Injector configured for arrangement within a reaction chamber of a substrate processing apparatus

Patent metadata

Field	Value
Publication number	US-12467141-B2
Application number	US-202418425643-A
Country	US
Kind code	B2
Filing date	Jan 29, 2024
Priority date	Nov 30, 2020
Publication date	Nov 11, 2025
Grant date	Nov 11, 2025

Abstract

The invention relates to an injector configured for arrangement within a reaction chamber of a substrate processing apparatus to inject gas in the reaction chamber. The injector may be elongated along a first axis and configured with an internal gas conduction channel extending along the first axis and provided with at least one gas entrance opening and at least one gas exit opening. The injector may have a width extending along a second axis perpendicular to the first axis substantially larger than a depth of the injector extending along a third axis perpendicular to the first and second axis. The wall of the injector may have a varying thickness.

First claim

What is claimed is:

1 . An injector comprising:
a wall comprising an outer surface and an inner surface, wherein the inner surface defines an internal gas conduction channel extending along a first axis; at least one gas entrance opening; and at least one gas exit opening, wherein the injector is substantially elongated along the first axis, wherein the internal gas conduction channel has a substantially oval shaped cross section whereby the internal gas conduction channel extends along a second axis substantially larger than along a third axis perpendicular to the first and second axis, wherein a thickness of the wall varies in a cross section of the wall surrounding the internal gas conduction channel, and wherein the substantially oval shaped cross section is partially pinched off in a middle of the second axis by a portion of the wall having an increased thickness.

2 . The injector according to claim 1 , wherein the wall of the injector has a varying thickness along the second axis.

3 . The injector according to claim 1 , wherein the wall of the injector has a varying thickness along the third axis.

4 . The injector according to claim 1 , wherein the wall of the injector has a varying thickness over its circumference along the second and third axis.

5 . The injector according to claim 1 , wherein the wall of the injector has a varying thickness along the first axis.

6 . The injector according to claim 1 , wherein the inner surface in the cross section comprises a first convex portion, a second convex portion, a first concave portion, and a second concave portion, wherein the first convex portion is connected to the first concave portion and the second concave portion, and the second convex portion is connected to the first concave portion and the second concave portion.

7 . The injector according to claim 1 , wherein the at least one gas entrance opening of the gas injector is a single gas entrance opening at a first end of the injector.

8 . The injector according to claim 7 , wherein the at least one gas exit opening of the gas injector is a single gas exit opening at a second end, opposite to the first end.

9 . The injector according to claim 7 , wherein the injector has a plurality of gas exit holes along a length of the injector along the first axis.

10 . The injector according to claim 1 , wherein a depth of the injector in the third axis is decreasing towards a second end.

11 . The injector according to claim 1 , wherein the thickness of the wall in the cross section varies between 4% to 60%.

12 . The injector according to claim 1 , further comprising a plurality of gas exit openings, wherein the plurality of gas exit openings are aligned along two vertical lines across a surface of the injector.

13 . The injector according to claim 12 , wherein the plurality of gas exit openings are provided in pairs along the two vertical lines.

14 . A substrate processing apparatus comprising:
a tube; a closed liner configured to extend in an interior of the tube;
a gas injector to provide a gas to the interior of the tube; and,
a gas exhaust duct to remove the gas from the interior, whereby the closed liner comprises: a substantially cylindrical wall delimited by a liner opening at a lower end, a top closure at a higher end, and being substantially closed for gases above the liner opening, wherein the gas injector is the injector according to claim 1 .

15 . The substrate processing apparatus according to claim 14 , wherein the apparatus comprises a plurality of gas injectors and at least one of the gas injectors has a different length.

16 . The substrate processing apparatus according to claim 15 , wherein the longest of the plurality of injectors extends within the interior to close to the top closure of the closed liner.

17 . The substrate processing apparatus according to claim 15 , wherein one of the longest of the plurality of injectors has a single gas exit hole.

18 . The substrate processing apparatus according to claim 15 , wherein one of the longest of the plurality of injectors has a plurality of gas exit holes.

Assignees

• Asm Ip Holding Bv

Inventors

• Jdira Lucian C
• De Ridder Chris G M

Classifications

• H10P72/0431

  Apparatus for thermal treatment · CPC title

• H10P72/0436

  mainly by radiation · CPC title

• H10P72/0432

  mainly by conduction · CPC title

• H10P72/0402

  Apparatus for fluid treatment (H10P72/0441, H10P72/0448 take precedence) · CPC title

• H10P72/12 Primary

  Vertical boat type carrier whereby the substrates are horizontally supported, e.g. comprising rod-shaped elements · CPC title