Compact spectrometers and instruments including them
US-2021381890-A1 · Dec 9, 2021 · US
Active spectral control during spectrum synthesis
US9207119B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9207119-B2 |
| Application number | US-201313830466-A |
| Country | US |
| Kind code | B2 |
| Filing date | Mar 14, 2013 |
| Priority date | Apr 27, 2012 |
| Publication date | Dec 8, 2015 |
| Grant date | Dec 8, 2015 |
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Abstract
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A spectral feature of a pulsed light beam produced by an optical source is estimated by modifying the wavelength of the pulsed light beam based on a predefined repeating pattern having a pattern period including a plurality of steps, the modification including shifting the wavelength of the pulsed light beam by a wavelength offset from a baseline wavelength for each step in the pattern period; measuring the wavelength of the light beam for each step in the pattern period as the wavelength is modified across the pattern; and estimating a spectral feature of the pulsed light beam over an evaluation window that includes all of the steps within the pattern period based at least in part on the measured wavelength of the light beam for each step in the pattern period.
First claim
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What is claimed is: 1. A method of estimating a spectral feature of a pulsed light beam produced by an optical source, the method comprising: modifying the wavelength of the pulsed light beam based on a predefined repeating pattern having a pattern period comprising a plurality of steps, the modification including shifting the wavelength of the pulsed light beam by a wavelength offset from a baseline wavelength for each step in the pattern period; measuring the wavelength of the…
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Physics · mapped topic
- G01J3/1809Primary
Physics · mapped topic
Physics · mapped topic
Physics · mapped topic
Physics · mapped topic
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- What does patent US9207119B2 cover?
- A spectral feature of a pulsed light beam produced by an optical source is estimated by modifying the wavelength of the pulsed light beam based on a predefined repeating pattern having a pattern period including a plurality of steps, the modification including shifting the wavelength of the pulsed light beam by a wavelength offset from a baseline wavelength for each step in the pattern period; …
- Who is the assignee on this patent?
- Cymer LLC
- What technology area does this patent fall under?
- Primary CPC classification G01J3/1809. Mapped technology areas include Physics.
- When was this patent published?
- Publication date Tue Dec 08 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).