Surfactants for electronics products

Patent metadata

Field	Value
Publication number	US-12460131-B2
Application number	US-202117196994-A
Country	US
Kind code	B2
Filing date	Mar 9, 2021
Priority date	Mar 11, 2020
Publication date	Nov 4, 2025
Grant date	Nov 4, 2025

Abstract

Pre-texturing agents, etchants, and photoresist stripping agents may be formulated to include one or more surfactants, from one or more surfactant classes, such as derivatives of amino acids that have surface-active properties.

First claim

The invention claimed is:

1 . A formulation for a pre-texturing agent, comprising:
at least one surfactant of Formula I,

wherein R 1 and R 2 may be the same or different, and may be selected from the group consisting of hydrogen and C 1 -C 6 alkyl, wherein the C 1 -C 6 alkyl may optionally be substituted with one or more substituents selected from the group consisting of hydroxyl, amino, amido, sulfonyl, carbonyl, and carboxylate;
n is an integer from 2 to 5;
m is an integer from 12 to 18; which identifies the number of carbon atoms in a straight alkyl chain;
the terminal nitrogen is optionally further substituted with R 3 , wherein R 3 is selected from the group consisting of hydrogen, oxygen, hydroxyl, and C 1 -C 6 alkyl, wherein the C 1 -C 6 alkyl may optionally be substituted with one or more substituents selected from the group consisting of hydroxyl, amino, amido, sulfonyl, carbonyl, and carboxylate;
an optional counterion associated with the compound which, if present, is selected from the group consisting of chloride, bromide, iodide, and hydroxide; and
at least one of one or more solvents and one or more defoaming agents.

2 . The formulation of claim 1 , further comprising one or more acids.

3 . The formulation of claim 1 , further comprising one or more bases.

4 . The formulation of claim 1 , further comprising one or more chelating agents.

5 . The formulation according to claim 1 , wherein the surfactant comprises at least one of 6-(dodecyloxy)-N,N,N-trimethyl-6-oxohexan-1-aminium iodide, having the following formula:

dodecyl 6-(dimethylamino)hexanoate N-oxide, having the following formula:

6-(dodecyloxy)-N,N-dimethyl-6-oxohexan-1-aminium chloride, having the following formula:

6-(dodecyloxy)-6-oxohexan-1-aminium chloride, having the following formula:

and combinations thereof.

6 . A formulation for an etchant, comprising:
at least one surfactant of Formula I,

wherein R 1 and R 2 may be the same or different, and may be selected from the group consisting of hydrogen and C 1 -C 6 alkyl, wherein the C 1 -C 6 alkyl may optionally be substituted with one or more substituents selected from the group consisting of hydroxyl, amino, amido, sulfonyl, carbonyl, and carboxylate;
n is an integer from 2 to 5;
m is an integer from 12 to 18 which identifies the number of carbon atoms in a straight alkyl chain;
the terminal nitrogen is optionally further substituted with R 3 , wherein R 3 is selected from the group consisting of hydrogen, oxygen, hydroxyl, and C 1 -C 6 alkyl, wherein the C 1 -C 6 alkyl may optionally be substituted with one or more substituents selected from the group consisting of hydroxyl, amino, amido, sulfonyl, carbonyl, and carboxylate;
an optional counterion associated with the compound which, if present, is selected from the group consisting of chloride, bromide, iodide, and hydroxide; and
hydrofluoric acid (1f).

7 . The formulation of claim 6 , further comprising one or more oxidizing agents.

8 . The formulation of claim 6 , further comprising one or more complexing agents.

9 . The formulation according to claim 6 , wherein the surfactant comprises at least one of 6-(dodecyloxy)-N,N,N-trimethyl-6-oxohexan-1-aminium iodide, having the following formula:

dodecyl 6-(dimethylamino)hexanoate N-oxide, having the following formula:

6-(dodecyloxy)-N,N-dimethyl-6-oxohexan-1-aminium chloride, having the following formula:

6-(dodecyloxy)-6-oxohexan-1-aminium chloride, having the following formula:

and combinations thereof.

10 . A formulation for a photoresist stripping formulation, comprising:
at least one surfactant of Formula I,

wherein R 1 and R 2 may be the same or different, and may be selected from the group consisting of hydrogen and C 1 -C 6 alkyl, wherein the C 1 -C 6 alkyl may optionally be substituted with one or more substituents selected from the group consisting of hydroxyl, amino, amido, sulfonyl, carbonyl, and carboxylate;
n is an integer from 2 to 5;
m is an integer from 12 to 18 which identifies the number of carbon atoms in a straight alkyl chain;
the terminal nitrogen is optionally further substituted with R 3 , wherein R 3 is selected from the group consisting of hydrogen, oxygen, hydroxyl, and C 1 -C 6 alkyl, wherein the C 1 -C 6 alkyl may optionally be substituted with one or more substituents selected from the group consisting of hydroxyl, amino, amido, sulfonyl, carbonyl, and carboxylate;
an optional counterion associated with the compound which, if present, is selected from the group consisting of chloride, bromide, iodide, and hydroxide; and
an alkanolamine.

11 . The formulation of claim 10 , further comprising a sulfoxide.

12 . The formulation of claim 10 , further comprising a sulfone.

13 . The formulation of claim 10 , further comprising a glycol ether.

14 . The formulation according to claim 10 , wherein the surfactant comprises at least one of 6-(dodecyloxy)-N,N,N-trimethyl-6-oxohexan-1-aminium iodide, having the following formula:

dodecyl 6-(dimethylamino)hexanoate N-oxide, having the following formula:

6-(dodecyloxy)-N,N-dimethyl-6-oxohexan-1-aminium chloride, having the following formula:

6-(dodecyloxy)-6-oxohexan-1-aminium chloride, having the following formula:

and combinations thereof.

15 . The formulation of claim 1 , wherein n is 5.

16 . The formulation of claim 6 , wherein n is 5.

17 . The formulation of claim 10 , wherein n is 5.

Assignees

• Advansix Resins & Chemicals Llc

Inventors

• Asirvatham Edward

Classifications

• G03F7/327

  Non-aqueous alkaline compositions, e.g. anhydrous quaternary ammonium salts · CPC title

• C23F1/38

  for etching refractory metals · CPC title

• C09K13/00

  Etching, surface-brightening or pickling compositions (for glass C03C15/00, {C03C25/66; for mortars, concrete, artificial or natural stone or ceramics C04B41/5338}; for metallic material C23F, C23G1/00, C25F1/00; {for semi-conductors H10P52/40}) · CPC title

• C07C309/14

  containing amino groups bound to the carbon skeleton · CPC title

• C07C229/12 Primary

  to carbon atoms of acyclic carbon skeletons · CPC title