Substrate treating apparatus and substrate treating method

Patent metadata

Field	Value
Publication number	US-12431383-B2
Application number	US-202217965058-A
Country	US
Kind code	B2
Filing date	Oct 13, 2022
Priority date	Oct 14, 2021
Publication date	Sep 30, 2025
Grant date	Sep 30, 2025

Abstract

Provided is an apparatus for treating a substrate including: a processing vessel having a processing space; a support unit for supporting the substrate in the processing space and rotating the substrate; a liquid supply unit for supplying a processing liquid to the substrate; and a heating unit for heating the substrate, wherein the support unit includes: a spin chuck; a rotation driver for rotating the spin chuck; a chuck pin installed on the spin chuck to be rotated together with the spin chuck; a chuck pin moving unit for moving the chuck pin between a contact position wherein the chuck pin is in contact with a side portion of the substrate and an open position at which the chuck pin is spaced apart from the side portion of the substrate, and the chuck pin moving unit moves the chuck pin while the substrate is being rotated by the spin chuck.

First claim

What is claimed is:

1. An apparatus for treating a substrate, the apparatus comprising:
a processing vessel having a processing space;
a support unit for supporting the substrate in the processing space and rotating the substrate;
a liquid supply unit for supplying a processing liquid to the substrate supported by the support unit; and
a heating unit for heating the substrate,
wherein the support unit includes:
a spin chuck;
a rotation driver for rotating the spin chuck;
a chuck pin installed on the spin chuck so as to be rotated together with the spin chuck; and
a chuck pin moving unit comprising at least one clutch module, wherein the chuck pin moving unit is configured for moving the chuck pin between a contact position at which the chuck pin is in contact with a side portion of the substrate and an open position at which the chuck pin is spaced apart from the side portion of the substrate, and
wherein the chuck pin moving unit moves the chuck pin while the substrate is being rotated by the spin chuck, and the at least one clutch module is rotated together with the spin chuck.

2. The apparatus of claim 1 , wherein the chuck pin moving unit includes:
a first clutch module including a first clutch provided to be movable in a vertical direction by a lifting driver; and
a second clutch module including a second clutch facing the first clutch and coupled to the chuck pin.

3. The apparatus of claim 2 , wherein when the first clutch is in contact with the second clutch, the chuck pin is moved from the contact position to the open position.

4. The apparatus of claim 2 , wherein when the first clutch is spaced apart from the second clutch, the chuck pin is located at the contact position.

5. The apparatus of claim 2 , wherein when the first clutch comes into contact with the second clutch, the first clutch is rotated together with the second clutch.

6. The apparatus of claim 2 , wherein the first clutch module includes:
the first clutch;
a fixing member which is not rotated together with the spin chuck; and
a bearing member disposed between the first clutch and the fixing member.

7. The apparatus of claim 6 , wherein the bearing member includes an outer ring coupled to the fixing member, an inner ring coupled to the first clutch, and a ball disposed between the outer ring and the inner ring, and
when the first clutch is in contact with the second clutch, the first clutch is rotated together with the second clutch with respect to the fixing member.

8. The apparatus of claim 6 , wherein an elastic member is provided between the lifting driver and the first clutch.

9. The apparatus of claim 5 , wherein an impact mitigating member is disposed inside the first clutch, and
the impact mitigating member mitigates an impact generated in a rotational direction of the first clutch when the first clutch is in contact with the second clutch and is rotated together with the second clutch.

10. The apparatus of claim 2 , wherein the second clutch module includes:
the second clutch;
a base member including a first portion having a longitudinal direction corresponding to the vertical direction, and a second portion extending from the first portion and extending in a direction perpendicular to the longitudinal direction of the first portion;
a first moving member movably coupled to the first portion of the base member;
a second moving member coupled to the chuck pin and movably coupled to the second portion of the base member; and
a third moving member having one end hinged to the first moving member and the other end hinged to the second moving member, and
the second clutch is coupled to the first moving member.

11. The apparatus of claim 10 , wherein the second clutch includes:
a plate portion facing the first clutch; and
a pillar portion for connecting the plate and the first moving member.

12. The apparatus of claim 11 , wherein a partition wall is disposed between the first clutch module and the second clutch module, and
the second clutch is located between the partition wall and the first clutch.

13. The apparatus of claim 12 , wherein a hole through which the pillar portion of the second clutch passes is formed in the partition wall, and
a sealing member is provided between an inner surface of the hole of the partition wall and the pillar portion of the second clutch.

14. The apparatus of claim 3 , wherein the spin chuck is rotated such that the substrate is rotated at a first speed or a second speed faster than the first speed,
when the substrate is rotated at the first speed, the first clutch is in contact with the second clutch, and
when the substrate is rotated at the second speed, the first clutch is spaced apart from the second clutch.

15. A method of treating a substrate, the method comprising:
supplying a first liquid to a substrate rotating at a first speed in an open state in which a chuck pin provided for supporting a side portion of the substrate is located at an open position at which the chuck pin is spaced apart from the side portion of the substrate and forming a first liquid film on the substrate;
heating the first liquid film formed on the substrate in the open state, after the supplying; and
supplying a second liquid to the substrate rotating at a second speed faster than the first speed in a contact state in which the chuck pin is located at a contact position at which the chuck pin is in contact with the side portion of the substrate to support the side portion of the substrate, after the heating,
wherein the change from the open state to the contact state is performed while the substrate is being rotated.

16. The method of claim 15 , wherein the first liquid and the second liquid are the same, and
the first liquid is an aqueous solution of phosphoric acid.

17. The method of claim 15 , wherein the amount of second liquid supplied per unit time in the second supplying is greater than the amount of first liquid supplied per unit time in the first supplying.

18. The method of claim 15 , wherein in the heating, the substrate is rotated at the first speed, and the first liquid is not supplied onto the substrate.

19. A method of treating a substrate by using the apparatus of treating the substrate of claim 1 , the method comprising:
supplying a first liquid to a substrate rotating at a first speed in an open state in which the chuck pin is located at the open position and forming a first liquid film on the substrate;
heating the first liquid film formed on the substrate in the open state in which the chuck pin is located at the open position, after the supplying; and
supplying a second liquid to the substrate rotating at a second speed faster than the first speed in a contact state in which the chuck pin is located at the contact position, after the heating,
wherein the change of the chuck pin from the open state to the contact state is performed while the substrate is being rotated.

Assignees

• Semes Co Ltd

Inventors

• Son Won Sik
• Oh Se Hoon
• Jung In Ki

Classifications

• H10P72/0404

  for general liquid treatment, e.g. etching followed by cleaning · CPC title

• H10P72/7624 Primary

  characterised by the mechanical construction of the susceptor, stage or support · CPC title

• H10P72/7614

  characterised by a plurality of individual support members, e.g. support posts or protrusions · CPC title

• H10P72/0414

  using mainly spraying means, e.g. nozzles · CPC title

• H10P72/0424

  using mainly spraying means, e.g. nozzles · CPC title