Metamaterial thin films

US9878516B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9878516-B2
Application numberUS-201313784856-A
CountryUS
Kind codeB2
Filing dateMar 5, 2013
Priority dateMar 5, 2012
Publication dateJan 30, 2018
Grant dateJan 30, 2018

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A metamaterial thin film with plasmonic properties formed by depositing metallic films by atomic layer deposition onto a substrate to form a naturally occurring mosaic-like nanostructure having two-dimensional features with air gaps between the two-dimensional features. Due to the unique deposition nanostructure, plasmonic thin films of metal or highly conducting materials can be produced on any substrate, including fabrics and biological materials. In addition, these plasmonic materials can be used in conjunction with geometric patterns that may be used to create multiple resonance plasmonic metamaterials.

First claim

Opening claim text (preview).

What is claimed as new and desired to be protected by Letters Patent of the United States is: 1. A method of making a metamaterial thin film, comprising: depositing a metallic or metallic-like material using atomic layer deposition onto an arbitrary substrate to form a mosaic-like surface morphology comprising two dimensional nanostructure features resembling islands and comprising air gaps separating the two dimensional nanostructure features, wherein the air gap separation between the two dimensional nanostructure features is less than 4 nm; wherein a dielectric spacer layer and subsequently deposited spoof or hybrid-spoof plasmon film are deposited on top of the metallic or metallic-like material; wherein after deposition of the spoof or hybrid-spoof plasmon film, the metallic or metallic-like material exhibits plasmonic and/or metamaterial properties.

Assignees

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Classifications

  • comprising metal as the main or only constituent of a layer, {which is} next to another layer of {the same or of} a {different material (next to a bituminous or tarry layer B32B11/08; next to a water-setting substance layer B32B13/06; next to a glass layer B32B17/061; next to a cellulosic plastic layer B32B23/042)} · CPC title

  • using electric discharges {(generation and control of plasma in discharge tubes for surface treatment H01J37/32, H01J37/34)} · CPC title

  • Ornamental design or indicia · CPC title

  • B32B3/28Primary

    characterised by a layer comprising a deformed thin sheet {, i.e. the layer having its entire thickness deformed out of the plane}, e.g. corrugated, crumpled (B32B29/08 takes precedence) · CPC title

  • characterised by the deposition of metallic material · CPC title

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What does patent US9878516B2 cover?
A metamaterial thin film with plasmonic properties formed by depositing metallic films by atomic layer deposition onto a substrate to form a naturally occurring mosaic-like nanostructure having two-dimensional features with air gaps between the two-dimensional features. Due to the unique deposition nanostructure, plasmonic thin films of metal or highly conducting materials can be produced on an…
Who is the assignee on this patent?
Glembocki Orest J, Prokes Sharka M, Caldwell Joshua D, and 7 more
What technology area does this patent fall under?
Primary CPC classification B32B3/28. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Jan 30 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).