed is:

1 . A measurement apparatus comprising:
a controller; and a spectroscope having an optical element in which an aperture to pass light to be measured is formed, wherein the controller is configured to execute a first process to generate a synthetic spectrum of the narrowed light to be measured by synthesizing at least a first spectrum when a beam spot of the light to be measured is at a first position within the aperture and a second spectrum when the beam spot of the light to be measured is at a second position within the aperture, the first position includes a position shifted to one side in a predetermined direction from a reference position of the beam spot within the aperture, and the second position includes a position shifted to the other side in the predetermined direction from the reference position of the beam spot within the aperture.

2 . The measurement apparatus according to claim 1 , wherein the controller is configured to generate the synthetic spectrum using a spectrum, between the first spectrum and the second spectrum, with lower intensity at each measurement point.

3 . The measurement apparatus according to claim 1 , wherein the controller is configured to execute a pre-process to predetermine at least one of the first position or the second position by measurement before executing the first process.

4 . The measurement apparatus according to claim 3 , wherein the controller is configured, in the pre-process, to calculate a first distance range in which intensity of a light spectrum is maintained, by shifting a position of the beam spot from the reference position to the one side in steps of a predetermined distance, and determine the first position based on the first distance range.

5 . The measurement apparatus according to claim 3 , wherein the controller is configured, in the pre-process, to calculate a second distance range in which intensity of a light spectrum is maintained, by shifting a position of the beam spot from the reference position to the other side in steps of a predetermined distance, and determine the second position based on the second distance range.

6 . The measurement apparatus according to claim 1 , wherein the controller is configured, in the first process, to determine whether a local peak has occurred between a pair of peaks adjacent to each other in the synthetic spectrum when the first spectrum and the second spectrum have been synthesized.

7 . The measurement apparatus according to claim 6 , wherein upon determining that the local peak has occurred, the controller generates the synthetic spectrum by synthesizing, in addition to the first spectrum and the second spectrum, a third spectrum when the beam spot is at the reference position.

8 . The measurement apparatus according to claim 7 , wherein the controller is configured to generate the synthetic spectrum using a spectrum, among the first spectrum, the second spectrum, and the third spectrum, with lowest intensity at each measurement point.

9 . The measurement apparatus according to claim 6 , wherein upon determining that the local peak has occurred, the controller causes the local peak to be displayed in a different aspect from other portions.

10 . The measurement apparatus according to claim 6 , wherein upon determining that the local peak has occurred, the controller executes an interpolation process based on data on both sides of the local peak, and updates light spectrum data at the local peak.

11 . The measurement apparatus according to claim 10 , wherein the controller is configured to cause a portion for which data has been updated in the synthetic spectrum to be displayed in a different aspect from other portions.

12 . The measurement apparatus according to claim 6 , wherein upon determining that the local peak has occurred, the controller switches to a second process to measure a reference spectrum of the light to be measured at the reference position.

13 . The measurement apparatus according to claim 1 , wherein the controller is configured to switch and execute one of the first process and a second process to measure a reference spectrum of the light to be measured at the reference position, in response to a user's selection input.

14 . The measurement apparatus according to claim 1 , wherein the reference position includes a center position of the aperture in the predetermined direction.

15 . The measurement apparatus according to claim 1 , wherein the predetermined direction includes a shortitudinal direction of the aperture.

16 . The measurement apparatus according to claim 1 , wherein a first distance from the reference position to the first position and a second distance from the reference position to the second position are same as each other.

17 . The measurement apparatus according to claim 1 , wherein the first position includes a center position of the beam spot when a first end of the beam spot at the one side contacts a first edge of the aperture.

18 . The measurement apparatus according to claim 1 , wherein the second position includes a center position of the beam spot when a second end of the beam spot at the other side contacts a second edge of the aperture.

19 . A measurement method performed by a measurement apparatus including a spectroscope having an optical element in which an aperture to pass light to be measured is formed, the measurement method comprising:
executing a first process to generate a synthetic spectrum of the narrowed light to be measured by synthesizing at least a first spectrum when a beam spot of the light to be measured is at a first position within the aperture and a second spectrum when the beam spot of the light to be measured is at a second position within the aperture, wherein the first position includes a position shifted to one side in a predetermined direction from a reference position of the beam spot within the aperture, and the second position includes a position shifted to the other side in the predetermined direction from the reference position of the beam spot within the aperture.

20 . A program configured to cause a measurement apparatus to execute an operation, the measurement apparatus including a spectroscope having an optical element in which an aperture to pass light to be measured is formed, the operation comprising:
executing a first process to generate a synthetic spectrum of the narrowed light to be measured by synthesizing at least a first spectrum when a beam spot of the light to be measured is at a first position within the aperture and a second spectrum when the beam spot of the light to be measured is at a second position within the aperture, wherein the first position includes a position shifted to one side in a predetermined direction from a reference position of the beam spot within the aperture, and the second position includes a position shifted to the other side in the predetermined direction from the reference position of the beam spot within the aperture.

Assignees

• Yokogawa Electric Corp
• Yokogawa Test & Measurement Corp

Inventors

• Ishihara Gentaro
• Matsukawa Hiroaki

Classifications

• G01J3/18 Primary

  using diffraction elements, e.g. grating (gratings per se G02B) · CPC title

• G01J3/04

  Slit arrangements {slit adjustment} · CPC title

• G01J3/28 Primary

  Investigating the spectrum (using colour filters G01J3/51) · CPC title

• G01N2021/0112

  Apparatus in one mechanical, optical or electronic block · CPC title

• G01N21/17

  Systems in which incident light is modified in accordance with the properties of the material investigated (where the material investigated is optically excited causing a change in wavelength of the incident light G01N21/63) · CPC title