Substrate processing apparatus

Patent metadata

Field	Value
Publication number	US-12476076-B2
Application number	US-202118284657-A
Country	US
Kind code	B2
Filing date	Dec 16, 2021
Priority date	Apr 1, 2021
Publication date	Nov 18, 2025
Grant date	Nov 18, 2025

Abstract

Provided is an apparatus for processing a substrate, the apparatus including: a chamber having a processing space; a support unit for supporting a substrate in the processing space; a gas supply unit for supplying process gas to the processing space; and a plasma generation unit for generating plasma from the process gas, in which the plasma generation unit includes: an inner coil part including a plurality of inner coils; an outer coil part provided to surround the inner coil part when viewed from above and including a plurality of outer coils; an upper power source for applying power to the inner coil part and the outer coil part, and a ground plate disposed above the inner coil part and the outer coil part and grounding the inner coil part and the outer coil part.

First claim

The invention claimed is:

1 . An apparatus for processing a substrate, the apparatus comprising:
a chamber having a processing space; a support unit for supporting a substrate in the processing space; a gas supply unit for supplying process gas to the processing space; and a plasma generation unit for generating plasma from the process gas, wherein the plasma generation unit includes: an inner coil part including a plurality of inner coils; an outer coil part provided to surround the inner coil part when viewed from above and including a plurality of outer coils; an upper power source for applying power to the inner coil part and the outer coil part, and each of the inner coils and each of the outer coils are provided to be concentric with each other, each of the inner coils and the outer coils has: a first portion to an n th portion, and a first connection portion to an n−1 th connection portion, and Nis a natural number equal to or greater than 2, the first portion to the n th portion are each provided in a shape of an arc having a different radius with respect to the concentric point, the k+1 th portion has a radius greater than the k th portion, the k th connection portion connects the k th portion to the k+1 th portion, and the k is a natural number equal to or greater than 1 and equal to or less than n−1, any one of the first portion and the n th portion has a power terminal to which an electricity line receiving power from the power source is connected, the other of the first portion and the n th portion has a ground terminal connected with a ground line, and in each of the inner coils and the outer coils, the power terminal and the ground terminal are located on a straight line through the concentric point.

2 . The apparatus of claim 1 , wherein the ground terminal, the power terminal, and the concentric point are sequentially disposed on the straight line.

3 . The apparatus of claim 2 , wherein a power terminal connected to one inner coil among the inner coils, a power terminal connected to one outer coil among the outer coils, and the concentric point are disposed on the same line.

4 . The apparatus of claim 1 , wherein in any one inner coil among the inner coils or any one outer coil among the outer coils, the straight line through the concentric point passes through only any one of the first portion and the n th portion.

5 . The apparatus of claim 1 , wherein each of the first connection portion and the N−1 th connection portion is provided to be inclined with respect to the straight line through the concentric point.

6 . The apparatus of claim 1 , wherein the n is 3.

7 . The apparatus of claim 1 , wherein the inner coils and the outer coils are each provided in the number of three.

8 . The apparatus of claim 1 , wherein the inner coils and the outer coils are all disposed in the same plane.

9 . The apparatus of claim 8 , wherein each of the inner coils and the outer coils has a center angle of 360 degrees, and
the first portion to the n th portion are each provided with the same center angle.

10 . The apparatus of claim 1 , further comprising:
a ground plate disposed above the coil part, wherein the ground terminal is connected to the ground plate.

11 . The apparatus of claim 10 , wherein the chamber includes:
a lower body; a cover combined with the lower body to form the processing space; an upper body combined with the cover to form an interior space in which the inner coil part and outer coil part are disposed; and a fan unit for supplying airflow to the interior space, and the ground plate is disposed in the interior space, and the ground plate is provided with an opening to allow the airflow to circulate in the interior space.

12 . The apparatus of claim 11 , wherein the fan unit includes:
a first fan; and a second fan for supplying the airflow to the interior space at a position different from the first fan, and the opening is formed in the ground plate at a position overlapping the first fan and/or the second fan when viewed from above.

13 . The apparatus of claim 1 , wherein the inner coil and the outer coil are provided from a material including at least one of copper, aluminum, tungsten, silver, gold, platinum, and iron.

14 . The apparatus of claim 1 , wherein surfaces of the inner coil and the outer coil are coated with a material including at least one of silver, gold, and platinum.

15 . The apparatus of claim 10 , wherein the ground plate is provided from a material including at least one of aluminum, copper, and iron.

16 . An apparatus for processing a substrate, the apparatus comprising:
a chamber having a processing space; a support unit for supporting a substrate in the processing space; a gas supply unit for supplying process gas to the processing space; and a plasma generation unit for generating plasma from the process gas, wherein the plasma generation unit includes: a coil part including a plurality of coils; and an upper power source for applying power to the coil part, each of the coils has a first portion to an n th portion and a first connection portion to an n−1 th connection portion, and N is a natural number equal to or greater than 2, the first portion to the n th portion are provided in a form of arcs that are concentric with each other, among the first portion to the n th portion, the k+1 th portion has a radius greater than the k th portion, the k th connection portion connects the k th portion to the k+1 th portion, and the k is a natural number equal to or greater than 1 and equal to or less than n−1, any one of the first portion and the n th portion has a power terminal to which an electricity line receiving power from the power source is connected, the other of the first portion and the n th portion has a ground terminal connected with a ground line, and in each of the coils, the power terminal and the ground terminal are located on a straight line through the concentric point.

17 . The apparatus of claim 16 , wherein the ground terminal connected to any one coil among the coils, the power terminal, and the concentric point are sequentially disposed on the straight line.

18 . The apparatus of claim 16 , wherein the straight line through the concentric point passes through only any one of the first portion to the n+1 th portion in any one of the coils.

19 . The apparatus of claim 16 , wherein each of the first connection portion and the N−1 th connection portion is provided to be inclined with respect to the straight line through the concentric point.

20 . The apparatus of claim 1 , wherein the coils are all disposed on the same plane.

Assignees

• Psk Inc

Inventors

• Lee Chi Young
• Kim A Ram
• Yang Soo Yeong
• Yoon Young Tak
• Lee Yun Young
• Son Jin Chul

Classifications

• H01J2237/3323

  uniformity · CPC title

• H01J37/32798

  Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus · CPC title

• H01J37/3244

  Gas supply means · CPC title

• H01J37/3211

  Antennas, e.g. particular shapes of coils · CPC title

• H01J37/32

  Gas-filled discharge tubes (heating by discharge H05B) · CPC title