Embeddable semiconductor-based capacitor

US12462983B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12462983-B2
Application numberUS-202217740417-A
CountryUS
Kind codeB2
Filing dateMay 10, 2022
Priority dateMay 14, 2021
Publication dateNov 4, 2025
Grant dateNov 4, 2025

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A semiconductor-based capacitor can include a substrate including a semiconductor material, an oxide layer formed over the substrate, a conductive layer formed over at least a portion of the oxide layer, a plurality of distinct coplanar upper terminals, and a lower terminal. The upper terminals and the lower terminal can be exposed along the top and bottom surfaces of the substrate, respectively, for embedding the capacitor in a substrate such as a circuit board. The semiconductor-based capacitor can be sufficiently miniaturized to be embeddable within a circuit board while providing superior capacitance values without compromising the integrity of the capacitor. For example, each of the upper terminals can have a maximum width and a thickness normal to the maximum width, and a ratio of the width to the thickness can be greater than about 80:1 to prevent physical damage to the capacitor from warping or cracking.

First claim

Opening claim text (preview).

What is claimed is: 1 . An embeddable capacitor comprising: a substrate comprising a semiconductor material; a conductive layer formed over the substrate; an intervening layer between the substrate and the conductive layer, wherein the intervening layer comprises one or more of an oxide layer and an insulator layer; a plurality of distinct coplanar upper terminals formed over the conductive layer; a lower terminal formed over a lower surface of the substrate opposite the top surface of the substrate; wherein each of the plurality of distinct coplanar upper terminals has a maximum width, a surface area, and a thickness normal to the maximum width, wherein a ratio of the maximum width to the thickness is greater than about 80:1 and a ratio of a cumulative surface area of all the upper terminals to a surface area of the substrate is in a range from about 0.6:1 to about 0.99:1. 2 . The capacitor of claim 1 , wherein the plurality of upper terminals and the lower terminal comprise at least one of copper, gold, or aluminum. 3 . The capacitor of claim 1 , wherein the thickness of each of the plurality of upper terminals is at least about 1 micron. 4 . The capacitor of claim 1 , wherein the lower terminal comprises a plurality of distinct coplanar lower terminals. 5 . The capacitor of claim 4 , wherein the plurality of lower terminals are aligned with the plurality of upper terminals with respect to the first and second directions. 6 . The capacitor of claim 1 , wherein the intervening layer comprises both the oxide layer and the insulator layer, wherein the insulator layer is formed over the oxide layer. 7 . The capacitor of claim 6 , wherein the insulator layer comprises silicon nitride. 8 . The capacitor of claim 1 , further comprising an upper protective layer formed over the conductive layer and a lower protective layer formed over the lower surface of the substrate. 9 . The capacitor of claim 8 , wherein each of the plurality of upper terminals extends through the upper protective layer in a vertical direction normal to an upper surface of the substrate. 10 . The capacitor of claim 1 , wherein each of the plurality of upper terminals are exposed along a top surface of the capacitor. 11 . The capacitor of claim 1 , wherein the lower terminal is exposed along a bottom surface of the capacitor. 12 . The capacitor of claim 1 , wherein the semiconductor material of the substrate comprises silicon. 13 . The capacitor of claim 1 , wherein the oxide layer comprises silicon oxide. 14 . The capacitor of claim 1 , wherein the capacitor comprises a capacitance value in a range from about 0.1 pF to about 1800 pF. 15 . A circuit board comprising: a substrate that defines a mounting surface, wherein a recessed opening is provided in the mounting surface; and a capacitor comprising: a semiconductor substrate; a plurality of distinct coplanar upper terminals formed over an upper surface of the semiconductor substrate; a lower terminal formed over a lower surface of the semiconductor substrate opposite the upper surface of the substrate; wherein each of the plurality of distinct coplanar upper terminals has a maximum width, a surface area, and a thickness normal to the maximum width, wherein a ratio of the maximum width to the thickness is greater than about 80:1 and a ratio of a cumulative surface area of all the upper terminals to a surface area of the semiconductor substrate is in a range from about 0.6:1 to about 0.99:1. 16 . The circuit board of claim 15 , wherein the capacitor further comprises an oxide layer formed over the upper surface of the substrate and a conductive layer formed over the oxide layer. 17 . The circuit board of claim 16 , wherein the plurality of upper terminals are formed over the conductive layer. 18 . The circuit board of claim 16 , further comprising an insulator layer formed between the oxide layer and the conductive layer. 19 . The circuit board of claim 15 , wherein the lower terminal comprises a plurality of distinct coplanar lower terminals. 20 . A method of embedding a capacitor in a substrate comprising: providing a substrate, wherein the substrate comprises a recessed opening in a surface of the substrate; providing a capacitor, wherein the capacitor comprises: a semiconductor substrate; a plurality of distinct coplanar upper terminals formed over a top surface of the semiconductor substrate; at least one lower terminal formed over a bottom surface of the semiconductor substrate opposite the top surface of the substrate; wherein each of the plurality of distinct coplanar upper terminals has a maximum width, a surface area, and a thickness normal to the maximum width, wherein a ratio of the maximum width to the thickness is greater than about 80:1 and a ratio of a cumulative surface area of all the upper terminals to a surface area of the substrate is in a range from about 0.6:1 to about 0.99:1; inserting the capacitor within the recessed opening; and electrically connecting the substrate with at least one of the plurality of upper terminals of the capacitor.

Assignees

Inventors

Classifications

  • associated with components encapsulated in the insulating substrate of the PCBs; associated with components incorporated in internal layers of multilayer circuit boards · CPC title

  • the terminals being coated on the capacitive element (H01G4/232 takes precedence) · CPC title

  • Electrodes · CPC title

  • Semiconductive ceramic capacitors · CPC title

  • Glass dielectric · CPC title

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Frequently asked questions

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What does patent US12462983B2 cover?
A semiconductor-based capacitor can include a substrate including a semiconductor material, an oxide layer formed over the substrate, a conductive layer formed over at least a portion of the oxide layer, a plurality of distinct coplanar upper terminals, and a lower terminal. The upper terminals and the lower terminal can be exposed along the top and bottom surfaces of the substrate, respectivel…
Who is the assignee on this patent?
Kyocera Avx Components Corp
What technology area does this patent fall under?
Primary CPC classification H01G4/33. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Nov 04 2025 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).