Resistance alloy for use in shunt resistor, use of resistance alloy in shunt resistor, and shunt resistor using resistance alloy

US12435391B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12435391-B2
Application numberUS-202118019755-A
CountryUS
Kind codeB2
Filing dateMay 20, 2021
Priority dateAug 7, 2020
Publication dateOct 7, 2025
Grant dateOct 7, 2025

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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Abstract

Official abstract text for this publication.

Provided is a resistance alloy enabling a decrease in the TCR of a shunt resistor for use in a current detection device capable of detecting large currents. A copper-manganese based resistance alloy for use in a shunt resistor further comprises tin and nickel and has a TCR less than or equal to −36×10 −6 /K at 100° C. with reference to 25° C.

First claim

Opening claim text (preview).

The invention claimed is: 1. A copper-manganese based resistance alloy for use in a shunt resistor, the resistance alloy comprising 9.5 to 12.5 mass % of manganese, 2.5 to 5 mass % of tin, 1 to 3 mass % of nickel, and a balance of the resistance alloy being copper, wherein the resistance alloy has a TCR less than or equal to −36×10 −6 /K at 100° C. with reference to 25° C. 2. A copper-manganese based resistance alloy for use in a shunt resistor, the resistance alloy comprising 9.5 to 12.5 mass % of manganese, 2.5 to 5 mass % of tin, 1 to 3 mass % of nickel, and a balance of the resistance alloy being copper, wherein the resistance alloy has a TCR less than or equal to −10×10 −6 /K in a range of 0° C. to 175° C. with reference to 25° C. 3. Use of the resistance alloy according to any one of claims 1 to 2 in a resistive body of a shunt resistor for use in a current detection device. 4. A shunt resistor comprising a resistive body and an electrode, wherein the resistive body is formed of a copper-manganese based resistance alloy, the resistance alloy comprising 9.5 to 12.5 mass % of manganese, 2.5 to 5 mass % of tin, 1 to 3 mass % of nickel, and a balance of the resistance alloy being copper, and having a TCR of less than or equal to −36×10 −6 /K at 100° C. with reference to 25° C. 5. A shunt resistor comprising a resistive body and an electrode, wherein the resistive body is formed of a copper-manganese based resistance alloy, the resistance alloy comprising 9.5 to 12.5 mass % of manganese, 2.5 to 5 mass % of tin, 1 to 3 mass % of nickel, and a balance of the resistance alloy being copper, and having a TCR of less than or equal to −10×10 −6 /K in a range of 0° C. to 175° C. with reference to 25° C.

Assignees

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Classifications

  • Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material (consisting of loose powdered or granular material H01C8/00; resistors having potential barriers, e.g. field-effect resistors, H10D1/40 - H10D1/43, H10K10/10; semiconductor devices sensitive to electromagnetic or corpuscular radiation, e.g. photoresistors, H10F30/00; magnetic field controlled resistors H10N50/10; bulk negative resistance effect devices H10N80/00) · CPC title

  • Terminals or tapping points specially adapted for resistors; Arrangements of terminals or tapping points on resistors · CPC title

  • including means to minimise changes in resistance with changes in temperature · CPC title

  • Resistors not provided for elsewhere · CPC title

  • C22C9/05Primary

    with manganese as the next major constituent · CPC title

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What does patent US12435391B2 cover?
Provided is a resistance alloy enabling a decrease in the TCR of a shunt resistor for use in a current detection device capable of detecting large currents. A copper-manganese based resistance alloy for use in a shunt resistor further comprises tin and nickel and has a TCR less than or equal to −36×10 −6 /K at 100° C. with reference to 25° C.
Who is the assignee on this patent?
Koa Corp
What technology area does this patent fall under?
Primary CPC classification C22C9/05. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Oct 07 2025 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).