Plasmonic microwave metamaterial waveguide sensing

US12455268B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12455268-B2
Application numberUS-202318101702-A
CountryUS
Kind codeB2
Filing dateJan 26, 2023
Priority dateJan 31, 2022
Publication dateOct 28, 2025
Grant dateOct 28, 2025

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

A method to detect the presence and or concentration of an analyte in the environment of a spoof plasmon sensor having the steps of: providing a spoof plasmon sensor into an environment; interrogating said spoof plasmon sensor with an electromagnetic signal; collecting a modified electromagnetic signal from the spoof plasmon sensor; and analyzing the modified electromagnetic signal to detect an analyte in the environment of the sensor. A spoof plasmon sensor for detecting an analyte having a substrate with a superior surface; and a conductive material disposed on said superior surface, said conductive material defining a waveguide having a dual tapering shape, wherein said waveguide defines spoof plasmon cavities which are exposed substrate, where said substrate is configured to change in permittivity when contacted by an analyte.

First claim

Opening claim text (preview).

What is claimed is: 1. A method to detect the presence or concentration of an analyte in the environment of a spoof plasmon sensor comprising: providing a spoof plasmon sensor into an environment; interrogating said spoof plasmon sensor with an electromagnetic signal; collecting a modified electromagnetic signal from the spoof plasmon sensor; and analyzing the modified electromagnetic signal to detect an analyte in the environment of the sensor wherein the spoof plasmon sensor comprises a substrate with a superior surface, wherein a conductive material is disposed on the superior surface of the substrate, wherein said conductive material defines a waveguide, wherein the waveguide defines spoof plasmon cavities comprising exposed substrate, wherein said modified electromagnetic signal is generated as a result of an analyte in the environment interacting with and changing the permittivity of the substrate; and wherein the analyte interacting with the substrate changes the permittivity of the substrate by causing the substrate to change phase. 2. The method of claim 1 wherein the electromagnetic signal has a frequency between approximately 1 GHz and approximately 100 GHz. 3. The method of claim 1 wherein the substrate is a metamaterial selected from the group consisting of polymers, metal organic frameworks, coordinational organic frameworks, biopolymers, biomolecules, and combinations thereof. 4. The method of claim 1 wherein the substrate comprises PTFE. 5. The method of claim 1 wherein the analyte is a gas selected from the group consisting of CO 2 , CO, N 2 , H 2 , H 2 O, CH 4 , and combinations thereof. 6. The method of claim 1 wherein interrogating said spoof plasmon sensor comprises wirelessly transmitting said electromagnetic signal from an interrogator to said spoof plasmon sensor. 7. The method of claim 1 wherein the spoof plasmon sensor has a response time of less than four seconds. 8. The method of claim 1 wherein analyzing the modified electromagnetic signal to detect an analyte in the environment of the sensor comprises detecting the presence of an analyte in the environment of the sensor. 9. The method of claim 1 wherein analyzing the modified electromagnetic signal to detect an analyte in the environment of the sensor comprises detecting the concentration of the analyte in the environment of the sensor. 10. The method of claim 9 wherein the concentration of the analyte is between approximately 100% and approximately 1000 ppm. 11. A spoof plasmon sensor for detecting an analyte comprising: a substrate with a superior surface; and a conductive material disposed on said superior surface, said conductive material defining a waveguide having a dual tapering shape, wherein said waveguide defines spoof plasmon cavities comprising exposed substrate, wherein said substrate is configured to change in permittivity when contacted by an analyte and wherein the substrate is configured to change phase and permittivity when contacted by an analyte. 12. The spoof plasmon sensor of claim 11 wherein the sensor is configured to operate with a frequency between approximately 1 GHz and approximately 100 GHz.

Assignees

Inventors

Classifications

  • CO or CO2 · CPC title

  • Investigating or analysing materials by the use of microwaves or radio waves, i.e. electromagnetic waves with a wavelength of one millimetre or more (G01N3/00 - G01N17/00, G01N24/00 take precedence) · CPC title

  • concerning the detector · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US12455268B2 cover?
A method to detect the presence and or concentration of an analyte in the environment of a spoof plasmon sensor having the steps of: providing a spoof plasmon sensor into an environment; interrogating said spoof plasmon sensor with an electromagnetic signal; collecting a modified electromagnetic signal from the spoof plasmon sensor; and analyzing the modified electromagnetic signal to detect an…
Who is the assignee on this patent?
Us Energy
What technology area does this patent fall under?
Primary CPC classification G01N33/0027. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Oct 28 2025 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).