Photocurable composition, coating layer comprising cured product thereof, and substrate for semiconductor process

US12435164B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12435164-B2
Application numberUS-202117917101-A
CountryUS
Kind codeB2
Filing dateJul 22, 2021
Priority dateJul 22, 2020
Publication dateOct 7, 2025
Grant dateOct 7, 2025

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

The present disclosure provides a photocurable composition, which has excellent coatability and is capable of providing a coating layer having excellent surface quality and thickness uniformity, a coating layer including a cured product of the photocurable composition, and a substrate for a semiconductor process including the coating layer.

First claim

Opening claim text (preview).

What is claimed is: 1. A photocurable composition comprising: a urethane (meth)acrylate-based resin syrup comprising a urethane (meth)acrylate-based resin, which is a reaction product of a polyalkylene carbonate-based urethane prepolymer having an isocyanate end group and a reactive group-containing (meth)acrylate-based compound, and a (meth)acrylate-based monomer mixture; a polyfunctional urethane (meth)acrylate-based compound; and a polyfunctional (meth)acrylate-based compound, wherein the urethane (meth)acrylate-based resin comprises a carbonate repeating unit containing a C 1-10 alkylene having at least one C 1-3 side chain attached thereto, and wherein the polyfunctional urethane (meth)acrylate-based compound comprises a compound represented by the following Formula 1: wherein R 1 , R 2 , and R 3 are each independently a C 2-10 alkylene, R 4 , R 5 , and R 6 are each independently a C 2-7 alkylene, R 7 , R 8 , and R 9 are each independently hydrogen or a methyl group, and n, j and k are each independently an integer ranging from 1 to 3. 2. The photocurable composition of claim 1 , wherein the urethane (meth)acrylate-based resin has a weight-average molecular weight of 20,000 g/mol to 50,000 g/mol. 3. The photocurable composition of claim 1 , wherein the urethane (meth)acrylate-based resin syrup has a viscosity of 400 cP to 3,300 cP. 4. The photocurable composition of claim 1 , wherein the polyalkylene carbonate-based urethane prepolymer is a reaction product of a polyalkylene carbonate-based polyol and a diisocyanate-based compound. 5. The photocurable composition of claim 4 , wherein a content of the diisocyanate-based compound is 10 parts by weight to 20 parts by weight based on 100 parts by weight of the polyalkylene carbonate-based polyol. 6. The photocurable composition of claim 1 , wherein a content of the reactive group-containing (meth)acrylate-based compound is 1 part by weight to 10 parts by weight based on 100 parts by weight of the polyalkylene carbonate-based urethane prepolymer. 7. The photocurable composition of claim 1 , wherein a content of the urethane (meth)acrylate-based resin is 15 parts by weight to 35 parts by weight based on 100 parts by weight of the urethane (meth)acrylate-based resin syrup. 8. The photocurable composition of claim 1 , wherein the (meth)acrylate-based monomer mixture comprises at least one type of monomer selected from an alkyl group-containing (meth)acrylate-based monomer, an alicyclic alkyl group-containing (meth)acrylate-based monomer, an aromatic group-containing (meth)acrylate-based monomer, and a polar functional group-containing (meth)acrylate-based monomer. 9. The photocurable composition of claim 1 , wherein a content of the (meth)acrylate-based monomer mixture is 65 parts by weight to 85 parts by weight based on 100 parts by weight of the urethane (meth)acrylate-based resin syrup. 10. The photocurable composition of claim 1 , wherein a content of the polyfunctional urethane (meth)acrylate-based compound is 2.5 parts by weight to 7.5 parts by weight based on 100 parts by weight of the urethane (meth)acrylate-based resin. 11. The photocurable composition of claim 1 , wherein a content of the polyfunctional (meth)acrylate-based compound is 1 part by weight to 5 parts by weight based on 100 parts by weight of the urethane (meth)acrylate-based resin. 12. The photocurable composition of claim 1 , further comprising a photoinitiator, wherein a content of the photoinitiator is 0.5 parts by weight to 3 parts by weight based on 100 parts by weight of the urethane (meth)acrylate-based resin. 13. The photocurable composition of claim 1 , having a viscosity of 3,000 cP or less. 14. A coating layer comprising a cured product of the photocurable composition according to claim 1 . 15. The coating layer of claim 14 , having a total thickness variation of 3 μm or less, wherein the total thickness variation is defined as a difference between a maximum thickness and a minimum thickness. 16. A substrate for a semiconductor process comprising: a substrate film; and the coating layer according to claim 14 .

Assignees

Inventors

Classifications

  • Wafer tapes, e.g. grinding or dicing support tapes · CPC title

  • Polyurethanes having carbon-to-carbon unsaturated bonds · CPC title

  • with two or more layers, where at least one layer of a composition contains a polymer binder · CPC title

  • Compositions for coatings · CPC title

  • Polymers of hydroxy groups containing esters of acrylic or methacrylic acid with aliphatic polyalcohols · CPC title

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Frequently asked questions

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What does patent US12435164B2 cover?
The present disclosure provides a photocurable composition, which has excellent coatability and is capable of providing a coating layer having excellent surface quality and thickness uniformity, a coating layer including a cured product of the photocurable composition, and a substrate for a semiconductor process including the coating layer.
Who is the assignee on this patent?
Lg Chemical Ltd
What technology area does this patent fall under?
Primary CPC classification C08G18/44. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Oct 07 2025 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 4 related publications on this page (citations in our corpus or others sharing the same primary CPC).